Saito; Kimitsugu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Saito; Kimitsugu.The latest application filed is for "apparatus for and method of forming carbon nanotube".

Company Profile

0.17.19

Saito; Kimitsugu - Kyoto JP
Saito; Kimitsugu - Kamikyo-Ku JP
Saito; Kimitsugu - Kyoto-shi JP
Saito; Kimitsugu - Tarumi JP
Saito; Kimitsugu - Kobe JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus For And Method Of Forming Carbon Nanotube App 20090214800 - Saito; Kimitsugu	2009-08-27
High-pressure processing apparatus and high-pressure processing method Grant 7,562,663 - Muraoka , et al. July 21, 2	2009-07-21
High pressure processing method and apparatus Grant 7,513,265 - Yoshikawa , et al. April 7, 2	2009-04-07
High-pressure processing apparatus and high-pressure processing method Grant 7,435,396 - Muraoka , et al. October 14, 2	2008-10-14
Substrate processing method, substrate processing apparatus and substrate processing system Grant 7,384,484 - Muraoka , et al. June 10, 2	2008-06-10
Substrate Processing Method And Substrate Processing Apparatus App 20070215572 - Saito; Kimitsugu	2007-09-20
High pressure processing method Grant 7,252,719 - Sakashita , et al. August 7, 2	2007-08-07
High-pressure Processing Apparatus And High-pressure Processing Method App 20070044816 - Saito; Kimitsugu	2007-03-01
High-pressure processing apparatus App 20070022949 - Saito; Kimitsugu	2007-02-01
High pressure processing apparatus and method Grant 7,111,630 - Mizobata , et al. September 26, 2	2006-09-26
High pressure processing apparatus and method Grant 7,080,651 - Mizobata , et al. July 25, 2	2006-07-25
High pressure processing apparatus and high pressure processing method Grant 7,000,653 - Sakashita , et al. February 21, 2	2006-02-21
High Pressure Processing Method App 20060032520 - Sakashita; Yoshihiko ; et al.	2006-02-16
High-pressure processing apparatus and high-pressure processing method App 20050079107 - Muraoka, Yusuke ; et al.	2005-04-14
High pressure processing apparatus Grant 6,874,513 - Yamagata , et al. April 5, 2	2005-04-05
Cleaning apparatus for cleaning objects to be treated with use of cleaning composition App 20050005957 - Yamagata, Masahiro ; et al.	2005-01-13
Substrate processing apparatus equipping with high-pressure processing unit Grant 6,841,031 - Iwata , et al. January 11, 2	2005-01-11
High pressure processing apparatus and high pressure processing method Grant 6,823,880 - Sakashita , et al. November 30, 2	2004-11-30
High pressure processing apparatus and method App 20040231698 - Mizobata, Ikuo ; et al.	2004-11-25
High pressure processing apparatus and high pressure processing method App 20040194842 - Sakashita, Yoshihiko ; et al.	2004-10-07
High-pressure processing apparatus and high-pressure processing method App 20040182419 - Muraoka, Yusuke ; et al.	2004-09-23
High pressure processing method and apparatus App 20040123484 - Yoshikawa, Tetsuya ; et al.	2004-07-01
Substrate processing method, substrate processing apparatus and substrate processing system App 20040105936 - Muraoka, Yusuke ; et al.	2004-06-03
Method and system for processing substrate Grant 6,703,316 - Inoue , et al. March 9, 2	2004-03-09
High-pressure treatment apparatus and high-pressure treatment method App 20040031441 - Muraoka, Yusuke ; et al.	2004-02-19
High-pressure drying apparatus, high-pressure drying method and substrate processing apparatus Grant 6,691,430 - Saito , et al. February 17, 2	2004-02-17
High-pressure drying apparatus, high-pressure drying method and substrate processing apparatus App 20030177659 - Saito, Kimitsugu ; et al.	2003-09-25
Substrate processing apparatus equipping with high-pressure processing unit App 20030019578 - Iwata, Tomomi ; et al.	2003-01-30
High pressure processing apparatus and high pressure processing method App 20020179114 - Sakashita, Yoshihiko ; et al.	2002-12-05
High pressure processing apparatus and method App 20020170577 - Mizobata, Ikuo ; et al.	2002-11-21
Method and system for processing substrate App 20020160625 - Inoue, Yoichi ; et al.	2002-10-31
High-pressure processing apparatus App 20020148492 - Yamagata, Masahiro ; et al.	2002-10-17
Highly-oriented diamond film field-effect transistor Grant 5,491,348 - Koyamao , et al. February 13, 1	1996-02-13
Formation of highly oriented diamond film Grant 5,479,875 - Tachibana , et al. January 2, 1	1996-01-02
Highly oriented diamond film field-effect transistor Grant 5,371,383 - Miyata , et al. December 6, 1	1994-12-06
Diamond films with heat-resisting ohmic electrodes Grant 5,309,000 - Saito , et al. May 3, 1	1994-05-03

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.