Roflox; Isabelita

Patent Applications and Registrations

Patent applications and USPTO patent grants for Roflox; Isabelita.The latest application filed is for "post-deposition treatment methods for silicon nitride".

Company Profile

0.6.9

Roflox; Isabelita - Union City CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Post-Deposition Treatment Methods For Silicon Nitride App 20140273530 - Nguyen; Victor ; et al.	2014-09-18
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure Grant 8,753,989 - Balseanu , et al. June 17, 2	2014-06-17
Method for depositing boron-rich films for lithographic mask applications Grant 8,337,950 - Nguyen , et al. December 25, 2	2012-12-25
Method To Increase Tensile Stress Of Silicon Nitride Films Using A Post Pecvd Deposition Uv Cure App 20120196452 - Balseanu; Mihaela ; et al.	2012-08-02
Method To Increase Silicon Nitride Tensile Stress Using Nitrogen Plasma In-situ Treatment And Ex-situ Uv Cure App 20120196450 - Balseanu; Mihaela ; et al.	2012-08-02
Boron nitride and boron-nitride derived materials deposition method Grant 8,148,269 - Balseanu , et al. April 3, 2	2012-04-03
Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure Grant 8,138,104 - Balseanu , et al. March 20, 2	2012-03-20
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure Grant 8,129,290 - Balseanu , et al. March 6, 2	2012-03-06
Engineering Boron-rich Films For Lithographic Mask Applications App 20100233633 - Nguyen; Victor ; et al.	2010-09-16
Boron Nitride And Boron-nitride Derived Materials Deposition Method App 20090263972 - Balseanu; Mihaela ; et al.	2009-10-22
Method To Increase Silicon Nitride Tensile Stress Using Nitrogen Plasma In-situ Treatment And Ex-situ Uv Cure App 20080020591 - Balseanu; Mihaela ; et al.	2008-01-24
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure App 20060269693 - Balseanu; Mihaela ; et al.	2006-11-30
Method to increase the compressive stress of PECVD silicon nitride films App 20060269692 - Balseanu; Mihaela ; et al.	2006-11-30

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