loadpatents
name:-0.04681921005249
name:-0.58936500549316
name:-0.13508081436157
Sahota; Kashmir Patent Filings

Sahota; Kashmir

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sahota; Kashmir.The latest application filed is for "methods for forming a memory cell having a top oxide spacer".

Company Profile
0.15.2
  • Sahota; Kashmir - Fremont CA
  • Sahota; Kashmir - Union City CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods for forming a memory cell having a top oxide spacer
Grant 8,384,146 - Fang , et al. February 26, 2
2013-02-26
Methods For Forming A Memory Cell Having A Top Oxide Spacer
App 20120181601 - FANG; Shenqing ;   et al.
2012-07-19
Methods for forming a memory cell having a top oxide spacer
Grant 8,202,779 - Fang , et al. June 19, 2
2012-06-19
Methods For Forming A Memory Cell Having A Top Oxide Spacer
App 20110233647 - FANG; Shenqing ;   et al.
2011-09-29
Method for effectively removing polysilicon nodule defects
Grant 7,449,413 - Achuthan , et al. November 11, 2
2008-11-11
Method for decreasing sheet resistivity variations of an interconnect metal layer
Grant 7,358,191 - Achuthan , et al. April 15, 2
2008-04-15
Method for controlling poly 1 thickness and uniformity in a memory array fabrication process
Grant 7,294,573 - Achuthan , et al. November 13, 2
2007-11-13
Method for reducing edge array erosion in a high-density array
Grant 7,077,728 - Achuthan , et al. July 18, 2
2006-07-18
Methods for reduced trench isolation step height
Grant 6,613,646 - Sahota , et al. September 2, 2
2003-09-02
Method for forming self-aligned contacts and interconnection lines using dual damascene techniques
Grant 6,359,307 - Wang , et al. March 19, 2
2002-03-19
Method for removing anti-reflective coating layer using plasma etch process before contact CMP
Grant 6,291,296 - Hui , et al. September 18, 2
2001-09-18
Reduction of silicon oxynitride film delamination in integrated circuit inter-level dielectrics
Grant 6,133,619 - Sahota , et al. October 17, 2
2000-10-17
Scalable and reliable integrated circuit inter-level dielectric
Grant 6,124,640 - Sahota , et al. September 26, 2
2000-09-26
Core array and periphery isolation technique
Grant 6,004,862 - Kim , et al. December 21, 1
1999-12-21
Method and system for providing tapered shallow trench isolation structure profile
Grant 5,998,301 - Pham , et al. December 7, 1
1999-12-07
Dopant-independent polysilicon plasma etch
Grant 4,992,134 - Gupta , et al. February 12, 1
1991-02-12

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