SAIE; Toshiyuki

Patent Applications and Registrations

Patent applications and USPTO patent grants for SAIE; Toshiyuki.The latest application filed is for "manufacturing method for thermal conductive layer, manufacturing method for laminate, and manufacturing method for semiconductor device".

Company Profile

0.10.8

SAIE; Toshiyuki - Shizuoka JP
Saie; Toshiyuki - Haibara-gun N/A JP
Saie; Toshiyuki - Shizuoka-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Manufacturing Method For Thermal Conductive Layer, Manufacturing Method For Laminate, And Manufacturing Method For Semiconductor Device App 20220216126 - YAMASHITA; Kosuke ; et al.	2022-07-07
Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same Grant 9,354,514 - Saie , et al. May 31, 2	2016-05-31
Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same Grant 8,753,801 - Saie , et al. June 17, 2	2014-06-17
Polishing liquid Grant 8,715,524 - Kamimura , et al. May 6, 2	2014-05-06
Photosensitive Transparent Composition For Color Filter Of Solid-state Imaging Device, And Production Method Of Color Filter Of Solid-state Imaging Device, Color Filter Of Solid-state Imaging Device, And Solid-state Imaging Device, Each Using The Same App 20130285182 - SAIE; Toshiyuki ; et al.	2013-10-31
Polishing liquid for semiconductor integrated circuit Grant 8,409,467 - Saie , et al. April 2, 2	2013-04-02
Polishing liquid and polishing method Grant 8,404,146 - Saie March 26, 2	2013-03-26
Metal polishing composition and chemical mechanical polishing method Grant 8,202,445 - Takamiya , et al. June 19, 2	2012-06-19
Photosensitive Composition, Pattern Forming Material, And Photosensitive Film, Pattern Forming Method, Pattern Film, Low Refractive Index Film, Optical Device And Solid-state Imaging Device Each Using The Same App 20120003436 - SAIE; Toshiyuki ; et al.	2012-01-05
Metal Polishing Composition And Chemical Mechanical Polishing Method App 20090246956 - TAKAMIYA; Sumi ; et al.	2009-10-01
Polishing liquid and polishing method App 20090215270 - Saie; Toshiyuki	2009-08-27
Polishing Liquid And Polishing Method App 20090087988 - Saie; Toshiyuki	2009-04-02
Polishing Liquid App 20090078908 - SAIE; Toshiyuki ; et al.	2009-03-26
Polishing Liquid App 20080203354 - KAMIMURA; Tetsuya ; et al.	2008-08-28

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