| Patent | Date |
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Hybrid corrective processing system and method
Grant 10,971,411 - LaRose , et al. April 6, 2 | 2021-04-06 |
Methods for additive formation of a STT MRAM stack
Grant 10,665,779 - Russell , et al. | 2020-05-26 |
Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system
Grant 10,256,095 - Chae , et al. | 2019-04-09 |
Hybrid Corrective Processing System And Method
App 20190043766 - LaRose; Joshua ; et al. | 2019-02-07 |
Methods For Additive Formation Of A Stt Mram Stack
App 20190019946 - Russell; Noel ; et al. | 2019-01-17 |
Methods for additive formation of a STT MRAM stack
Grant 10,109,789 - Russell , et al. October 23, 2 | 2018-10-23 |
Hybrid corrective processing system and method
Grant 10,096,527 - LaRose , et al. October 9, 2 | 2018-10-09 |
Method of surface profile correction using gas cluster ion beam
Grant 9,875,947 - Russell , et al. January 23, 2 | 2018-01-23 |
Methods For Additive Formation Of A Stt Mram Stack
App 20170338405 - Russell; Noel ; et al. | 2017-11-23 |
Process gas enhancement for beam treatment of a substrate
Grant 9,735,019 - Graf , et al. August 15, 2 | 2017-08-15 |
Method For High Throughput Using Beam Scan Size And Beam Position In Beam Processing System
App 20170077001 - Chae; Soo Doo ; et al. | 2017-03-16 |
Hybrid Corrective Processing System And Method
App 20170053843 - LaRose; Joshua ; et al. | 2017-02-23 |
Multi-step location specific process for substrate edge profile correction for GCIB system
Grant 9,502,209 - Yue , et al. November 22, 2 | 2016-11-22 |
Sidewall spacer patterning method using gas cluster ion beam
Grant 9,500,946 - Chae , et al. November 22, 2 | 2016-11-22 |
Method Of Surface Profile Correction Using Gas Cluster Ion Beam
App 20160322266 - Russell; Noel ; et al. | 2016-11-03 |
Sidewall Spacer Patterning Method Using Gas Cluster Ion Beam
App 20160222521 - Chae; Soo Doo ; et al. | 2016-08-04 |
Process Gas Enhancement For Beam Treatment Of A Substrate
App 20160071734 - Graf; Michael ; et al. | 2016-03-10 |
Multi-step Location Specific Process For Substrate Edge Profile Correction For Gcib System
App 20150348746 - Yue; Hongyu H. ; et al. | 2015-12-03 |
Apparatus and methods for implementing predicted systematic error correction in location specific processing
Grant 9,123,505 - Lagana-Gizzo , et al. September 1, 2 | 2015-09-01 |
Apparatus And Methods For Implementing Predicted Systematic Error Correction In Location Specific Processing
App 20150243476 - Lagana-Gizzo; Vincent ; et al. | 2015-08-27 |
Multi-step location specific process for substrate edge profile correction for GCIB system
Grant 9,105,443 - Yue , et al. August 11, 2 | 2015-08-11 |
Multi-step Location Specific Process For Substrate Edge Profile Correction For Gcib System
App 20150137006 - Yue; Hongyu H. ; et al. | 2015-05-21 |
Method to alter silicide properties using GCIB treatment
Grant 8,709,944 - Russell , et al. April 29, 2 | 2014-04-29 |
Method to alter silicide properties using GCIB treatment
Grant 8,703,607 - Russell , et al. April 22, 2 | 2014-04-22 |
Method To Alter Silicide Properties Using Gcib Treatment
App 20130230984 - Russell; Noel ; et al. | 2013-09-05 |
Method To Alter Silicide Properties Using Gcib Treatment
App 20130224950 - Russell; Noel ; et al. | 2013-08-29 |
Method to alter silicide properties using GCIB treatment
Grant 8,435,890 - Russell , et al. May 7, 2 | 2013-05-07 |
Gas cluster ion beam system with rapid gas switching apparatus
Grant 8,338,806 - Graf , et al. December 25, 2 | 2012-12-25 |
Method To Alter Silicide Properties Using Gcib Treatment
App 20120238092 - Russell; Noel ; et al. | 2012-09-20 |
Method and system for tilting a substrate during gas cluster ion beam processing
Grant 8,237,136 - Hautala , et al. August 7, 2 | 2012-08-07 |
Ultra-thin film formation using gas cluster ion beam processing
Grant 8,226,835 - Hautala , et al. July 24, 2 | 2012-07-24 |
Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices
Grant 8,192,805 - Russell , et al. June 5, 2 | 2012-06-05 |
Method to alter silicide properties using GCIB treatment
Grant 8,187,971 - Russell , et al. May 29, 2 | 2012-05-29 |
Ultra-low-k dual damascene structure and method of fabricating
App 20120064713 - RUSSELL; Noel ; et al. | 2012-03-15 |
Gas Cluster Ion Beam System With Rapid Gas Switching Apparatus
App 20110272594 - Graf; Michael ; et al. | 2011-11-10 |
Method for treating non-planar structures using gas cluster ion beam processing
Grant 8,048,788 - Hautala , et al. November 1, 2 | 2011-11-01 |
Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices
Grant 7,981,483 - Russell , et al. July 19, 2 | 2011-07-19 |
Method To Alter Silicide Properties Using Gcib Treatment
App 20110117738 - Russell; Noel ; et al. | 2011-05-19 |
Method And System For Tilting A Substrate During Gas Cluster Ion Beam Processing
App 20110084215 - Hautala; John J. ; et al. | 2011-04-14 |
Gas Cluster Ion Beam Processing Method For Preparing An Isolation Layer In Non-planar Gate Structures
App 20110084214 - Hautala; John J. ; et al. | 2011-04-14 |
Method For Treating Non-planar Structures Using Gas Cluster Ion Beam Processing
App 20110084216 - Hautala; John J. ; et al. | 2011-04-14 |
Method of forming semiconductor devices containing metal cap layers
Grant 7,871,929 - Russell , et al. January 18, 2 | 2011-01-18 |
Metal-germanium physical vapor deposition for semiconductor device defect reduction
Grant 7,803,703 - Yue , et al. September 28, 2 | 2010-09-28 |
Ultra-thin Film Formation Using Gas Cluster Ion Beam Processing
App 20100227142 - Hautala; John J. ; et al. | 2010-09-09 |
Method of forming semiconductor devices containing metal cap layers
Grant 7,776,743 - Russell , et al. August 17, 2 | 2010-08-17 |
Method to improve a copper/dielectric interface in semiconductor devices
Grant 7,754,588 - Russell , et al. July 13, 2 | 2010-07-13 |
Method Of Forming Semiconductor Devices Containing Metal Cap Layers
App 20100029071 - Russell; Noel ; et al. | 2010-02-04 |
Method Of Forming Semiconductor Devices Containing Metal Cap Layers
App 20100029078 - Russell; Noel ; et al. | 2010-02-04 |
Method And System For Depositing Silicon Carbide Film Using A Gas Cluster Ion Beam
App 20090233004 - Sherman; Steven ; et al. | 2009-09-17 |
Method To Improve Electrical Leakage Performance And To Minimize Electromigration In Semiconductor Devices
App 20090104754 - Russell; Noel ; et al. | 2009-04-23 |
Method To Improve A Copper/dielectric Interface In Semiconductor Devices
App 20090087969 - Russell; Noel ; et al. | 2009-04-02 |
Method To Improve Electrical Leakage Performance And To Minimize Electromigration In Semiconductor Devices
App 20090087577 - Russell; Noel ; et al. | 2009-04-02 |
Metal-germanium Physical Vapor Deposition For Semiconductor Device Defect Reduction
App 20080311747 - Yue; Doufeng ; et al. | 2008-12-18 |
Metal-germanium physical vapor deposition for semiconductor device defect reduction
Grant 7,435,672 - Yue , et al. October 14, 2 | 2008-10-14 |
Metal-halogen physical vapor deposition for semiconductor device defect reduction
Grant 7,208,398 - Chen , et al. April 24, 2 | 2007-04-24 |
Metal-germanium physical vapor deposition for semiconductor device defect reduction
App 20060024963 - Yue; Doufeng ; et al. | 2006-02-02 |
Metal-halogen physical vapor deposition for semiconductor device defect reduction
App 20050208762 - Chen, Peijun J. ; et al. | 2005-09-22 |
Methods and semiconductor devices with wiring layer fill structures to improve planarization uniformity
Grant 6,693,357 - Borst , et al. February 17, 2 | 2004-02-17 |
Method for improving barrier properties of refractory metals/metal nitrides with a safer alternative to silane
App 20020072227 - Russell, Noel ; et al. | 2002-06-13 |
Method for forming titanium aluminum nitride layers
Grant 6,235,631 - Russell May 22, 2 | 2001-05-22 |
PVD deposition process for CVD aluminum liner processing
Grant 5,981,382 - Konecni , et al. November 9, 1 | 1999-11-09 |
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