Sakurada; Toyohisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sakurada; Toyohisa.The latest application filed is for "photomask blank, method for manufacturing photomask, and mask pattern formation method".

Company Profile

0.11.8

Sakurada; Toyohisa - Joetsu JP
SAKURADA; Toyohisa - Joetsu-shi JP
Sakurada; Toyohisa - Jyoetsu JP
Sakurada; Toyohisa - Nakakubiki-gun JP
Sakurada; Toyohisa - Niigata JP
Sakurada; Toyohisa - Niigata-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photomask blank, method for manufacturing photomask, and mask pattern formation method Grant 10,585,345 - Irie , et al.	2020-03-10
Photomask Blank, Method For Manufacturing Photomask, And Mask Pattern Formation Method App 20180267398 - IRIE; Shigeo ; et al.	2018-09-20
Photomask blank and method for manufacturing photomask blank Grant 9,709,885 - Inazuki , et al. July 18, 2	2017-07-18
Halftone phase shift photomask blank and making method Grant 9,645,485 - Kosaka , et al. May 9, 2	2017-05-09
Substrate Cleaning Apparatus And Method For Cleaning Substrate For Substrate Related To Photomask App 20170110355 - NUMANAMI; Tsuneo ; et al.	2017-04-20
Photomask Blank And Method For Manufacturing Photomask Blank App 20170023855 - INAZUKI; Yukio ; et al.	2017-01-26
Photomask blank and method for manufacturing photomask blank Grant 9,488,906 - Inazuki , et al. November 8, 2	2016-11-08
Method for manufacturing photomask blank Grant 9,400,422 - Yoshii , et al. July 26, 2	2016-07-26
Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method Grant 9,366,951 - Inazuki , et al. June 14, 2	2016-06-14
Halftone Phase Shift Photomask Blank And Making Method App 20160033858 - KOSAKA; Takuro ; et al.	2016-02-04
Halftone Phase Shift Photomask Blank, Halftone Phase Shift Photomask And Pattern Exposure Method App 20150125785 - INAZUKI; Yukio ; et al.	2015-05-07
Photomask Blank And Method For Manufacturing Photomask Blank App 20150086908 - INAZUKI; Yukio ; et al.	2015-03-26
Method For Manufacturing Photomask Blank App 20150086909 - YOSHII; Takashi ; et al.	2015-03-26
Resist composition and patterning method Grant 6,818,148 - Watanabe , et al. November 16, 2	2004-11-16
Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrate Grant 6,800,551 - Nagahara , et al. October 5, 2	2004-10-05
Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition , and semiconductor substrate App 20030157806 - Nagahara, Seiji ; et al.	2003-08-21
Biodegradable sustained-release preparation, biodegradable pheromone dispenser and biodegradable pest controlling agent Grant 6,419,943 - Sakurada , et al. July 16, 2	2002-07-16
Biodegradable sustained-release preparation Grant 5,993,843 - Sakurada , et al. November 30, 1	1999-11-30
Method for the stabilization of a sex pheromone compound Grant 5,364,969 - Sakurada , et al. November 15, 1	1994-11-15

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