ROBY; Mary Alyssa Drummond

Patent Applications and Registrations

Patent applications and USPTO patent grants for ROBY; Mary Alyssa Drummond.The latest application filed is for "barrier structure within a microelectronic enclosure".

Company Profile

1.5.7

ROBY; Mary Alyssa Drummond - Plano TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Barrier Structure Within A Microelectronic Enclosure App 20220212919 - HOLM; Jennifer Lynne ; et al.	2022-07-07
Method of forming a semiconductor device Grant 10,319,899 - Jiang , et al.	2019-06-11
High-temperature isotropic plasma etching process to prevent electrical shorts Grant 9,939,710 - Jiang , et al. April 10, 2	2018-04-10
Piezoeletric Wet Etch Process With Reduced Resist Lifting And Controlled Undercut App 20170338401 - Jiang; Neng ; et al.	2017-11-23
Piezoeletric wet etch process with reduced resist lifting and controlled undercut Grant 9,755,139 - Jiang , et al. September 5, 2	2017-09-05
High-temperature Isotropic Plasma Etching Process To Prevent Electrical Shorts App 20160313627 - Jiang; Neng ; et al.	2016-10-27
High-temperature isotropic plasma etching process to prevent electrical shorts Grant 9,405,089 - Jiang , et al. August 2, 2	2016-08-02
Bond-pad integration scheme for improved moisture barrier and electrical contact Grant 9,304,283 - Soman , et al. April 5, 2	2016-04-05
METHODS TO IMPROVE THE CRYSTALLINITY OF PbZrTiO3 AND Pt FILMS FOR MEMS APPLICATIONS App 20150380635 - Srinivasan; Bhaskar ; et al.	2015-12-31
Piezoeletric Wet Etch Process With Reduced Resist Lifting And Controlled Undercut App 20150380637 - Jiang; Neng ; et al.	2015-12-31
Bond-pad Integration Scheme For Improved Moisture Barrier And Electrical Contact App 20150338604 - Soman; Joel ; et al.	2015-11-26
High-temperature Isotropic Plasma Etching Process To Prevent Electrical Shorts App 20150340245 - Jiang; Neng ; et al.	2015-11-26

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