Patent | Date |
---|
NPN heterojunction bipolar transistor in CMOS flow Grant 11,417,646 - Mehrotra , et al. August 16, 2 | 2022-08-16 |
Embedded Sige Process For Multi-threshold Pmos Transistors App 20180308977 - CHOI; Younsung ;   et al. | 2018-10-25 |
Embedded SiGe process for multi-threshold PMOS transistors Grant 10,026,837 - Choi , et al. July 17, 2 | 2018-07-17 |
Embedded Sige Process For Multi-threshold Pmos Transistors App 20170069755 - CHOI; Younsung ;   et al. | 2017-03-09 |
Npn Heterojunction Bipolar Transistor In Cmos Flow App 20160284691 - MEHROTRA; Manoj ;   et al. | 2016-09-29 |
NPN heterojunction bipolar transistor in CMOS flow Grant 9,385,117 - Mehrotra , et al. July 5, 2 | 2016-07-05 |
Npn Heterojunction Bipolar Transistor In Cmos Flow App 20150187755 - MEHROTRA; Manoj ;   et al. | 2015-07-02 |
ZTCR poly resistor in replacement gate flow Grant 8,927,385 - Nandakumar , et al. January 6, 2 | 2015-01-06 |
Strain-engineered MOSFETs having rimmed source-drain recesses Grant 8,877,581 - Jain , et al. November 4, 2 | 2014-11-04 |
Ztcr Poly Resistor In Replacement Gate Flow App 20140167182 - Nandakumar; Mahalingam ;   et al. | 2014-06-19 |
Method of forming a CMOS device with a stressed-channel NMOS transistor and a strained-channel PMOS transistor Grant 8,691,644 - Song , et al. April 8, 2 | 2014-04-08 |
Method of Forming a CMOS Device with a Stressed-Channel NMOS Transistor and a Strained-Channel PMOS Transistor App 20140011340 - Song; Seung-Chul ;   et al. | 2014-01-09 |
Silicide method Grant 8,470,707 - Xiong , et al. June 25, 2 | 2013-06-25 |
Improved Silicide Method App 20120108027 - Xiong; Weize ;   et al. | 2012-05-03 |
Nitride removal while protecting semiconductor surfaces for forming shallow junctions Grant 8,043,921 - Kirkpatrick , et al. October 25, 2 | 2011-10-25 |
Strain-engineered Mosfets Having Rimmed Source-drain Recesses App 20110042753 - Jain; Amitabh ;   et al. | 2011-02-24 |
Nitride Removal While Protecting Semiconductor Surfaces For Forming Shallow Junctions App 20100248440 - Kirkpatrick; Brian K. ;   et al. | 2010-09-30 |
Post High-k Dielectric/metal Gate Clean App 20100167519 - KIRKPATRICK; BRIAN K. ;   et al. | 2010-07-01 |
Post high-k dielectric/metal gate clean Grant 7,732,284 - Kirkpatrick , et al. June 8, 2 | 2010-06-08 |
Ic Formed With Densified Chemical Oxide Layer App 20100032813 - Riley; Deborah J. ;   et al. | 2010-02-11 |
Method for manufacturing a semiconductor device having improved across chip implant uniformity Grant 7,569,464 - Kirmse , et al. August 4, 2 | 2009-08-04 |
Differential offset spacer Grant 7,537,988 - Ekbote , et al. May 26, 2 | 2009-05-26 |
Differential Offset Spacer App 20090098695 - Ekbote; Shashank ;   et al. | 2009-04-16 |
Multi-step process for patterning a metal gate electrode Grant 7,422,969 - Rotondaro , et al. September 9, 2 | 2008-09-09 |
Method For Manufacturing A Semiconductor Device Having Improved Across Chip Implant Uniformity App 20080153273 - Kirmse; Karen H.R. ;   et al. | 2008-06-26 |
Protection of silicon from phosphoric acid using thick chemical oxide Grant 7,384,869 - Riley , et al. June 10, 2 | 2008-06-10 |
Silicon recess improvement through improved post implant resist removal and cleans Grant 7,371,691 - Hall , et al. May 13, 2 | 2008-05-13 |
Multi-step process for patterning a metal gate electrode Grant 7,323,403 - Rotondaro , et al. January 29, 2 | 2008-01-29 |
Multi-Step Process for Patterning a Metal Gate Electrode App 20080020558 - Rotondaro; Antonio L.P. ;   et al. | 2008-01-24 |
Treatment of silicon prior to nickel silicide formation Grant 7,132,365 - Crank , et al. November 7, 2 | 2006-11-07 |
Protection of silicon from phosphoric acid using thick chemical oxide App 20060228904 - Riley; Deborah J. ;   et al. | 2006-10-12 |
Semiconductor device having optimized shallow junction geometries and method for fabrication thereof Grant 7,098,099 - Hornung , et al. August 29, 2 | 2006-08-29 |
Semiconductor device having optimized shallow junction geometries and method for fabrication thereof App 20060189066 - Hornung; Brian E. ;   et al. | 2006-08-24 |
Multi-step process for patterning a metal gate electrode App 20060115972 - Rotondaro; Antonio L.P. ;   et al. | 2006-06-01 |
Treatment of silicon prior to nickel silicide formation App 20060035463 - Crank; Sue Ellen ;   et al. | 2006-02-16 |
Silicon recess improvement through improved post implant resist removal and cleans App 20060024972 - Hall; Lindsey H. ;   et al. | 2006-02-02 |
Control Of Transistor Performance Through Adjustment Of Spacer Oxide Profile With A Wet Etch App 20020119647 - Riley, Deborah J ;   et al. | 2002-08-29 |