Patent | Date |
---|
Color-map Method To Eliminate Qubit Frequency Crowding In A Quantum Computing Chip App 20220058509 - Hertzberg; Jared Barney ;   et al. | 2022-02-24 |
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns Grant 10,915,686 - Rosenbluth February 9, 2 | 2021-02-09 |
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns Grant 10,872,188 - Rosenbluth December 22, 2 | 2020-12-22 |
Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns App 20200074031 - Rosenbluth; Alan E. | 2020-03-05 |
Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns App 20200074032 - Rosenbluth; Alan E. | 2020-03-05 |
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns Grant 10,437,950 - Rosenbluth O | 2019-10-08 |
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns Grant 10,394,984 - Rosenbluth A | 2019-08-27 |
Tool to provide integrated circuit masks with accurate dimensional compensation of patterns Grant 10,210,295 - Rosenbluth Feb | 2019-02-19 |
Figurative Models Calibrated To Correct Errors In Process Models App 20180322228 - KUMAR; Pardeep ;   et al. | 2018-11-08 |
Figurative models calibrated to correct errors in process models Grant 10,120,963 - Kumar , et al. November 6, 2 | 2018-11-06 |
Method and program product for designing source and mask for lithography Grant 9,857,676 - Inoue , et al. January 2, 2 | 2018-01-02 |
Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns App 20170270230 - Rosenbluth; Alan E. | 2017-09-21 |
Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns App 20170147733 - Rosenbluth; Alan E. | 2017-05-25 |
Tool To Provide Integrated Circuit Masks With Accurate Dimensional Compensation Of Patterns App 20170147734 - Rosenbluth; Alan E. | 2017-05-25 |
Source, target and mask optimization by incorporating contour based assessments and integration over process variations Grant 9,651,856 - Inoue , et al. May 16, 2 | 2017-05-16 |
Synthesizing low mask error enhancement factor lithography solutions Grant 9,395,622 - Inoue , et al. July 19, 2 | 2016-07-19 |
Source, Target And Mask Optimization By Incorporating Contour Based Assessments And Integration Over Process Variations App 20160109795 - INOUE; TADANOBU ;   et al. | 2016-04-21 |
Method And Program Product For Designing Source And Mask For Lithography App 20160103389 - Inoue; Tadanobu ;   et al. | 2016-04-14 |
Mask that provides improved focus control using orthogonal edges Grant 9,310,674 - Azpiroz , et al. April 12, 2 | 2016-04-12 |
Source, target and mask optimization by incorporating countour based assessments and integration over process variations Grant 9,250,535 - Inoue , et al. February 2, 2 | 2016-02-02 |
Mask That Provides Improved Focus Control Using Orthogonal Edges App 20150234269 - Azpiroz; Jaione Tirapu ;   et al. | 2015-08-20 |
Synthesizing Low Mask Error Enhancement Factor Lithography Solutions App 20150234970 - Inoue; Tadanobu ;   et al. | 2015-08-20 |
Mask design method, program, and mask design system Grant 8,959,462 - Inoue , et al. February 17, 2 | 2015-02-17 |
Source-mask optimization for a lithography process Grant 8,954,898 - Inoue , et al. February 10, 2 | 2015-02-10 |
Printing Process Calibration And Correction App 20140380255 - Barai; Samit ;   et al. | 2014-12-25 |
Printing process calibration and correction Grant 8,910,089 - Barai , et al. December 9, 2 | 2014-12-09 |
Analyzing a patterning process using a model of yield Grant 8,880,382 - Bagheri , et al. November 4, 2 | 2014-11-04 |
Source, Target And Mask Optimization By Incorporating Countour Based Assessments And Integration Over Process Variations App 20140268075 - Inoue; Tadanobu ;   et al. | 2014-09-18 |
Source-mask Optimization For A Lithography Process App 20140282291 - Inoue; Tadanobu ;   et al. | 2014-09-18 |
Method for determining mask operation activities Grant 8,769,445 - Gallagher , et al. July 1, 2 | 2014-07-01 |
Optimizing lithographic mask for manufacturability in efficient manner Grant 8,719,735 - Sakamoto , et al. May 6, 2 | 2014-05-06 |
Analyzing a patterning process using a model of yield Grant 8,682,634 - Bagheri , et al. March 25, 2 | 2014-03-25 |
Constrained optimization of lithographic source intensities under contingent requirements Grant 8,605,254 - Bagheri , et al. December 10, 2 | 2013-12-10 |
Mask Design Method, Program, And Mask Design System App 20130263063 - Inoue; Tadanobu ;   et al. | 2013-10-03 |
Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge Grant 8,539,390 - Inoue , et al. September 17, 2 | 2013-09-17 |
System and method for projection lithography with immersed image-aligned diffractive element Grant 8,537,444 - Gil , et al. September 17, 2 | 2013-09-17 |
Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process Grant 8,495,528 - Bagheri , et al. July 23, 2 | 2013-07-23 |
Analyzing A Patterning Process Using A Model Of Yield App 20130185045 - BAGHERI; Saeed ;   et al. | 2013-07-18 |
Analyzing A Patterning Process Using A Model Of Yield App 20130185046 - Bagheri; Saeed ;   et al. | 2013-07-18 |
Wavefront engineering of mask data for semiconductor device design Grant 8,453,076 - Inoue , et al. May 28, 2 | 2013-05-28 |
Fracturing continuous photolithography masks Grant 8,448,098 - Liu , et al. May 21, 2 | 2013-05-21 |
System And Method For Projection Lithography With Immersed Image-aligned Diffractive Element App 20130071774 - Gil; Dario ;   et al. | 2013-03-21 |
Method for optimizing source and mask to control line width roughness and image log slope Grant 8,372,565 - Tian , et al. February 12, 2 | 2013-02-12 |
Optimizing lithographic mask for manufacturability in efficient manner App 20130019211 - Sakamoto; Masaharu ;   et al. | 2013-01-17 |
Method to match exposure tools using a programmable illuminator Grant 8,351,037 - Azpiroz , et al. January 8, 2 | 2013-01-08 |
EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layer Grant 8,271,910 - Tirapu-Azpiroz , et al. September 18, 2 | 2012-09-18 |
Dynamic provisional decomposition of lithographic patterns having different interaction ranges Grant 8,266,554 - Bagheri , et al. September 11, 2 | 2012-09-11 |
Fracturing continuous photolithography masks Grant 8,266,556 - Liu , et al. September 11, 2 | 2012-09-11 |
Fracturing Continuous Photolithography Masks App 20120210281 - LIU; YING ;   et al. | 2012-08-16 |
Fast method to model photoresist images using focus blur and resist blur Grant 8,238,644 - Brunner , et al. August 7, 2 | 2012-08-07 |
Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge App 20120196210 - Inoue; Tadanobu ;   et al. | 2012-08-02 |
Method for fast estimation of lithographic binding patterns in an integrated circuit layout Grant 8,234,603 - Bagheri , et al. July 31, 2 | 2012-07-31 |
Reflective Film Interface To Restore Transverse Magnetic Wave Contrast In Lithographic Processing App 20120092633 - Lai; Kafai ;   et al. | 2012-04-19 |
Fast and accurate method to simulate intermediate range flare effects Grant 8,161,422 - Mukherjee , et al. April 17, 2 | 2012-04-17 |
Method For Generating A Plurality Of Optimized Wavefronts For A Multiple Exposure Lithographic Process App 20120077130 - Bagheri; Saeed ;   et al. | 2012-03-29 |
Method For Determining Mask Operation Activities App 20120070064 - Gallagher; Emily E. ;   et al. | 2012-03-22 |
Method For Optimizing Source And Mask To Control Line Width Roughness And Image Log Slope App 20120052418 - Tian; Kehan ;   et al. | 2012-03-01 |
Reflective film interface to restore transverse magnetic wave contrast in lithographic processing Grant 8,125,618 - Lai , et al. February 28, 2 | 2012-02-28 |
Dynamic Provisional Decomposition Of Lithographic Patterns Having Different Interaction Ranges App 20120047471 - Bagheri; Saeed ;   et al. | 2012-02-23 |
Fracturing Continuous Photolithography Masks App 20120036487 - LIU; YING ;   et al. | 2012-02-09 |
Method for forming arbitrary lithographic wavefronts using standard mask technology Grant 8,108,802 - Rosenbluth , et al. January 31, 2 | 2012-01-31 |
Method For Fast Estimation Of Lithographic Binding Patterns In An Integrated Circuit Layout App 20120017194 - Bagheri; Saeed ;   et al. | 2012-01-19 |
Method To Match Exposure Tools Using A Programmable Illuminator App 20120008134 - Azpiroz; Jaione Tirapu ;   et al. | 2012-01-12 |
Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations Grant 8,078,995 - Tirapu Azpiroz , et al. December 13, 2 | 2011-12-13 |
Rendering a mask using coarse mask representation Grant 8,073,288 - Lavin , et al. December 6, 2 | 2011-12-06 |
Method and system for obtaining bounds on process parameters for OPC-verification Grant 8,059,884 - Mukherjee , et al. November 15, 2 | 2011-11-15 |
Calculating image intensity of mask by decomposing Manhattan polygon based on parallel edge Grant 8,059,885 - Tirapu-Azpiroz , et al. November 15, 2 | 2011-11-15 |
Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask Grant 8,056,026 - Inoue , et al. November 8, 2 | 2011-11-08 |
Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask Grant 8,056,023 - Inoue , et al. November 8, 2 | 2011-11-08 |
Emf Correction Model Calibration Using Asymmetry Factor Data Obtained From Aerial Images Or A Patterned Layer App 20110239169 - Tirapu-Azpiroz; Jaione ;   et al. | 2011-09-29 |
Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale Grant 8,028,254 - Inoue , et al. September 27, 2 | 2011-09-27 |
Wavefront engineering of mask data for semiconductor device design App 20110231803 - Inoue; Tadanobu ;   et al. | 2011-09-22 |
Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks Grant 7,975,244 - Mukherjee , et al. July 5, 2 | 2011-07-05 |
Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images Grant 7,969,554 - Melville , et al. June 28, 2 | 2011-06-28 |
High contrast lithographic masks Grant 7,944,545 - Bagheri , et al. May 17, 2 | 2011-05-17 |
Constrained Optimization Of Lithographic Source Intensities Under Contingent Requirements App 20110096313 - Bagheri; Saeed ;   et al. | 2011-04-28 |
Data correcting hierarchical integrated circuit layout accommodating compensate for long range critical dimension variation Grant 7,844,938 - Rosenbluth , et al. November 30, 2 | 2010-11-30 |
Simultaneous computation of multiple points on one or multiple cut lines Grant 7,840,057 - Gallatin , et al. November 23, 2 | 2010-11-23 |
High Contrast Lithographic Masks App 20100283982 - Bagheri; Saeed ;   et al. | 2010-11-11 |
Method For Forming Arbitrary Lithographic Wavefronts Using Standard Mask Technology App 20100281449 - RosenBluth; Alan E. ;   et al. | 2010-11-04 |
Performance in model-based OPC engine utilizing efficient polygon pinning method Grant 7,774,737 - Gallatin , et al. August 10, 2 | 2010-08-10 |
Performance in model-based OPC engine utilizing efficient polygon pinning method Grant 7,761,839 - Gallatin , et al. July 20, 2 | 2010-07-20 |
Efficient Isotropic Modeling Approach To Incorporate Electromagnetic Effects Into Lithographic Process Simulations App 20100175042 - Tirapu Azpiroz; Jaione ;   et al. | 2010-07-08 |
Fast And Accurate Method To Simulate Intermediate Range Flare Effects App 20100175043 - Mukherjee; Maharaj ;   et al. | 2010-07-08 |
Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask App 20100153901 - Inoue; Tadanobu ;   et al. | 2010-06-17 |
Determining Manufacturability Of Lithographic Mask Using Continuous Derivatives Characterizing The Manufacturability On A Continuous Scale App 20100153903 - Inoue; Tadanobu ;   et al. | 2010-06-17 |
Determining Manufacturability Of Lithographic Mask By Selecting Target Edge Pairs Used In Determining A Manufacturing Penalty Of The Lithographic Mask App 20100153902 - Inoue; Tadanobu ;   et al. | 2010-06-17 |
Reflective film interface to restore transverse magnetic wave contrast in lithographic processing Grant 7,736,841 - Lai , et al. June 15, 2 | 2010-06-15 |
Step-walk relaxation method for global optimization of masks Grant 7,685,559 - Rosenbluth March 23, 2 | 2010-03-23 |
System And Method For Projection Lithography With Immersed Image-aligned Diffractive Element App 20100003605 - Gil; Dario ;   et al. | 2010-01-07 |
Data Correcting Hierarchical Integrated Circuit Layout Accommodating Compensate For Long Range Critical Dimension Variation App 20090271757 - Rosenbluth; Alan E. ;   et al. | 2009-10-29 |
Step-walk relaxation method for global optimization of masks Grant 7,587,702 - Rosenbluth September 8, 2 | 2009-09-08 |
Step-Walk Relaxation Method for Global Optimization of Masks App 20090199150 - Rosenbluth; Alan E. | 2009-08-06 |
Methodology And System For Determining Numerical Errors In Pixel-based Imaging Simulation In Designing Lithographic Masks App 20090193387 - Mukherjee; Maharaj ;   et al. | 2009-07-30 |
Calculating Image Intensity Of Mask By Decomposing Manhattan Polygon Based On Parallel Edge App 20090185740 - Tirapu-Azpiroz; Jaione ;   et al. | 2009-07-23 |
Rendering A Mask Using Coarse Mask Representation App 20090180711 - Lavin; Mark A. ;   et al. | 2009-07-16 |
Method and System for Obtaining Bounds on Process Parameters for OPC-Verification App 20090123057 - Mukherjee; Maharaj ;   et al. | 2009-05-14 |
Printability verification by progressive modeling accuracy Grant 7,512,927 - Gallatin , et al. March 31, 2 | 2009-03-31 |
Reflective Film Interface To Restore Transverse Magnetic Wave Contrast In Lithographic Processing App 20090040486 - Lai; Kafai ;   et al. | 2009-02-12 |
Method, Computer Program, Apparatus and System Providing Printing for an Illumination Mask for Three-Dimensional Images App 20090021718 - Melville; David O. S. ;   et al. | 2009-01-22 |
Reflective Film Interface To Restore Transverse Magnetic Wave Contrast In Lithographic Processing App 20090011371 - Lai; Kafai ;   et al. | 2009-01-08 |
Reflective film interface to restore transverse magnetic wave contrast in lithographic processing Grant 7,470,504 - Lai , et al. December 30, 2 | 2008-12-30 |
Renesting interaction map into design for efficient long range calculations Grant 7,434,196 - Gallatin , et al. October 7, 2 | 2008-10-07 |
Step-Walk Relaxation Method for Global Optimization of Masks App 20080184189 - Rosenbluth; Alan E. | 2008-07-31 |
Printability Verification By Progressive Modeling Accuracy App 20080127027 - Gallatin; Gregg M. ;   et al. | 2008-05-29 |
Simultaneous computation of multiple points on one or multiple cut lines Grant 7,366,342 - Gallatin , et al. April 29, 2 | 2008-04-29 |
Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare Grant 7,343,271 - Gallatin , et al. March 11, 2 | 2008-03-11 |
Optical proximity correction using progressively smoothed mask shapes Grant 7,343,582 - Mukherjee , et al. March 11, 2 | 2008-03-11 |
Performance In Model-based Opc Engine Utilizing Efficient Polygon Pinning Method App 20080059939 - Gallatin; Gregg M. ;   et al. | 2008-03-06 |
Simultaneous Computation Of Multiple Points On One Or Multiple Cut Lines App 20080037858 - Gallatin; Gregg M. ;   et al. | 2008-02-14 |
Performance in model-based OPC engine utilizing efficient polygon pinning method Grant 7,287,239 - Gallatin , et al. October 23, 2 | 2007-10-23 |
Fast method to model photoresist images using focus blur and resist blur App 20070224526 - Brunner; Timothy A. ;   et al. | 2007-09-27 |
Performance In Model-based Opc Engine Utilizing Efficient Polygon Pinning Method App 20070226677 - Gallatin; GreggM ;   et al. | 2007-09-27 |
Lithographic process window optimization under complex constraints on edge placement Grant 7,269,817 - Heng , et al. September 11, 2 | 2007-09-11 |
Reflective film interface to restore transverse magnetic wave contrast in lithographic processing App 20070099122 - Lai; Kafai ;   et al. | 2007-05-03 |
Optical proximity correction using progressively smoothed mask shapes App 20060271905 - Mukherjee; Maharaj ;   et al. | 2006-11-30 |
Fast and accurate optical proximity correction engine for incorporating long range flare effects Grant 7,131,104 - Gallatin , et al. October 31, 2 | 2006-10-31 |
Stability of ion beam generated alignment layers by surface modification Grant 7,097,884 - Callegari , et al. August 29, 2 | 2006-08-29 |
Fast model-based optical proximity correction Grant 7,079,223 - Rosenbluth , et al. July 18, 2 | 2006-07-18 |
Liquid crystal structure with improved black state, and projector using same Grant 7,057,686 - Ho , et al. June 6, 2 | 2006-06-06 |
Renesting interaction map into design for efficient long range calculations Grant 7,055,126 - Gallatin , et al. May 30, 2 | 2006-05-30 |
Extending the range of lithographic simulation integrals Grant 7,010,776 - Gallatin , et al. March 7, 2 | 2006-03-07 |
Renesting interaction map into design for efficient long range calculations App 20060041851 - Gallatin; Gregg M. ;   et al. | 2006-02-23 |
Contact Hole Printing Method And Apparatus With Single Mask, Multiple Exposures, And Optimized Pupil Filtering App 20050287483 - Lercel, Michael ;   et al. | 2005-12-29 |
Fast and accurate optical proximity correction engine for incorporating long range flare effects App 20050257187 - Gallatin, Gregg M. ;   et al. | 2005-11-17 |
Fast model-based optical proximity correction App 20050185159 - Rosenbluth, Alan E. ;   et al. | 2005-08-25 |
Lithographic process window optimization under complex constraints on edge placement App 20050177810 - Heng, Fook-Luen ;   et al. | 2005-08-11 |
Incorporation of a phase map into fast model-based optical proximity correction simulation kernels to account for near and mid-range flare App 20050091013 - Gallatin, Gregg M. ;   et al. | 2005-04-28 |
Extending the range of lithographic simulation integrals App 20050091631 - Gallatin, Gregg M. ;   et al. | 2005-04-28 |
Renesting interaction map into design for efficient long range calculations App 20050091634 - Gallatin, Gregg M. ;   et al. | 2005-04-28 |
Performance in model-based OPC engine utilizing efficient polygon pinning method App 20050091014 - Gallatin, Gregg M. ;   et al. | 2005-04-28 |
Simultaneous computation of multiple points on one or multiple cut lines App 20050089211 - Gallatin, Gregg M. ;   et al. | 2005-04-28 |
Integrated lithographic print and detection model for optical CD Grant 6,869,739 - Ausschnitt , et al. March 22, 2 | 2005-03-22 |
Liquid crystal structure with improved black state, and projector using same App 20050001958 - Ho, Kenneth C. ;   et al. | 2005-01-06 |
Reflective light valve Grant 6,798,475 - Ho , et al. September 28, 2 | 2004-09-28 |
Stability of ion beam generated alignment layers by surface modification App 20040086662 - Callegari, Alessandro C. ;   et al. | 2004-05-06 |
Method for forming alignment layer by ion beam surface modification Grant 6,665,033 - Callegari , et al. December 16, 2 | 2003-12-16 |
System and method for extending light valve lifetime in liquid crystal display devices App 20030210371 - Chaudhari, Praveen ;   et al. | 2003-11-13 |
System and method for printing semiconductor patterns using an optimized illumination and reticle Grant 6,563,566 - Rosenbluth , et al. May 13, 2 | 2003-05-13 |
System and method for printing semiconductor patterns using an optimized illumination and reticle App 20020140920 - Rosenbluth, Alan E. ;   et al. | 2002-10-03 |
Stability of ion beam generated alignment layers by surface modification App 20020063830 - Callegari, Alessandro C. ;   et al. | 2002-05-30 |
Micromechanical display and fabrication method Grant 6,377,233 - Colgan , et al. April 23, 2 | 2002-04-23 |
Micromechanical displays and fabrication method App 20020000959 - Colgan, Evan G. ;   et al. | 2002-01-03 |
Micromechanical displays and fabrication method Grant 6,323,834 - Colgan , et al. November 27, 2 | 2001-11-27 |
High performance projection display with two light valves Grant 5,517,340 - Doany , et al. May 14, 1 | 1996-05-14 |
CCD based confocal filtering for improved accuracy in x-ray proximity alignment Grant 5,452,090 - Progler , et al. September 19, 1 | 1995-09-19 |
Ablation mask and use thereof Grant 5,298,351 - Bobroff , et al. March 29, 1 | 1994-03-29 |
Beamsplitter type lens elements with pupil-plane stops for lithographic systems Grant 5,274,420 - Chastang , et al. December 28, 1 | 1993-12-28 |
Optical projection system Grant 5,159,172 - Goodman , et al. October 27, 1 | 1992-10-27 |
Lithographic process having improved image quality Grant 4,902,899 - Lin , et al. February 20, 1 | 1990-02-20 |
Normal incidence x-ray reflectors and resonant cavities for supporting laser action using the same Grant 4,317,043 - Rosenbluth , et al. February 23, 1 | 1982-02-23 |