Rispens; Gijsbert
Patent Applications and Registrations
Patent applications and USPTO patent grants for Rispens; Gijsbert.The latest application filed is for "process window based on defect probability".
- Rispens; Gijsbert - Eersel NL
| Patent | Date |
|---|---|
| Lithographic patterning process and resists to use therein Grant 11,415,886 - Wuister , et al. August 16, 2 | 2022-08-16 |
| Process Window Based On Defect Probability App 20210356874 - SLACHTER; Abraham ; et al. | 2021-11-18 |
| Process window based on defect probability Grant 11,079,687 - Slachter , et al. August 3, 2 | 2021-08-03 |
| Membrane For Euv Lithography App 20210109438 - Nasalevich; Maxim Aleksandrovich ; et al. | 2021-04-15 |
| Method for removing photosensitive material on a substrate Grant 10,948,825 - Berendsen , et al. March 16, 2 | 2021-03-16 |
| Membrane for EUV lithography Grant 10,908,496 - Nasalevich , et al. February 2, 2 | 2021-02-02 |
| Process Window Based On Defect Probability App 20210018850 - SLACHTER; Abraham ; et al. | 2021-01-21 |
| Method For Removing Photosensitive Material On A Substrate App 20200166845 - BERENDSEN; Christianus Wilhelmus Johannes ; et al. | 2020-05-28 |
| Lithographic Patterning Process and Resists to Use Therein App 20190339615 - WUISTER; Sander Frederik ; et al. | 2019-11-07 |
| Lithographic patterning process and resists to use therein Grant 10,416,555 - Wuister , et al. Sept | 2019-09-17 |
| Lithographic Patterning Process and Resists to Use Therein App 20180004085 - WUISTER; Sander Frederik ; et al. | 2018-01-04 |
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