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Patent applications and USPTO patent grants for Saldana, Ernesto.The latest application filed is for "slurry distributor for chemical mechanical polishing apparatus and method of using the same".
Patent | Date |
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Slurry distributor for chemical mechanical polishing apparatus and method of using the same App 20050130566 - Kajiwara, Jiro ;   et al. | 2005-06-16 |
Slurry distributor for chemical mechanical polishing apparatus and method of using the same Grant 6,887,132 - Kajiwara , et al. May 3, 2 | 2005-05-03 |
Method and polishing pad design enabling improved wafer removal from a polishing pad in a CMP process App 20040108063 - Reyes, Alejandro ;   et al. | 2004-06-10 |
Slurry distributor for chemical mechanical polishing apparatus and method of using the same App 20030068959 - Kajiwara, Jiro ;   et al. | 2003-04-10 |
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