Patent | Date |
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Plasma reactor having RF power applicator and a dual-purpose window Grant 6,790,311 - Collins , et al. September 14, 2 | 2004-09-14 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor App 20040163764 - Collins, Kenneth S. ;   et al. | 2004-08-26 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor Grant 6,736,931 - Collins , et al. May 18, 2 | 2004-05-18 |
Plasma reactor using inductive RF coupling, and processes Grant 6,545,420 - Collins , et al. April 8, 2 | 2003-04-08 |
Plasma reactor using inductive RF coupling, and processes Grant 6,518,195 - Collins , et al. February 11, 2 | 2003-02-11 |
Magnetic confinement in a plasma reactor having an RF bias electrode Grant 6,488,807 - Collins , et al. December 3, 2 | 2002-12-03 |
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode Grant 6,444,085 - Collins , et al. September 3, 2 | 2002-09-03 |
Plasma reactor having RF power applicator and a dual-purpose window App 20020096259 - Collins, Kenneth S. ;   et al. | 2002-07-25 |
Plasma reactor having a dual mode RF power application Grant 6,365,063 - Collins , et al. April 2, 2 | 2002-04-02 |
Plasma system with a balanced source Grant 6,353,206 - Roderick March 5, 2 | 2002-03-05 |
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor App 20020020499 - Collins, Kenneth S. ;   et al. | 2002-02-21 |
Processes Used In An Inductively Coupled Plasma Reactor App 20020004309 - COLLINS, KENNETH S. ;   et al. | 2002-01-10 |
Thermal Control Apparatus For Inductively Coupled Rf Plasma Reactor Having An Overhead Solenoidal Antenna App 20010054483 - COLLINS, KENNETH S. ;   et al. | 2001-12-27 |
Plasma etch processes Grant 6,251,792 - Collins , et al. June 26, 2 | 2001-06-26 |
Plasma chamber support having an electrically coupled collar ring Grant 6,074,488 - Roderick , et al. June 13, 2 | 2000-06-13 |
Process used in an RF coupled plasma reactor Grant 6,068,784 - Collins , et al. May 30, 2 | 2000-05-30 |
Plasma reactor with heated source of a polymer-hardening precursor material Grant 6,036,877 - Collins , et al. March 14, 2 | 2000-03-14 |
Electrostatic chuck usable in high density plasma Grant 5,583,737 - Collins , et al. December 10, 1 | 1996-12-10 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits Grant 5,574,410 - Collins , et al. November 12, 1 | 1996-11-12 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits Grant 5,572,170 - Collins , et al. November 5, 1 | 1996-11-05 |
Silicon scavenger in an inductively coupled RF plasma reactor Grant 5,556,501 - Collins , et al. September 17, 1 | 1996-09-17 |
Electrostatic chuck usable in high density plasma Grant 5,539,609 - Collins , et al. July 23, 1 | 1996-07-23 |
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits Grant 5,392,018 - Collins , et al. February 21, 1 | 1995-02-21 |
Electrostatic chuck for high power plasma processing Grant 5,350,479 - Collins , et al. September 27, 1 | 1994-09-27 |
Variable RF power splitter Grant 5,349,313 - Collins , et al. September 20, 1 | 1994-09-20 |
UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers Grant 5,300,460 - Collins , et al. April 5, 1 | 1994-04-05 |
VHF/UHF reactor system Grant 5,210,466 - Collins , et al. May 11, 1 | 1993-05-11 |
Electronically tuned matching network using predictor-corrector control system Grant 5,187,454 - Collins , et al. February 16, 1 | 1993-02-16 |
Electronically tuned VHF/UHF matching network Grant 5,065,118 - Collins , et al. November 12, 1 | 1991-11-12 |