ROTERS; Georg

Patent Applications and Registrations

Patent applications and USPTO patent grants for ROTERS; Georg.The latest application filed is for "method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures".

Company Profile

0.6.7

ROTERS; Georg - Duelmen DE
Roters; Georg - Dulmen DE
Roters; Georg - Dumen DE
Roters, Georg - Strasse DE

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method And Apparatus For Growing Thin Oxide Films On Silicon While Minimizing Impact On Existing Structures App 20120298039 - PEUSE; Bruce W. ; et al.	2012-11-29
Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures Grant 8,236,706 - Peuse , et al. August 7, 2	2012-08-07
Method And Apparatus For Growing Thin Oxide Films On Silicon While Minimizing Impact On Existing Structures App 20100151694 - Peuse; Bruce W. ; et al.	2010-06-17
Device and method for thermally treating semiconductor wafers Grant 7,151,060 - Roters , et al. December 19, 2	2006-12-19
Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment Grant 7,144,826 - Roters , et al. December 5, 2	2006-12-05
Method for thermally treating a substrate that comprises several layers Grant 7,144,747 - Chung , et al. December 5, 2	2006-12-05
Method of forming and/or modifying a dielectric film on a semiconductor surface Grant 7,101,812 - Eisele , et al. September 5, 2	2006-09-05
Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates Grant 7,094,637 - Storbeck , et al. August 22, 2	2006-08-22
Device and method for thermally treating semiconductor wafers App 20060105584 - Roters; Georg ; et al.	2006-05-18
Method for thermally treating a substrate that comprises several layers App 20040209483 - Chung, Hin Yiu ; et al.	2004-10-21
Method and apparatus for the production of process gases App 20040137754 - Roters, Georg ; et al.	2004-07-15
Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates App 20040121569 - Storbeck, Olaf ; et al.	2004-06-24
Method of forming and/or modifying a dielectric film on a semiconductor surface App 20040058557 - Eisele, Ignaz ; et al.	2004-03-25

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