Patent | Date |
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Charged-particle-beam exposure device and charged-particle-beam exposure method App 20010013581 - Takemoto, Akio ;   et al. | 2001-08-16 |
Charged-particle-beam exposure device and charged-particle-beam exposure method Grant 6,242,751 - Takemoto , et al. June 5, 2 | 2001-06-05 |
Charged-particle-beam exposure device and charged-particle-beam exposure method Grant 6,222,195 - Yamada , et al. April 24, 2 | 2001-04-24 |
Charged particle-beam exposure device and charged-particle-beam exposure method Grant 6,137,111 - Yamada , et al. October 24, 2 | 2000-10-24 |
Charged-particle-beam exposure device and charged-particle-beam exposure method Grant 5,969,365 - Takemoto , et al. October 19, 1 | 1999-10-19 |
Block exposure pattern data extracting system and method for charged particle beam exposure Grant 5,590,048 - Abe , et al. December 31, 1 | 1996-12-31 |
Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure Grant 5,537,487 - Miyajima , et al. July 16, 1 | 1996-07-16 |
Mask and charged particle beam exposure method using the mask Grant 5,422,491 - Sakamoto June 6, 1 | 1995-06-06 |
Charged particle beam exposure apparatus and method of cleaning the same Grant 5,401,974 - Oae , et al. March 28, 1 | 1995-03-28 |
Stencil mask and charge particle beam exposure method and apparatus using the stencil mask Grant 5,376,802 - Sakamoto , et al. December 27, 1 | 1994-12-27 |
Method of exposing patttern of semiconductor devices and stencil mask for carrying out same Grant 5,364,718 - Oae , et al. November 15, 1 | 1994-11-15 |
Method for exposing a pattern on an object by a charged particle beam Grant 5,349,197 - Sakamoto , et al. September 20, 1 | 1994-09-20 |
Electron beam exposure system Grant 5,276,331 - Oae , et al. January 4, 1 | 1994-01-04 |
Charged particle beam exposure method and apparatus Grant 5,276,334 - Yamada , et al. January 4, 1 | 1994-01-04 |
Blanking aperture array and charged particle beam exposure method Grant 5,262,341 - Fueki , et al. November 16, 1 | 1993-11-16 |
Charged particle beam exposure system and charged particle beam exposure method Grant 5,260,579 - Yasuda , et al. November 9, 1 | 1993-11-09 |
Mask and charged particle beam exposure method using the mask Grant 5,256,881 - Yamazaki , et al. October 26, 1 | 1993-10-26 |
Charged particle beam exposure apparatus control system and a method of operation for providing a drawing start signal Grant 5,225,684 - Taki , et al. July 6, 1 | 1993-07-06 |
Electron beam exposure system with increased efficiency of exposure operation Grant 5,175,435 - Sakamoto , et al. December 29, 1 | 1992-12-29 |
Charged particle beam lithography system and method Grant 5,173,582 - Sakamoto , et al. * December 22, 1 | 1992-12-22 |
Blanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method Grant 5,144,142 - Fueki , et al. September 1, 1 | 1992-09-01 |
Electron beam exposure system having an improved seal element for interfacing electric connections Grant 5,117,117 - Oae , et al. May 26, 1 | 1992-05-26 |
Fabrication method for semiconductor devices and transparent mask for charged particle beam Grant 5,036,209 - Kataoka , et al. July 30, 1 | 1991-07-30 |
Photoelectron image projection apparatus Grant 5,029,222 - Yamada , et al. July 2, 1 | 1991-07-02 |
Photo-cathode image projection apparatus for patterning a semiconductor device Grant 5,023,462 - Yamada , et al. June 11, 1 | 1991-06-11 |
Charged particle beam exposure system using line beams Grant 4,980,567 - Yasuda , et al. December 25, 1 | 1990-12-25 |