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name:-0.01830005645752
name:-0.020441055297852
name:-0.0062260627746582
Robl; Werner Patent Filings

Robl; Werner

Patent Applications and Registrations

Patent applications and USPTO patent grants for Robl; Werner.The latest application filed is for "semiconductor device power metallization layer with stress-relieving heat sink structure".

Company Profile
6.26.33
  • Robl; Werner - Regensburg DE
  • Robl; Werner - Poughkeepsie NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Semiconductor device power metallization layer with stress-relieving heat sink structure
Grant 11,276,624 - Nelhiebel , et al. March 15, 2
2022-03-15
Semiconductor device and a method of forming the semiconductor device
Grant 11,171,049 - Robl , et al. November 9, 2
2021-11-09
Semiconductor Device Power Metallization Layer with Stress-Relieving Heat Sink Structure
App 20210183732 - Nelhiebel; Michael ;   et al.
2021-06-17
Electronic Device, Electronic Module And Methods For Fabricating The Same
App 20200343094 - Frank; Paul ;   et al.
2020-10-29
Electronic device, electronic module and methods for fabricating the same
Grant 10,741,402 - Frank , et al. A
2020-08-11
Electrolyte, method of forming a copper layer and method of forming a chip
Grant 10,648,096 - Robl , et al.
2020-05-12
Semiconductor device having a copper element and method of forming a semiconductor device having a copper element
Grant 10,446,469 - Detzel , et al. Oc
2019-10-15
Semiconductor Device And A Method Of Forming The Semiconductor Device
App 20190267283 - Robl; Werner ;   et al.
2019-08-29
Semiconductor Devices Comprising Metallizations Composed Of Porous Copper And Associated Production Methods
App 20190221533 - THEUSS; Horst ;   et al.
2019-07-18
Self-organizing barrier layer disposed between a metallization layer and a semiconductor region
Grant 10,332,793 - Robl , et al.
2019-06-25
Electronic Device, Electronic Module And Methods For Fabricating The Same
App 20180082848 - Frank; Paul ;   et al.
2018-03-22
Self-organizing Barrier Layer Disposed Between A Metallization Layer And A Semiconductor Region
App 20170154813 - Robl; Werner ;   et al.
2017-06-01
Semiconductor Structure And Method For Making Same
App 20160343662 - Fischer; Thomas ;   et al.
2016-11-24
Semiconductor Device Having a Copper Element and Method of Forming a Semiconductor Device Having a Copper Element
App 20160329263 - Detzel; Thomas ;   et al.
2016-11-10
Semiconductor structure and method for making same
Grant 9,425,146 - Fischer , et al. August 23, 2
2016-08-23
Integrated circuit and method of forming an integrated circuit
Grant 9,418,937 - Detzel , et al. August 16, 2
2016-08-16
Electrolyte, Method Of Forming A Copper Layer And Method Of Forming A Chip
App 20160168739 - ROBL; Werner ;   et al.
2016-06-16
Porous Metal Coating
App 20140242374 - Strasser; Johann ;   et al.
2014-08-28
Semiconductor structure and method for making same
Grant 8,786,085 - Barth , et al. July 22, 2
2014-07-22
Semiconductor structure and method for making same
Grant 8,759,207 - Barth , et al. June 24, 2
2014-06-24
Semiconductor component with coreless transformer
Grant 8,665,054 - Stecher , et al. March 4, 2
2014-03-04
Semiconductor Structure And Method For Making Same
App 20130309864 - BARTH; Hans-Joachim ;   et al.
2013-11-21
Semiconductor Component with Coreless Transformer
App 20130278372 - Stecher; Matthias ;   et al.
2013-10-24
Integrated Circuit and Method of Forming an Integrated Circuit
App 20130147047 - Detzel; Thomas ;   et al.
2013-06-13
Semiconductor Structure And Method For Making Same
App 20130062770 - BARTH; Hans-Joachim ;   et al.
2013-03-14
Method for processing a semiconductor wafer or die, and particle deposition device
Grant 8,338,317 - Engelhardt , et al. December 25, 2
2012-12-25
Device fabricated using an electroplating process
Grant 8,334,202 - Pohl , et al. December 18, 2
2012-12-18
Semiconductor structure and method for making same
Grant 8,330,274 - Barth , et al. December 11, 2
2012-12-11
Method For Processing A Semiconductor Wafer Or Die, And Particle Deposition Device
App 20120256323 - Engelhardt; Manfred ;   et al.
2012-10-11
Semiconductor Structure And Method For Making Same
App 20120080791 - BARTH; Hans-Joachim ;   et al.
2012-04-05
Semiconductor structure and method for making same
Grant 8,148,257 - Barth , et al. April 3, 2
2012-04-03
Semiconductor Structure And Method For Making Same
App 20120074574 - BARTH; Hans-Joachim ;   et al.
2012-03-29
Semiconductor Structure And Method For Making Same
App 20120074572 - FISCHER; Thomas ;   et al.
2012-03-29
Semiconductor device including conductive element
Grant 8,072,071 - Steiner , et al. December 6, 2
2011-12-06
Method for Fabricating a Semiconductor Chip Package and Semiconductor Chip Package
App 20110291256 - Steiner; Rainer ;   et al.
2011-12-01
Spin device
Grant 7,974,120 - Poeppel , et al. July 5, 2
2011-07-05
Device Fabricated Using An Electroplating Process
App 20110101532 - Pohl; Jens ;   et al.
2011-05-05
Method of making an integrated circuit including electrodeposition of metallic chromium
Grant 7,909,978 - Lodermeyer , et al. March 22, 2
2011-03-22
Semiconductor Device Including Conductive Element
App 20100207272 - Steiner; Rainer ;   et al.
2010-08-19
Spin Device
App 20100188905 - Poeppel; Gerhard ;   et al.
2010-07-29
Method Of Making An Integrated Circuit Including Electrodeposition Of Metallic Chromium
App 20080257743 - Lodermeyer; Johannes ;   et al.
2008-10-23
Method Of Making An Integrated Circuit Including Electrodeposition Of Aluminium
App 20080257744 - Lodermeyer; Johannes ;   et al.
2008-10-23
Nitride and polysilicon interface with titanium layer
App 20060001162 - Schutz; Ronald J. ;   et al.
2006-01-05
Low Cu percentages for reducing shorts in AlCu lines
Grant 6,960,306 - Iggulden , et al. November 1, 2
2005-11-01
Integration scheme for metal gap fill, with fixed abrasive CMP
Grant 6,943,114 - Wrschka , et al. September 13, 2
2005-09-13
Integration scheme for metal gap fill, with fixed abrasive CMP
App 20040248399 - Wrschka, Peter ;   et al.
2004-12-09
Three layer aluminum deposition process for high aspect ratio CL contacts
Grant 6,794,282 - Goebel , et al. September 21, 2
2004-09-21
Method and apparatus for improving the electrical resistance of conductive paths
App 20040155268 - Robl, Werner ;   et al.
2004-08-12
Three layer aluminum deposition process for high aspect ratio CL contacts
App 20040102001 - Goebel, Thomas ;   et al.
2004-05-27
Liner with poor step coverage to improve contact resistance in W contacts
Grant 6,734,097 - Iggulden , et al. May 11, 2
2004-05-11
Method of eliminating back-end rerouting in ball grid array packaging
Grant 6,720,212 - Robl , et al. April 13, 2
2004-04-13
Method of eliminating back-end rerouting in ball grid array packaging
App 20030183913 - Robl, Werner ;   et al.
2003-10-02
Integration scheme for metal gap fill with HDP and fixed abrasive CMP
App 20030186551 - Wrschka, Peter ;   et al.
2003-10-02
Liner with poor step coverage to improve contact resistance in W contacts
App 20030068894 - Iggulden, Roy C. ;   et al.
2003-04-10

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