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Ruda; Krzysztof Patent Filings

Ruda; Krzysztof

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ruda; Krzysztof.The latest application filed is for "method of plasma processing a substrate in a plasma chamber and plasma processing system".

Company Profile
3.1.4
  • Ruda; Krzysztof - Warsaw PL
  • Ruda; Krzysztof - Zielonka PL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Controlling multiple plasma processes
Grant 11,430,642 - Engelstaedter , et al. August 30, 2
2022-08-30
Method Of Plasma Processing A Substrate In A Plasma Chamber And Plasma Processing System
App 20220208532 - Gajewski; Wojciech ;   et al.
2022-06-30
Method Of Adjusting The Output Power Of A Power Supply Supplying Electrical Power To A Plasma, Plasma Apparatus And Power Supply
App 20220115207 - Swiatnicki; Jakub ;   et al.
2022-04-14
Controlling Multiple Plasma Processes
App 20200066497 - Engelstaedter; Jan Peter ;   et al.
2020-02-27
Controlling Multiple Plasma Processes
App 20200058475 - Engelstaedter; Jan Peter ;   et al.
2020-02-20

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