SAKITA; Kyohei

Patent Applications and Registrations

Patent applications and USPTO patent grants for SAKITA; Kyohei.The latest application filed is for "photosensitive composition for euv light, pattern forming method, and method for manufacturing electronic device".

Company Profile

3.3.10

SAKITA; Kyohei - Haibara-gun JP
Sakita; Kyohei - Shizuoka JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive Composition For Euv Light, Pattern Forming Method, And Method For Manufacturing Electronic Device App 20210405530 - SAKITA; Kyohei	2021-12-30
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device Grant 11,156,917 - Sakita , et al. October 26, 2	2021-10-26
Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator Grant 11,073,762 - Asakawa , et al. July 27, 2	2021-07-27
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device Grant 11,067,890 - Goto , et al. July 20, 2	2021-07-20
Method Of Forming Reversed Pattern And Method Of Manufacturing Electronic Device App 20210173309 - SAKITA; Kyohei	2021-06-10
Active-ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Formation Method, And Method For Manufacturing Electronic Device App 20200401045 - ASAKAWA; Daisuke ; et al.	2020-12-24
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, Mask Blank With Resist Film, Method For Producing Photomask, And Method For Manufacturing Electronic Device App 20200319551 - Tsuchimura; Tomotaka ; et al.	2020-10-08
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, And Method For Manufacturin App 20200012189 - GOTO; Akiyoshi ; et al.	2020-01-09
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Resist Film, Pattern Forming Method, And Method For Manufacturin App 20190377261 - Sakita; Kyohei ; et al.	2019-12-12
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Pattern Formi App 20190294042 - KATO; Keita ; et al.	2019-09-26
Actinic Ray-sensitive Or Radiation Sensitive Resin Composition, Actinic Raysensitive Or Radiation-sensitive Film, Pattern Formin App 20190294043 - Asakawa; Daisuke ; et al.	2019-09-26
Resist Composition, Pattern Forming Method, And Method Of Manufacturing Electronic Device App 20190219922 - KANEKO; Akihiro ; et al.	2019-07-18
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition, Actinic Ray-sensitive Or Radiation-sensitive Film, Pattern Formi App 20190171104 - Takada; Akira ; et al.	2019-06-06

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.