Saenger; Annette

Patent Applications and Registrations

Patent applications and USPTO patent grants for Saenger; Annette.The latest application filed is for "monolithically integrated chip including active electrical components and passive electrical components with chip edge stabilization structures".

Company Profile

1.8.12

Saenger; Annette - Villach AT
Saenger; Annette - Singapore SG
Saenger; Annette - Dresden DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Monolithically integrated chip including active electrical components and passive electrical components with chip edge stabilization structures Grant 10,199,372 - Muri , et al. Fe	2019-02-05
Monolithically Integrated Chip Including Active Electrical Components And Passive Electrical Components With Chip Edge Stabilization Structures App 20180374843 - Muri; Ingo ; et al.	2018-12-27
Semiconductor Wafer And Method App 20170170282 - Zechmann; Arno ; et al.	2017-06-15
Photovoltaic Cells Having A Back Side Passivation Layer App 20160111558 - Wong; Wah Chung ; et al.	2016-04-21
Electrode of an integrated circuit Grant 8,344,438 - Schroeder , et al. January 1, 2	2013-01-01
Deposition method for a transition-metal-containing dielectric Grant 7,666,752 - Kudelka , et al. February 23, 2	2010-02-23
Selective deposition method App 20080242097 - Boescke; Tim ; et al.	2008-10-02
Deposition method for a transition-metal-containing dielectric App 20080173919 - Kudelka; Stephan ; et al.	2008-07-24
Method for production of a metallic or metal-containing layer Grant 6,960,524 - Hecht , et al. November 1, 2	2005-11-01
Memory cell arrangement and method of fabricating it Grant 6,943,393 - Miethaner , et al. September 13, 2	2005-09-13
Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes Grant 6,835,417 - Saenger , et al. December 28, 2	2004-12-28
Method for chemical-mechanical polishing of a layer which is a substrate and is a metal selected from a platinum group Grant 6,821,187 - Beitel , et al. November 23, 2	2004-11-23
Process for the deposition of thin layers by chemical vapor deposition Grant 6,767,581 - Saenger July 27, 2	2004-07-27
Method for production of a metallic or metal-containing layer App 20040132313 - Hecht, Thomas ; et al.	2004-07-08
Memory cell arrangement and method for the production thereof App 20040004884 - Miethaner, Stefan ; et al.	2004-01-08
Method and device for depositing thin layers via ALD/CVD processes in combination with rapid thermal processes App 20030175423 - Saenger, Annette ; et al.	2003-09-18
Fabrication of low-resistance electrodes in a deep trench using electrochemical methods App 20030129798 - Saenger, Annette ; et al.	2003-07-10
Method for chemical-mechanical polishing of layers made from metals from the platinum group App 20030092360 - Beitel, Gerhard ; et al.	2003-05-15
Process for the deposition of thin layers by chemical vapor deposition App 20020127338 - Saenger, Annette	2002-09-12
Abrasive slurry and process for a chemical-mechanical polishing of a precious-metal surface App 20020081853 - Beitel, Gerhard ; et al.	2002-06-27

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.