Rijpstra; Manouk
Patent Applications and Registrations
Patent applications and USPTO patent grants for Rijpstra; Manouk.The latest application filed is for "computational metrology based correction and control".
- Rijpstra; Manouk - Eindhoven NL
| Patent | Date |
|---|---|
| Computational metrology based correction and control Grant 11,448,973 - Rijpstra , et al. September 20, 2 | 2022-09-20 |
| Lithographic method Grant 11,029,610 - Tinnemans , et al. June 8, 2 | 2021-06-08 |
| Lithographic method Grant 10,962,887 - Tinnemans , et al. March 30, 2 | 2021-03-30 |
| Computational Metrology Based Correction And Control App 20210080837 - RIJPSTRA; Manouk ; et al. | 2021-03-18 |
| Lithographic Method App 20200272061 - TINNEMANS; Patricius Aloysius Jacobus ; et al. | 2020-08-27 |
| Lithographic Method App 20200081356 - TINNEMANS; Patricius Aloysius Jacobus ; et al. | 2020-03-12 |
| Lithographic method Grant 10,527,958 - Tinnemans , et al. J | 2020-01-07 |
| Lithographic Method App 20190094721 - TINNEMANS; Patricius Aloysius Jacobus ; et al. | 2019-03-28 |
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