| Patent | Date |
|---|
Fabrication of a silicon structure and deep silicon etch with profile control
Grant 9,865,472 - Chebi , et al. January 9, 2 | 2018-01-09 |
Patterning of a hard mask material
Grant 9,514,955 - Guha , et al. December 6, 2 | 2016-12-06 |
Fabrication Of A Silicon Structure And Deep Silicon Etch With Profile Control
App 20160233102 - CHEBI; Robert ; et al. | 2016-08-11 |
Fabrication of a silicon structure and deep silicon etch with profile control
Grant 9,330,926 - Chebi , et al. May 3, 2 | 2016-05-03 |
Pressure control valve assembly of plasma processing chamber and rapid alternating process
Grant 9,267,605 - Abatchev , et al. February 23, 2 | 2016-02-23 |
Patterning Of A Hard Mask Material
App 20150364337 - Guha; Joydeep ; et al. | 2015-12-17 |
Method for achieving smooth side walls after Bosch etch process
Grant 8,871,105 - Winniczek , et al. October 28, 2 | 2014-10-28 |
Controlled gas mixing for smooth sidewall rapid alternating etch process
Grant 8,691,698 - Xu , et al. April 8, 2 | 2014-04-08 |
Method for providing high etch rate
Grant 8,609,548 - Xu , et al. December 17, 2 | 2013-12-17 |
Inorganic rapid alternating process for silicon etch
Grant 8,574,447 - Aso , et al. November 5, 2 | 2013-11-05 |
Method For Achieving Smooth Side Walls After Bosch Etch Process
App 20130237062 - Winniczek; Jaroslaw W. ; et al. | 2013-09-12 |
Controlled Gas Mixing For Smooth Sidewall Rapid Alternating Etch Process
App 20130203256 - Xu; Qing ; et al. | 2013-08-08 |
Use of spectrum to synchronize RF switching with gas switching during etch
Grant 8,440,473 - Xu , et al. May 14, 2 | 2013-05-14 |
Pressure Control Valve Assembly Of Plasma Processing Chamber And Rapid Alternating Process
App 20130115776 - Abatchev; Mirzafer ; et al. | 2013-05-09 |
Method For Providing High Etch Rate
App 20120309194 - Xu; Qing ; et al. | 2012-12-06 |
Use Of Spectrum To Synchronize Rf Switching With Gas Switching During Etch
App 20120309198 - Xu; Qing ; et al. | 2012-12-06 |
Inorganic Rapid Alternating Process For Silicon Etch
App 20110244686 - Aso; Tsuyoshi ; et al. | 2011-10-06 |
Hardmask Open And Etch Profile Control With Hardmask Open
App 20100327413 - Lee; Jong Pil ; et al. | 2010-12-30 |
Method and apparatus for providing mask in semiconductor processing
Grant 7,785,753 - Kim , et al. August 31, 2 | 2010-08-31 |
High aspect ratio etch using modulation of RF powers of various frequencies
Grant 7,749,353 - Rusu , et al. July 6, 2 | 2010-07-06 |
Etch profile control
Grant 7,645,707 - Rusu , et al. January 12, 2 | 2010-01-12 |
Fabrication Of A Silicon Structure And Deep Silicon Etch With Profile Control
App 20090184089 - CHEBI; Robert ; et al. | 2009-07-23 |
Multiple frequency plasma processor method and apparatus
Grant 7,405,521 - Dhindsa , et al. July 29, 2 | 2008-07-29 |
Mask profile control for controlling feature profile
Grant 7,341,953 - Rusu March 11, 2 | 2008-03-11 |
Method And Apparatus For Providing Mask In Semiconductor Processing
App 20070269721 - Kim; Yoojin ; et al. | 2007-11-22 |
Mask profile control for controlling feature profile
App 20070243712 - Rusu; Camelia | 2007-10-18 |
High aspect ratio etch using modulation of RF powers of various frequencies
App 20070012659 - Rusu; Camelia ; et al. | 2007-01-18 |
High aspect ratio etch using modulation of RF powers of various frequencies
Grant 7,144,521 - Rusu , et al. December 5, 2 | 2006-12-05 |
Etch profile control
App 20060226120 - Rusu; Camelia ; et al. | 2006-10-12 |
High aspect ratio etch using modulation of RF powers of various frequencies
App 20060118518 - Rusu; Camelia ; et al. | 2006-06-08 |
Methods of reducing photoresist distortion while etching in a plasma processing system
Grant 6,942,816 - Rusu , et al. September 13, 2 | 2005-09-13 |
Multiple frequency plasma etch reactor
App 20050039682 - Dhindsa, Raj ; et al. | 2005-02-24 |
Methods of reducing photoresist distortion while etching in a plasma processing system
App 20040155012 - Rusu, Camelia ; et al. | 2004-08-12 |
| 