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Patent applications and USPTO patent grants for Roithner; Klaus.The latest application filed is for "spatially uniform gas supply and pump configuration for large wafer diameters".
Patent | Date |
---|---|
Spatially uniform gas supply and pump configuration for large wafer diameters Grant 6,537,418 - Muller , et al. March 25, 2 | 2003-03-25 |
Distribution plate for a reaction chamber with multiple gas inlets and separate mass flow control loops Grant 6,294,026 - Roithner , et al. September 25, 2 | 2001-09-25 |
Pad stack with a poly SI etch stop for TEOS mask removal with RIE Grant 5,776,808 - Muller , et al. July 7, 1 | 1998-07-07 |
Enhanced deep trench storage node capacitance for DRAM Grant 5,592,412 - Kleinhenz , et al. January 7, 1 | 1997-01-07 |
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