loadpatents
name:-0.004249095916748
name:-0.0093321800231934
name:-0.00050783157348633
Roh; Chi Hyeong Patent Filings

Roh; Chi Hyeong

Patent Applications and Registrations

Patent applications and USPTO patent grants for Roh; Chi Hyeong.The latest application filed is for "novel polymers for photoresist and photoresist compositions using the same".

Company Profile
0.9.3
  • Roh; Chi Hyeong - Ichon-shi KR
  • Roh; Chi Hyeong - Kyoungki-do KR
  • Roh; Chi Hyeong - Kyungki-do KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Polymers for photoresist and photoresist compositions using the same
Grant 6,987,155 - Roh , et al. January 17, 2
2006-01-17
Novel polymers for photoresist and photoresist compositions using the same
App 20030191259 - Roh, Chi Hyeong ;   et al.
2003-10-09
Photoresist monomers, polymers thereof and photoresist compositions containing the same
Grant 6,602,649 - Roh , et al. August 5, 2
2003-08-05
Polymers for photoresist and photoresist compositions using the same
Grant 6,569,971 - Roh , et al. May 27, 2
2003-05-27
Novel Polymers For Photoresist And Photoresist Compositions Using The Same
App 20020049287 - ROH, CHI HYEONG ;   et al.
2002-04-25
Photoresist monomers, polymers thereof and photoresist compositions containing the same
App 20020015912 - Roh, Chi Hyeong ;   et al.
2002-02-07
Polymer and a forming method of a micro pattern using the same
Grant 6,316,162 - Jung , et al. November 13, 2
2001-11-13
Amide- or imide-introduced copolymer, preparation thereof and a photoresist comprising the same
Grant 6,316,565 - Jung , et al. November 13, 2
2001-11-13
Monomers for photoresist, polymers thereof, and photoresist compositions using the same
Grant 6,291,131 - Jung , et al. September 18, 2
2001-09-18
Polymer and a forming method of a micro pattern using the same
Grant 6,225,020 - Jung , et al. May 1, 2
2001-05-01
Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
Grant 6,150,069 - Jung , et al. November 21, 2
2000-11-21
Method and device using ArF photoresist
Grant 6,045,967 - Jung , et al. April 4, 2
2000-04-04

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