| Patent | Date |
|---|
Underlayer film-forming composition for use in forming a microphase-separated pattern
Grant 11,440,985 - Mizuochi , et al. September 13, 2 | 2022-09-13 |
Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms
Grant 11,385,546 - Endo , et al. July 12, 2 | 2022-07-12 |
Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound
Grant 11,372,330 - Kishioka , et al. June 28, 2 | 2022-06-28 |
Resist underlayer film forming composition containing triaryldiamine-containing novolac resin
Grant 11,300,879 - Saito , et al. April 12, 2 | 2022-04-12 |
Resist underlayer film-forming composition containing novolac polymer having secondary amino group
Grant 11,199,777 - Nishimaki , et al. December 14, 2 | 2021-12-14 |
Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure
Grant 11,194,251 - Karasawa , et al. December 7, 2 | 2021-12-07 |
Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device
Grant 11,169,441 - Saito , et al. November 9, 2 | 2021-11-09 |
Photocrosslinkable group-containing composition for coating stepped substrate
Grant 11,155,684 - Sakamoto , et al. October 26, 2 | 2021-10-26 |
Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group
Grant 11,022,884 - Shibayama , et al. June 1, 2 | 2021-06-01 |
Composition For Forming Coating Film And Method For Manufacturing Semiconductor Device
App 20210151318 - NISHITA; Tokio ; et al. | 2021-05-20 |
Aqueous solution for resist pattern coating and pattern forming methods using the same
Grant 11,009,795 - Nishita , et al. May 18, 2 | 2021-05-18 |
Self-organized film-forming composition for use in forming a micro-phase-separated pattern
Grant 10,995,172 - Mizuochi , et al. May 4, 2 | 2021-05-04 |
Composition for forming film protecting against aqueous hydrogen peroxide solution
Grant 10,894,887 - Tokunaga , et al. January 19, 2 | 2021-01-19 |
Stepped substrate-coating composition containing polyether resin having photocrosslinkable group
Grant 10,871,712 - Tokunaga , et al. December 22, 2 | 2020-12-22 |
Upper-layer film forming composition and method for producing a phase-separated pattern
Grant 10,865,262 - Mizuochi , et al. December 15, 2 | 2020-12-15 |
Resist Underlayer Film Forming Composition Using A Fluorene Compound
App 20200379350 - TOKUNAGA; Hikaru ; et al. | 2020-12-03 |
Resist Underlayer Film-forming Composition Containing Substituted Crosslinkable Compound
App 20200379352 - HASHIMOTO; Keisuke ; et al. | 2020-12-03 |
Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton
Grant 10,838,303 - Shibayama , et al. November 17, 2 | 2020-11-17 |
Resist underlayer film-forming composition containing substituted crosslinkable compound
Grant 10,809,619 - Hashimoto , et al. October 20, 2 | 2020-10-20 |
Method for roughening surface using wet treatment
Grant 10,804,111 - Hashimoto , et al. October 13, 2 | 2020-10-13 |
Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same
Grant 10,795,261 - Nishita , et al. October 6, 2 | 2020-10-06 |
Stepped Substrate-coating Composition Containing Polyether Resin Having Photocrosslinkable Group
App 20200301278 - TOKUNAGA; Hikaru ; et al. | 2020-09-24 |
Composition for forming resist underlayer film
Grant 10,684,546 - Sakaida , et al. | 2020-06-16 |
Composition For Forming Resist Underlayer Film, Resist Underlayer Film, Method For Forming Resist Pattern And Method For Produci
App 20200142310 - SAITO; Daigo ; et al. | 2020-05-07 |
Composition For Forming Film Protecting Against Aqueous Hydrogen Peroxide Solution
App 20200131376 - TOKUNAGA; Hikaru ; et al. | 2020-04-30 |
Resist Underlayer Film-forming Composition Comprising Polymer Having Structural Unit Having Urea Linkage
App 20200124965 - NISHITA; Tokio ; et al. | 2020-04-23 |
Multi-level Substrate Coating Film-forming Composition Containing Plasma-curable Compound Based On Unsaturated Bonds Between Car
App 20200124966 - ENDO; Takafumi ; et al. | 2020-04-23 |
Self-organized Film-forming Composition For Use In Forming A Micro-phase-separated Pattern
App 20200123298 - MIZUOCHI; Ryuta ; et al. | 2020-04-23 |
Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate
Grant 10,613,440 - Shibayama , et al. | 2020-04-07 |
Coating solution for resist pattern coating and method for forming pattern
Grant 10,613,435 - Nishita , et al. | 2020-04-07 |
Resist underlayer film forming composition
Grant 10,585,353 - Nishimaki , et al. | 2020-03-10 |
Composition for coating resist pattern
Grant 10,558,119 - Shibayama , et al. Feb | 2020-02-11 |
Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound
Grant 10,508,181 - Someya , et al. Dec | 2019-12-17 |
Underlayer Film-forming Composition For Use In Forming A Microphase-separated Pattern
App 20190359749 - MIZUOCHI; Ryuta ; et al. | 2019-11-28 |
Resist Underlayer Film-forming Composition Containing Amide Solvent
App 20190354018 - TOKUNAGA; Hikaru ; et al. | 2019-11-21 |
Additive For Resist Underlayer Film-forming Composition And Resist Underlayer Film-forming Composition Containing The Same
App 20190317405 - NISHITA; Tokio ; et al. | 2019-10-17 |
Composition for forming resist underlayer film with reduced outgassing
Grant 10,437,150 - Sakamoto , et al. O | 2019-10-08 |
Resist Underlayer Film Forming Composition
App 20190294046 - NISHIMAKI; Hirokazu ; et al. | 2019-09-26 |
Silicon-containing Resist Underlayer Film-forming Composition Containing Organic Group Having Dihydroxy Group
App 20190265593 - SHIBAYAMA; Wataru ; et al. | 2019-08-29 |
Resist underlayer film-forming composition containing polymer having arylene group
Grant 10,394,124 - Hashimoto , et al. A | 2019-08-27 |
Method For Producing Resist Pattern Coating Composition With Use Of Solvent Replacement Method
App 20190250512 - SHIGAKI; Shuhei ; et al. | 2019-08-15 |
Aqueous Solution For Resist Pattern Coating And Pattern Forming Method Using The Same
App 20190243251 - NISHITA; Tokio ; et al. | 2019-08-08 |
Aqueous Solution For Resist Pattern Coating And Pattern Forming Methods Using The Same
App 20190243249 - NISHITA; Tokio ; et al. | 2019-08-08 |
Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group
Grant 10,372,040 - Shibayama , et al. | 2019-08-06 |
Upper-layer Film Forming Composition And Method For Producing A Phase-separated Pattern
App 20190233559 - MIZUOCHI; Ryuta ; et al. | 2019-08-01 |
Resist Underlayer Film-forming Composition
App 20190227438 - NISHITA; Tokio ; et al. | 2019-07-25 |
Resist Underlayer Film Forming Composition Containing Triaryldiamine-containing Novolac Resin
App 20190212649 - SAITO; Daigo ; et al. | 2019-07-11 |
Photocurable Composition And Method For Producing Semiconductor Device
App 20190171101 - TOKUNAGA; Hikaru ; et al. | 2019-06-06 |
Composition For Forming Resist Underlayer Film
App 20190163063 - SAKAIDA; Yasushi ; et al. | 2019-05-30 |
Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure
Grant 10,295,907 - Karasawa , et al. | 2019-05-21 |
Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer
Grant 10,289,002 - Sakaida , et al. | 2019-05-14 |
Composition For Forming Resist Underlayer Film With Improved Film Density
App 20190137878 - TOKUNAGA; Hikaru ; et al. | 2019-05-09 |
Bottom layer film-forming composition of self-organizing film containing styrene structure
Grant 10,280,328 - Someya , et al. | 2019-05-07 |
Method For Roughening Surface Using Wet Treatment
App 20190092681 - HASHIMOTO; Keisuke ; et al. | 2019-03-28 |
Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group
Grant 10,242,871 - Nishita , et al. | 2019-03-26 |
Stepped Substrate Coating Composition Including Compound Having Photocrosslinking Group Due To Unsaturated Bond Between Carbon Atoms
App 20190079397 - ENDO; Takafumi ; et al. | 2019-03-14 |
Resist underlayer film-forming composition
Grant 10,191,374 - Nishimaki , et al. Ja | 2019-01-29 |
Resist Underlayer Film-forming Composition Containing Indolocarbazole Novolak Resin
App 20180356732 - TOKUNAGA; Hikaru ; et al. | 2018-12-13 |
Coating composition for pattern reversal on soc pattern
Grant 10,139,729 - Yaguchi , et al. Nov | 2018-11-27 |
Coating liquid for resist pattern coating
Grant 10,133,178 - Nishita , et al. November 20, 2 | 2018-11-20 |
Resist Underlayer Film-forming Composition Containing Long Chain Alkyl Group-containing Novolac
App 20180314154 - SAITO; Daigo ; et al. | 2018-11-01 |
Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound
Grant 10,113,083 - Ohnishi , et al. October 30, 2 | 2018-10-30 |
Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structure
Grant 10,082,735 - Shibayama , et al. September 25, 2 | 2018-09-25 |
Additive and resist underlayer film-forming composition containing the same
Grant 10,067,423 - Hashimoto , et al. September 4, 2 | 2018-09-04 |
Resist Underlayer Film Forming Composition For Lithography Containing Hydrolyzable Silane Having Carbonate Skeleton
App 20180239250 - SHIBAYAMA; Wataru ; et al. | 2018-08-23 |
Mask blank, method for manufacturing mask blank and transfer mask
Grant 10,042,247 - Hiromatsu , et al. August 7, 2 | 2018-08-07 |
Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition
Grant 10,042,258 - Fujitani , et al. August 7, 2 | 2018-08-07 |
Polymer-containing coating liquid applied to resist pattern
Grant 10,025,191 - Shigaki , et al. July 17, 2 | 2018-07-17 |
Resist Pattern Coating Composition Including Vinyl Group- Or (meth) Acryloxy Group-containing Polysiloxane
App 20180197731 - SHIGAKI; Shuhei ; et al. | 2018-07-12 |
Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde
Grant 10,017,664 - Endo , et al. July 10, 2 | 2018-07-10 |
Resist Underlayer Film-forming Composition Comprising Epoxy Adduct Having Long-chain Alkyl Group
App 20180181001 - ENDO; Takafumi ; et al. | 2018-06-28 |
Underlayer film-forming composition for self-assembled films
Grant 10,000,664 - Wakayama , et al. June 19, 2 | 2018-06-19 |
Composition For Coating Resist Pattern
App 20180149977 - SHIBAYAMA; Wataru ; et al. | 2018-05-31 |
Resist overlayer film forming composition and method for producing semiconductor device including the same
Grant 9,977,331 - Fujitani , et al. May 22, 2 | 2018-05-22 |
Coating Solution For Resist Pattern Coating And Method For Forming Pattern
App 20180107111 - NISHITA; Tokio ; et al. | 2018-04-19 |
Photocrosslinkable Group-containing Composition For Coating Stepped Substrate
App 20180086886 - SAKAMOTO; Rikimaru ; et al. | 2018-03-29 |
Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same
Grant 9,927,705 - Fujitani , et al. March 27, 2 | 2018-03-27 |
Resist underlayer film-forming composition and method for forming resist pattern using the same
Grant 9,910,354 - Sakaida , et al. March 6, 2 | 2018-03-06 |
Resist Underlayer Film Forming Composition For Lithography Containing Hydrolyzable Silane Having Halogen-containing Carboxylic Acid Amide Group
App 20170322491 - SHIBAYAMA; Wataru ; et al. | 2017-11-09 |
Resist Underlayer Film-forming Composition Containing Polymer Having Arylene Group
App 20170315445 - HASHIMOTO; Keisuke ; et al. | 2017-11-02 |
Coating Liquid For Resist Pattern Coating
App 20170293227 - NISHITA; Tokio ; et al. | 2017-10-12 |
Mask Blank, Method For Manufacturing Mask Blank And Transfer Mask
App 20170285460 - HIROMATSU; Takahiro ; et al. | 2017-10-05 |
Coating Composition For Pattern Reversal On Soc Pattern
App 20170271151 - YAGUCHI; Hiroaki ; et al. | 2017-09-21 |
Film-forming material
Grant 9,761,741 - Ebara , et al. September 12, 2 | 2017-09-12 |
Polymer-containing developer
Grant 9,753,369 - Sakamoto , et al. September 5, 2 | 2017-09-05 |
Resist Underlayer Film-forming Composition
App 20170250079 - NISHITA; Tokio ; et al. | 2017-08-31 |
Mask blank and transfer mask
Grant 9,746,764 - Hiromatsu , et al. August 29, 2 | 2017-08-29 |
Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same
Grant 9,746,768 - Ohnishi , et al. August 29, 2 | 2017-08-29 |
Resist Underlayer Film-forming Composition Containing Novolac Resin Reacted With Aromatic Methylol Compound
App 20170227850 - NISHIMAKI; Hirokazu ; et al. | 2017-08-10 |
Composition For Forming A Resist Upper-layer Film And Method For Producing A Semiconductor Device Using The Composition
App 20170205711 - FUJITANI; Noriaki ; et al. | 2017-07-20 |
Silicon-containing Resist Underlayer Film-forming Composition Having Halogenated Sulfonylalkyl Group
App 20170168397 - SHIBAYAMA; Wataru ; et al. | 2017-06-15 |
Silicon-containing Resist Underlayer Film-forming Composition Having Organic Group Having Aliphatic Polycyclic Structure
App 20170153549 - SHIBAYAMA; Wataru ; et al. | 2017-06-01 |
Resist Underlayer Film-forming Composition
App 20170153548 - NISHIMAKI; Hirokazu ; et al. | 2017-06-01 |
Coating liquid to be applied to resist pattern and method for forming reverse pattern
Grant 9,632,414 - Sakaida , et al. April 25, 2 | 2017-04-25 |
Additive And Resist Underlayer Film-forming Composition Containing The Same
App 20170108777 - HASHIMOTO; Yuto ; et al. | 2017-04-20 |
Silicon-containing EUV resist underlayer film-forming composition including additive
Grant 9,627,217 - Shigaki , et al. April 18, 2 | 2017-04-18 |
Resist Underlayer Film-forming Composition Containing Novolac Resin To Which Aromatic Vinyl Compound Is Added
App 20170097568 - ENDO; Takafumi ; et al. | 2017-04-06 |
Resist Underlayer Film-forming Composition For Lithography Containing Polymer Having Acrylamide Structure And Acrylic Acid Ester Structure
App 20170045819 - KARASAWA; Ryo ; et al. | 2017-02-16 |
Resist Underlayer Film-forming Composition And Method For Forming Resist Pattern Using The Same
App 20170045820 - SAKAIDA; Yasushi ; et al. | 2017-02-16 |
Resist Underlayer Film-forming Composition For Lithography Containing Polymer Having Blocked Isocyanate Structure
App 20170045818 - KARASAWA; Ryo ; et al. | 2017-02-16 |
Resist Overlayer Film Forming Composition And Method For Producing Semiconductor Device Including The Same
App 20170010535 - FUJITANI; Noriaki ; et al. | 2017-01-12 |
Electron Beam Resist Underlayer Film-forming Composition Containing Lactone-structure-containing Polymer
App 20160363863 - SAKAIDA; Yasushi ; et al. | 2016-12-15 |
Polymer-containing Coating Liquid Applied To Resist Pattern
App 20160363867 - Shigaki; Shuhei ; et al. | 2016-12-15 |
Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same
Grant 9,494,864 - Ohnishi , et al. November 15, 2 | 2016-11-15 |
Resist Underlayer Film-forming Composition Containing Novolac Polymer Having Secondary Amino Group
App 20160326396 - NISHIMAKI; Hirokazu ; et al. | 2016-11-10 |
Resist underlayer film forming composition that contains novolac resin having polynuclear phenol
Grant 9,469,777 - Endo , et al. October 18, 2 | 2016-10-18 |
Mask Blank And Transfer Mask
App 20160274457 - HIROMATSU; Takahiro ; et al. | 2016-09-22 |
Resist underlayer film formation composition and method for forming resist pattern using the same
Grant 9,448,480 - Nishita , et al. September 20, 2 | 2016-09-20 |
Resist Underlayer Film Formation Composition And Method For Forming Resist Pattern Using The Same
App 20160238936 - NISHITA; Tokio ; et al. | 2016-08-18 |
Forming Underlayer Film Of Self-assembled Film Including Aliphatic Polycyclic Structure
App 20160222248 - ENDO; Takafumi ; et al. | 2016-08-04 |
Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group
Grant 9,395,628 - Endo , et al. July 19, 2 | 2016-07-19 |
Composition for forming antistatic film and oligomer compound
Grant 9,394,231 - Nishita , et al. July 19, 2 | 2016-07-19 |
Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process
Grant 9,384,977 - Someya , et al. July 5, 2 | 2016-07-05 |
Resist Underlayer Film-forming Composition Containing Polymer Which Contains Nitrogen-containing Ring Compound
App 20160186006 - OHNISHI; Ryuji ; et al. | 2016-06-30 |
Coating Liquid To Be Applied To Resist Pattern And Method For Forming Reverse Pattern
App 20160179010 - SAKAIDA; Yasushi ; et al. | 2016-06-23 |
Additive For Resist Underlayer Film-forming Composition And Resist Underlayer Film-forming Composition Containing The Same
App 20160147152 - FUJITANI; Noriaki ; et al. | 2016-05-26 |
Resist Underlayer Film-forming Composition Containing Substituted Crosslinkable Compound
App 20160139509 - HASHIMOTO; Keisuke ; et al. | 2016-05-19 |
Silicon-containing EUV resist underlayer film forming composition
Grant 9,337,052 - Shigaki , et al. May 10, 2 | 2016-05-10 |
Novolac Resin-containing Resist Underlayer Film-forming Composition Using Bisphenol Aldehyde
App 20160068709 - ENDO; Takafumi ; et al. | 2016-03-10 |
Diarylamine novolac resin
Grant 9,263,286 - Sakamoto , et al. February 16, 2 | 2016-02-16 |
Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring
Grant 9,261,790 - Someya , et al. February 16, 2 | 2016-02-16 |
Resist underlayer film-forming composition
Grant 9,250,525 - Endo , et al. February 2, 2 | 2016-02-02 |
Resist underlayer film forming composition
Grant 9,244,353 - Nishimaki , et al. January 26, 2 | 2016-01-26 |
Resist underlayer film-forming composition for EUV lithography containing condensation polymer
Grant 9,240,327 - Sakamoto , et al. January 19, 2 | 2016-01-19 |
Resist Underlayer Film-forming Composition Containing Aryl Sulfonate Salt Having Hydroxyl Group
App 20150378260 - ENDO; Takafumi ; et al. | 2015-12-31 |
Resist Underlayer Film-forming Composition
App 20150362838 - ENDO; Takafumi ; et al. | 2015-12-17 |
Resist Overlayer Film Forming Composition For Lithography And Method For Producing Semiconductor Device Using The Same
App 20150362835 - OHNISHI; Ryuji ; et al. | 2015-12-17 |
Resist underlayer film-forming composition
Grant 9,212,255 - Endo , et al. December 15, 2 | 2015-12-15 |
Composition for forming highly adhesive resist underlayer film
Grant 9,195,137 - Endo , et al. November 24, 2 | 2015-11-24 |
Bottom Layer Film-formation Composition Of Self-organizing Film Containing Polycyclic Organic Vinyl Compound
App 20150322219 - SOMEYA; Yasunobu ; et al. | 2015-11-12 |
Resist Underlayer Film-forming Composition Comprising Carbonyl-containing Polyhydroxy Aromatic Ring Novolac Resin
App 20150316850 - SOMEYA; Yasunobu ; et al. | 2015-11-05 |
Bottom Layer Film-forming Composition Of Self-organizing Film Containing Styrene Structure
App 20150315402 - SOMEYA; Yasunobu ; et al. | 2015-11-05 |
Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same
Grant 9,165,782 - Endo , et al. October 20, 2 | 2015-10-20 |
Resist Overlayer Film Forming Composition For Lithography And Method For Manufacturing Semiconductor Device Using The Same
App 20150248057 - Ohnishi; Ryuji ; et al. | 2015-09-03 |
Resist Underlayer Film Forming Composition
App 20150212418 - Nishimaki; Hirokazu ; et al. | 2015-07-30 |
Silicon-containing Euv Resist Underlayer Film-forming Composition Containing Onium Sulfonate
App 20150210829 - Shibayama; Wataru ; et al. | 2015-07-30 |
Method Of Manufacturing Semiconductor Device Using Organic Underlayer Film Forming Composition For Solvent Development Lithography Process
App 20150194312 - Someya; Yasunobu ; et al. | 2015-07-09 |
Resist Underlayer Film Forming Composition That Contains Novolac Resin Having Polynuclear Phenol
App 20150184018 - Endo; Takafumi ; et al. | 2015-07-02 |
Resist overlayer film forming composition for lithography
Grant 9,046,768 - Ohnishi , et al. June 2, 2 | 2015-06-02 |
Underlayer Film-forming Composition For Self-assembled Films
App 20150118396 - Wakayama; Hiroyuki ; et al. | 2015-04-30 |
Composition for forming resist underlayer film for EUV lithography
Grant 9,005,873 - Sakamoto , et al. April 14, 2 | 2015-04-14 |
Resist underlayer film forming composition containing phenylindole-containing novolac resin
Grant 8,993,215 - Nishimaki , et al. March 31, 2 | 2015-03-31 |
Resist Underlayer Film-forming Composition
App 20150087155 - Endo; Takafumi ; et al. | 2015-03-26 |
Silicon-containing Euv Resist Underlayer Film-forming Composition Including Additive
App 20150079792 - Shigaki; Shuhei ; et al. | 2015-03-19 |
Resist underlayer film forming composition and method for forming resist pattern using the same
Grant 8,962,234 - Ohnishi , et al. February 24, 2 | 2015-02-24 |
Resist Underlayer Film Forming Composition Containing Phenylindole-containing Novolac Resin
App 20150044876 - Nishimaki; Hirokazu ; et al. | 2015-02-12 |
Composition For Forming Highly Adhesive Resist Underlayer Film
App 20150031206 - Endo; Takafumi ; et al. | 2015-01-29 |
Composition For Forming Antistatic Film And Oligomer Compound
App 20150008372 - Nishita; Tokio ; et al. | 2015-01-08 |
Resist Underlayer Film-forming Composition Containing Copolymer Resin Having Heterocyclic Ring
App 20150011092 - Someya; Yasunobu ; et al. | 2015-01-08 |
Additive For Resist Underlayer Film-forming Composition And Resist Underlayer Film-forming Composition Containing The Same
App 20140287589 - Endo; Takafumi ; et al. | 2014-09-25 |
Resist Overlayer Film Forming Composition For Lithography
App 20140255847 - Ohnishi; Ryuji ; et al. | 2014-09-11 |
Silicon-containing Euv Resist Underlayer Film Forming Composition
App 20140232018 - Shigaki; Shuhei ; et al. | 2014-08-21 |
Diarylamine Novolac Resin
App 20140235059 - Sakamoto; Rikimaru ; et al. | 2014-08-21 |
Resist Underlayer Film-forming Composition For Euv Lithography Containing Condensation Polymer
App 20140170567 - Sakamoto; Rikimaru ; et al. | 2014-06-19 |
Resist underlayer film forming composition, and method for forming resist pattern using the same
Grant 8,722,840 - Sakamoto , et al. May 13, 2 | 2014-05-13 |
Composition For Forming Resist Underlayer Film For Euv Lithography
App 20140099791 - SAKAMOTO; Rikimaru ; et al. | 2014-04-10 |
Polymer-containing Developer
App 20140038415 - Sakamoto; Rikimaru ; et al. | 2014-02-06 |
Resist Underlayer Film Forming Composition And Method For Forming Resist Pattern Using The Same
App 20140004465 - Ohnishi; Ryuji ; et al. | 2014-01-02 |
Resist underlayer film forming composition for electron beam lithography
Grant 8,603,731 - Enomoto , et al. December 10, 2 | 2013-12-10 |
Film-forming Material
App 20130284262 - Ebara; Kazuya ; et al. | 2013-10-31 |
Resist Underlayer Film Forming Composition, And Method For Forming Resist Pattern Using The Same
App 20130230809 - Sakamoto; Rikimaru ; et al. | 2013-09-05 |
Composition For Forming Resist Overlayer Film For Euv Lithography
App 20130209940 - Sakamoto; Rikimaru ; et al. | 2013-08-15 |
Composition containing hydroxylated condensation resin for forming resist underlayer film
Grant 8,445,175 - Hiroi , et al. May 21, 2 | 2013-05-21 |
Resist underlayer film forming composition and forming method of resist pattern using the same
Grant 8,435,721 - Sakamoto , et al. May 7, 2 | 2013-05-07 |
Resist underlayer film forming composition and method of forming resist pattern using the same
Grant 8,383,320 - Sakamoto , et al. February 26, 2 | 2013-02-26 |
Composition For Formation Of Resist Underlayer Film
App 20120251955 - Sakamoto; Rikimaru ; et al. | 2012-10-04 |
Composition For Forming Resist Underlayer Film For Euv Lithography
App 20120040291 - Sakamoto; Rikimaru ; et al. | 2012-02-16 |
Composition For Forming Resist Underlayer Film With Reduced Outgassing
App 20110230058 - Sakamoto; Rikimaru ; et al. | 2011-09-22 |
Resist Underlayer Film Forming Composition And Forming Method Of Resist Pattern Using The Same
App 20110059404 - Sakamoto; Rikimaru ; et al. | 2011-03-10 |
Composition for forming anti-reflective coating for use in lithography
Grant 7,846,638 - Kishioka , et al. December 7, 2 | 2010-12-07 |
Mask blank and mask
Grant 7,833,681 - Hashimoto , et al. November 16, 2 | 2010-11-16 |
Condensation type polymer-containing anti-reflective coating for semiconductor
Grant 7,790,356 - Kishioka , et al. September 7, 2 | 2010-09-07 |
Resist Underlayer Film Forming Composition And Method Of Forming Resist Pattern Using The Same
App 20100221657 - Sakamoto; Rikimaru ; et al. | 2010-09-02 |
Resist underlayer coating forming composition for mask blank, mask blank and mask
Grant 7,736,822 - Hashimoto , et al. June 15, 2 | 2010-06-15 |
Resist Underlayer Film Forming Composition For Electron Beam Lithography
App 20100081081 - Enomoto; Tomoyuki ; et al. | 2010-04-01 |
Composition containing hydroxylated condensation resin for forming resist underlayer film
App 20090317740 - Hiroi; Yoshiomi ; et al. | 2009-12-24 |
Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure
Grant 7,632,626 - Sakamoto December 15, 2 | 2009-12-15 |
Anti-Reflective Coating Forming Composition Containing Reaction Product of Isocyanuric Acid Compound with Benzoic Acid Compound
App 20090117493 - Kishioka; Takahiro ; et al. | 2009-05-07 |
Anti-reflective coating containing sulfur atom
Grant 7,501,229 - Hiroi , et al. March 10, 2 | 2009-03-10 |
Anti-Reflective Coating Forming Composition For Lithography Containing Polymer Having Ethylenedicarbonyl Structure
App 20080268379 - Sakamoto; Rikimaru | 2008-10-30 |
Composition for forming anti-reflective coating for use in lithography
Grant 7,425,399 - Kishioka , et al. September 16, 2 | 2008-09-16 |
Composition for forming anti-reflective coating for use in lithography
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