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name:-0.29165291786194
ROELOFS; Willem Seine Christian Patent Filings

ROELOFS; Willem Seine Christian

Patent Applications and Registrations

Patent applications and USPTO patent grants for ROELOFS; Willem Seine Christian.The latest application filed is for "methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus".

Company Profile
11.7.12
  • ROELOFS; Willem Seine Christian - Deurne NL
  • Roelofs; Willem Seine Christian - Duerne NL
  • Roelofs; Willem Seine Christian - CB Bakel NL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods Of Determining Corrections For A Patterning Process, Device Manufacturing Method, Control System For A Lithographic Apparatus And Lithographic Apparatus
App 20220229373 - KOU; Weitian ;   et al.
2022-07-21
Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus
Grant 11,327,407 - Kou , et al. May 10, 2
2022-05-10
Method Of Obtaining Measurements, Apparatus For Performing A Process Step, And Metrology Apparatus
App 20220035259 - CEKLI; Hakki Ergun ;   et al.
2022-02-03
Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus
Grant 11,175,591 - Cekli , et al. November 16, 2
2021-11-16
Focus and overlay improvement by modifying a patterning device
Grant 11,126,093 - Van Haren , et al. September 21, 2
2021-09-21
Lithographic method
Grant 11,029,610 - Tinnemans , et al. June 8, 2
2021-06-08
Lithographic method
Grant 10,962,887 - Tinnemans , et al. March 30, 2
2021-03-30
Methods Of Determining Corrections For A Patterning Process, Device Manufacturing Method, Control System For A Lithographic Apparatus And Lithographic Apparatus
App 20210080836 - KOU; Weitian ;   et al.
2021-03-18
Methods of determining corrections for a patterning process
Grant 10,877,381 - Kou , et al. December 29, 2
2020-12-29
Focus And Overlay Improvement By Modifying A Patterning Device
App 20200310242 - VAN HAREN; Richard Johannes Franciscus ;   et al.
2020-10-01
Lithographic Method
App 20200272061 - TINNEMANS; Patricius Aloysius Jacobus ;   et al.
2020-08-27
Lithographic Method
App 20200081356 - TINNEMANS; Patricius Aloysius Jacobus ;   et al.
2020-03-12
Methods Of Determining Corrections For A Patterning Process
App 20200019067 - KOU; Weitian ;   et al.
2020-01-16
Lithographic method
Grant 10,527,958 - Tinnemans , et al. J
2020-01-07
Method Of Determining Pellicle Compensation Corrections For A Lithographic Process, Metrology Apparatus And Computer Program
App 20190294059 - VAN DIJK; Leon Paul ;   et al.
2019-09-26
Method Of Obtaining Measurements, Apparatus For Performing A Process Step, And Metrology Apparatus
App 20190137892 - CEKLI; Hakki Ergun ;   et al.
2019-05-09
Lithographic Method
App 20190094721 - TINNEMANS; Patricius Aloysius Jacobus ;   et al.
2019-03-28
Drying Device and Method for Drying a Pumpable Mixture
App 20140090268 - Roelofs; Seine ;   et al.
2014-04-03

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