Saanila; Ville Antero

Patent Applications and Registrations

Patent applications and USPTO patent grants for Saanila; Ville Antero.The latest application filed is for "production of elemental films using a boron-containing reducing agent".

Company Profile

0.15.10

Saanila; Ville Antero - Helsinki FI

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for depositing nanolaminate thin films on sensitive surfaces Grant 7,749,871 - Elers , et al. July 6, 2	2010-07-06
Production of elemental films using a boron-containing reducing agent Grant 7,485,340 - Elers , et al. February 3, 2	2009-02-03
Method for depositing nanolaminate thin films on sensitive surfaces Grant 7,329,590 - Elers , et al. February 12, 2	2008-02-12
Production of elemental films using a boron-containing reducing agent App 20070190248 - Elers; Kai-Erik ; et al.	2007-08-16
Production of elemental films using a boron-containing reducing agent Grant 7,144,809 - Elers , et al. December 5, 2	2006-12-05
Method for depositing nanolaminate thin films on sensitive surfaces App 20060079090 - Elers; Kai-Erik ; et al.	2006-04-13
Method for depositing nanolaminate thin films on sensitive surfaces Grant 6,902,763 - Elers , et al. June 7, 2	2005-06-07
Method for depositing nanolaminate thin films on sensitive surfaces App 20050106877 - Elers, Kai-Erik ; et al.	2005-05-19
Production of elemental films using a boron-containing reducing agent App 20050064098 - Elers, Kai-Erik ; et al.	2005-03-24
Method of depositing transition metal nitride thin films Grant 6,863,727 - Elers , et al. March 8, 2	2005-03-08
Method for bottomless deposition of barrier layers in integrated circuit metallization schemes Grant 6,852,635 - Satta , et al. February 8, 2	2005-02-08
Production of elemental thin films using a boron-containing reducing agent Grant 6,821,889 - Elers , et al. November 23, 2	2004-11-23
Deposition of transition metal carbides Grant 6,800,552 - Elers , et al. October 5, 2	2004-10-05
Process for growing metal or metal carbide thin films utilizing boron-containing reducing agents Grant 6,794,287 - Saanila , et al. September 21, 2	2004-09-21
Method for bottomless deposition of barrier layers in integrated circuit metallization schemes App 20040121616 - Satta, Alessandra ; et al.	2004-06-24
Method for bottomless deposition of barrier layers in integrated circuit metallization schemes Grant 6,664,192 - Satta , et al. December 16, 2	2003-12-16
Process for growing metal or metal carbide thin films utilizing boron-containing reducing agents App 20030186495 - Saanila, Ville Antero ; et al.	2003-10-02
Process for growing metalloid thin films utilizing boron-containing reducing agents Grant 6,599,572 - Saanila , et al. July 29, 2	2003-07-29
Deposition of transition metal carbides App 20030031807 - Elers, Kai-Erik ; et al.	2003-02-13
Method of producing elemental thin films App 20020187256 - Elers, Kai-Erik ; et al.	2002-12-12
Deposition of transition metal carbides Grant 6,482,262 - Elers , et al. November 19, 2	2002-11-19
Production of elemental thin films using a boron-containing reducing agent Grant 6,475,276 - Elers , et al. November 5, 2	2002-11-05
Method for bottomless deposition of barrier layers in integrated circuit metallization schemes App 20020155722 - Satta, Alessandra ; et al.	2002-10-24
Method for bottomless deposition of barrier layers in integrated circuit metallization schemes Grant 6,391,785 - Satta , et al. May 21, 2	2002-05-21
Process for growing metalloid thin films App 20010009695 - Saanila, Ville Antero ; et al.	2001-07-26

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