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Patent applications and USPTO patent grants for Sakakita; Hajime.The latest application filed is for "production method and production device for nitrogen compound".
Patent | Date |
---|---|
Dispersion solution of semiconductor single-layer carbon nanotube Grant 10,752,835 - Iizumi , et al. A | 2020-08-25 |
Production Method and Production Device for Nitrogen Compound App 20190153617 - Itagaki; Hirotomo ;   et al. | 2019-05-23 |
Microwave Plasma Treatment Apparatus App 20180049304 - Kim; Jaeho ;   et al. | 2018-02-15 |
Near-infrared Light-emitting Semiconductor Single-layer Carbon Nanotube App 20170335185 - IIZUMI; Yoko ;   et al. | 2017-11-23 |
Plasma treatment equipment Grant 9,713,242 - Sakakita , et al. July 18, 2 | 2017-07-18 |
Protein Film Production Method App 20170107342 - HORI; Masaru ;   et al. | 2017-04-20 |
Microwave Plasma Processing Device App 20160217979 - KIM; Jaeho ;   et al. | 2016-07-28 |
Plasma evaluation apparatus Grant 9,254,397 - Sakakita , et al. February 9, 2 | 2016-02-09 |
Plasma Evaluation Apparatus App 20140312241 - Sakakita; Hajime ;   et al. | 2014-10-23 |
Plasma Treatment Equipment App 20130204244 - Sakakita; Hajime ;   et al. | 2013-08-08 |
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