Patent | Date |
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Reduced electromigration and stressed induced migration of copper wires by surface coating Grant 7,468,320 - Hu , et al. December 23, 2 | 2008-12-23 |
Manufacturable CoWP metal cap process for copper interconnects Grant 7,407,605 - Restaino , et al. August 5, 2 | 2008-08-05 |
Metal Alloy Layer Over Conductive Region Of Transistor Device Of Different Conductive Material Than Conductive Region App 20070284654 - Rubino; Judith M. ;   et al. | 2007-12-13 |
MANUFACTURABLE CoWP METAL CAP PROCESS FOR COPPER INTERCONNECTS App 20070215842 - Restaino; Darryl D. ;   et al. | 2007-09-20 |
Ferromagnetic liner for conductive lines of magnetic memory cells Grant 7,259,025 - Leuschner , et al. August 21, 2 | 2007-08-21 |
Manufacturable CoWP metal cap process for copper interconnects Grant 7,253,106 - Restaino , et al. August 7, 2 | 2007-08-07 |
Electroplated CoWP composite structures as copper barrier layers Grant 7,217,655 - Cabral, Jr. , et al. May 15, 2 | 2007-05-15 |
Ferromagnetic liner for conductive lines of magnetic memory cells App 20070105241 - Leuschner; Rainer ;   et al. | 2007-05-10 |
Electroplated CoWP composite structures as copper barrier layers Grant 7,193,323 - Cabral, Jr. , et al. March 20, 2 | 2007-03-20 |
Self-aligned corrosion stop for copper C4 and wirebond Grant 7,081,680 - Edelstein , et al. July 25, 2 | 2006-07-25 |
MANUFACTURABLE CoWP METAL CAP PROCESS FOR COPPER INTERCONNECTS App 20060134911 - Restaino; Darryl D. ;   et al. | 2006-06-22 |
Copper recess process with application to selective capping and electroless plating Grant 7,064,064 - Chen , et al. June 20, 2 | 2006-06-20 |
Ferromagnetic liner for conductive lines of magnetic memory cells App 20060022286 - Leuschner; Rainer ;   et al. | 2006-02-02 |
Copper recess process with application to selective capping and electroless plating Grant 6,975,032 - Chen , et al. December 13, 2 | 2005-12-13 |
Copper recess process with application to selective capping and electroless plating App 20050158985 - Chen, Shyng-Tsong ;   et al. | 2005-07-21 |
Electroplated CoWP composite structures as copper barrier layers App 20050127518 - Cabral, Cyril JR. ;   et al. | 2005-06-16 |
Electroplated CoWP composite structures as copper barrier layers App 20050104216 - Cabral, Cyril JR. ;   et al. | 2005-05-19 |
Self-aligned corrosion stop for copper C4 and wirebond App 20040234679 - Edelstein, Daniel C. ;   et al. | 2004-11-25 |
Self-aligned corrosion stop for copper C4 and wirebond Grant 6,779,711 - Edelstein , et al. August 24, 2 | 2004-08-24 |
Copper recess process with application to selective capping and electroless plating App 20040113279 - Chen, Shyng-Tsong ;   et al. | 2004-06-17 |
Method for testing chips on flat solder bumps App 20040087046 - Datta, Madhav ;   et al. | 2004-05-06 |
Method for testing chips on flat solder bumps Grant 6,656,750 - Datta , et al. December 2, 2 | 2003-12-02 |
Self-aligned corrosion stop for copper C4 and wirebond App 20030072928 - Edelstein, Daniel C. ;   et al. | 2003-04-17 |
Process to increase reliability CuBEOL structures Grant 6,503,834 - Chen , et al. January 7, 2 | 2003-01-07 |
Process for manufacturing self-aligned corrosion stop for copper C4 and wirebond Grant 6,457,234 - Edelstein , et al. October 1, 2 | 2002-10-01 |
Electroless metal liner formation methods App 20020081842 - Sambucetti, Carlos J. ;   et al. | 2002-06-27 |
Method for preparing a conductive pad for electrical connection and conductive pad formed Grant 6,335,104 - Sambucetti , et al. January 1, 2 | 2002-01-01 |
RFID transponders with paste antennas and flip-chip attachment Grant 6,259,408 - Brady , et al. July 10, 2 | 2001-07-10 |