Runstadler, Jr.; William Eugene
Patent Applications and Registrations
Patent applications and USPTO patent grants for Runstadler, Jr.; William Eugene.The latest application filed is for "system for accurate alignment of wafers for ion implantation".
- Runstadler, Jr.; William Eugene - Livermore CA
| Patent | Date |
|---|---|
| Wafer plate and mask arrangement for substrate fabrication Grant 10,679,883 - Bluck , et al. | 2020-06-09 |
| System of height and alignment rollers for precise alignment of wafers for ion implantation Grant 10,559,710 - Runstadler, Jr. , et al. Feb | 2020-02-11 |
| Patterned chuck for substrate processing Grant 10,446,430 - Bluck , et al. Oc | 2019-10-15 |
| In line fan out system Grant 10,418,260 - Bluck , et al. Sept | 2019-09-17 |
| System For Accurate Alignment Of Wafers For Ion Implantation App 20190027636 - Runstadler, JR.; William Eugene ; et al. | 2019-01-24 |
| In Line Fan Out System App 20180061689 - Bluck; Terry ; et al. | 2018-03-01 |
| Patterned Chuck For Substrate Processing App 20170236740 - Bluck; Terry ; et al. | 2017-08-17 |
| Wafer Plate And Mask Arrangement For Substrate Fabrication App 20170062258 - Bluck; Terry ; et al. | 2017-03-02 |
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