Sakamuri; Raj
Patent Applications and Registrations
Patent applications and USPTO patent grants for Sakamuri; Raj.The latest application filed is for "dielectric film-forming composition".
Company Profile
14.15.28
- Sakamuri; Raj - Sharon MA
Patent Activity
| Patent | Date |
|---|---|
| Dielectric Film-Forming Composition App 20220127459 - De; Binod B. ; et al. | 2022-04-28 |
| Dielectric Film-Forming Composition App 20220002463 - De; Binod B. ; et al. | 2022-01-06 |
| Stripping compositions for removing photoresists from semiconductor substrates Grant 11,208,616 - Mizutani , et al. December 28, 2 | 2021-12-28 |
| Polyimides App 20210355279 - De; Binod B. ; et al. | 2021-11-18 |
| Photosensitive stacked structure Grant 11,175,582 - Malik , et al. November 16, 2 | 2021-11-16 |
| Polyimides Grant 11,061,327 - Reinerth , et al. July 13, 2 | 2021-07-13 |
| Planarizing Process and Composition App 20210104398 - Connell; Micheala ; et al. | 2021-04-08 |
| Dielectric film forming composition Grant 10,875,965 - Malik , et al. December 29, 2 | 2020-12-29 |
| Stripping Compositions For Removing Photoresists From Semiconductor Substrates App 20200339919 - Mizutani; Atsushi ; et al. | 2020-10-29 |
| Polyimides Grant 10,793,676 - Malik , et al. October 6, 2 | 2020-10-06 |
| Polyimides App 20200262978 - De; Binod B. ; et al. | 2020-08-20 |
| Photosensitive Polyimide Compositions App 20200218152 - De; Binod B. ; et al. | 2020-07-09 |
| Cleaning composition Grant 10,696,932 - Sakamuri , et al. June 30, 2 | 2020-06-30 |
| Polyimides App 20190263969 - Malik; Sanjay ; et al. | 2019-08-29 |
| Stripping process Grant 10,345,707 - Sakamuri , et al. July 9, 2 | 2019-07-09 |
| Photosensitive Polyimide Compositions App 20190171105 - Malik; Sanjay ; et al. | 2019-06-06 |
| Polyimides App 20190129303 - Reinerth; William A. ; et al. | 2019-05-02 |
| Dielectric Film Forming Composition App 20190081001 - Malik; Sanjay ; et al. | 2019-03-14 |
| Cleaning Composition App 20190016999 - Sakamuri; Raj ; et al. | 2019-01-17 |
| Photosensitive Stacked Structure App 20190018321 - Malik; Sanjay ; et al. | 2019-01-17 |
| Photosensitive polyimide compositions Grant 10,036,952 - Malik , et al. July 31, 2 | 2018-07-31 |
| Stripping Process App 20180136563 - Sakamuri; Raj ; et al. | 2018-05-17 |
| Photosensitive Polyimide Compositions App 20160313641 - De; Binod B. ; et al. | 2016-10-27 |
| Photosensitive Polyimide Compositions App 20160313642 - Malik; Sanjay ; et al. | 2016-10-27 |
| High etch resistant underlayer compositions for multilayer lithographic processes Grant 7,727,705 - De , et al. June 1, 2 | 2010-06-01 |
| Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof Grant 7,473,512 - Houlihan , et al. January 6, 2 | 2009-01-06 |
| High Etch Resistant Underlayer Compositions For Multilayer Lithographic Processes App 20080206667 - De; Binod B. ; et al. | 2008-08-28 |
| Photoresist composition for deep ultraviolet lithography Grant 7,351,521 - Dammel , et al. April 1, 2 | 2008-04-01 |
| Photoresist composition for deep ultraviolet lithography App 20070172762 - Dammel; Ralph R. ; et al. | 2007-07-26 |
| Photoresist composition for deep ultraviolet lithography App 20070154841 - Dammel; Ralph R. ; et al. | 2007-07-05 |
| Photoresist composition for deep ultraviolet lithography Grant 7,211,366 - Dammel , et al. May 1, 2 | 2007-05-01 |
| Process for producing an image using a first minimum bottom antireflective coating composition App 20060199103 - Neisser; Mark O. ; et al. | 2006-09-07 |
| Process for producing an image using a first minimum bottom antireflective coating composition Grant 7,070,914 - Neisser , et al. July 4, 2 | 2006-07-04 |
| Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof App 20050202340 - Houlihan, Francis M. ; et al. | 2005-09-15 |
| Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof App 20050202351 - Houlihan, Francis M. ; et al. | 2005-09-15 |
| Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof App 20050202347 - Houlihan, Francis M. ; et al. | 2005-09-15 |
| Photoresist composition for deep ultraviolet lithography App 20040166434 - Dammel, Ralph R. ; et al. | 2004-08-26 |
| Photoresist composition for deep ultraviolet lithography App 20040166433 - Dammel, Ralph R. ; et al. | 2004-08-26 |
| Photoresist composition for deep ultraviolet lithography Grant 6,737,215 - Dammel , et al. May 18, 2 | 2004-05-18 |
| Polymer suitable for photoresist compositions Grant 6,686,429 - Dammel , et al. February 3, 2 | 2004-02-03 |
| Process for producing an image using a first minimum bottom antireflective coating composition App 20030129547 - Neisser, Mark O. ; et al. | 2003-07-10 |
| Novel Polymer Suitable For Photoresist Compositions App 20030013831 - Dammel, Ralph R. ; et al. | 2003-01-16 |
| Photoresist composition for deep ultraviolet lithography App 20020187419 - Dammel, Ralph R. ; et al. | 2002-12-12 |
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