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Field-effect Transistors With Dual Thickness Gate Dielectrics App 20210167180 - Kar; Ayan ;   et al. | 2021-06-03 |
CMOS transistor having different PMOS and NMOS gate electrode structures and method of fabrication thereof Grant 7,348,636 - Ryu , et al. March 25, 2 | 2008-03-25 |
Method of manufacturing a semiconductor device having a gate structure with low parasitic capacitance Grant 7,332,400 - Jin , et al. February 19, 2 | 2008-02-19 |
Trench isolation methods of semiconductor device App 20080032483 - Ryu; Hyuk-Ju ;   et al. | 2008-02-07 |
Method for manufacturing multi-thickness gate dielectric layer of semiconductor device Grant 7,323,420 - Kim , et al. January 29, 2 | 2008-01-29 |
CMOS device with improved performance and method of fabricating the same Grant 7,285,831 - Jung , et al. October 23, 2 | 2007-10-23 |
Method for manufacturing multi-thickness gate dielectric layer of semiconductor device App 20070117391 - Kim; Kyung-soo ;   et al. | 2007-05-24 |
Method for manufacturing multi-thickness gate dielectric layer of semiconductor device Grant 7,179,750 - Kim , et al. February 20, 2 | 2007-02-20 |
Trench isolation methods of semiconductor device App 20060240636 - Ryu; Hyuk-Ju ;   et al. | 2006-10-26 |
Method of manufacturing a semiconductor device having a gate structure with low parasitic capacitance App 20060099766 - Jin; You-Seung ;   et al. | 2006-05-11 |
Method of manufacturing a semiconductor device having a gate structure with low parasitic capacitance Grant 7,008,835 - Jin , et al. March 7, 2 | 2006-03-07 |
CMOS device with improved performance and method of fabricating the same App 20060027876 - Jung; Mu-kyeng ;   et al. | 2006-02-09 |
CMOS transistor having different PMOS and NMOS gate electrode structures and method of fabrication thereof App 20050116297 - Ryu, Hyuk-Ju ;   et al. | 2005-06-02 |
Method of manufacturing a semiconductor device App 20050112834 - Jin, You-Seung ;   et al. | 2005-05-26 |
Method of fabricating semiconductor device having notched gate Grant 6,858,907 - Ryu , et al. February 22, 2 | 2005-02-22 |
CMOS transistor having different PMOS and NMOS gate electrode structures and method of fabrication thereof Grant 6,855,641 - Ryu , et al. February 15, 2 | 2005-02-15 |
Methods of forming integrated circuit devices using buffer layers covering conductive/insulating interfaces App 20040185608 - Oh, Myoung-hwan ;   et al. | 2004-09-23 |
Structure of semiconductor device and method for manufacturing the same Grant 6,764,910 - Ryu , et al. July 20, 2 | 2004-07-20 |
Method for manufacturing multi-thickness gate dielectric layer of semiconductor device App 20040087159 - Kim, Kyung-Soo ;   et al. | 2004-05-06 |
CMOS transistor having different PMOS and NMOS gate electrode structures and method of fabrication thereof App 20030203560 - Ryu, Hyuk-Ju ;   et al. | 2003-10-30 |
Structure of semiconductor device and method for manufacturing the same App 20030151097 - Ryu, Hyuk-Ju ;   et al. | 2003-08-14 |
Structure of semiconductor device and method for manufacturing the same Grant 6,548,862 - Ryu , et al. April 15, 2 | 2003-04-15 |
Structure of semiconductor device and method for manufacturing the same App 20030030103 - Ryu, Hyuk-ju ;   et al. | 2003-02-13 |
Method of fabricating semiconductor device having notched gate App 20020142523 - Ryu, Hyuk-Ju ;   et al. | 2002-10-03 |