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Patent applications and USPTO patent grants for RIJPMA; Albert Pieter.The latest application filed is for "radiation source module and lithographic apparatus".
Patent | Date |
---|---|
Radiation Source Module and Lithographic Apparatus App 20200124976 - PATEL; Hrishikesh ;   et al. | 2020-04-23 |
Radiation source and lithographic apparatus Grant 10,394,141 - Riepen , et al. A | 2019-08-27 |
Radiation Source and Lithographic Apparatus App 20170322499 - RIEPEN; Michel ;   et al. | 2017-11-09 |
Radiation source and lithographic apparatus Grant 9,753,383 - Riepen , et al. September 5, 2 | 2017-09-05 |
Radiation Source and Lithographic Apparatus App 20150338753 - RIEPEN; Michel ;   et al. | 2015-11-26 |
Lithographic apparatus and device manufacturing method Grant 8,797,504 - Nienhuys , et al. August 5, 2 | 2014-08-05 |
Lithographic apparatus and device manufacturing method Grant 8,730,448 - Nienhuys , et al. May 20, 2 | 2014-05-20 |
Lithographic Apparatus And Device Manufacturing Method App 20120229783 - Nienhuys; Han-Kwang ;   et al. | 2012-09-13 |
Lithographic Apparatus And Device Manufacturing Method App 20120229782 - Nienhuys; Han-Kwang ;   et al. | 2012-09-13 |
Lithographic apparatus and device manufacturing method Grant 8,228,487 - Rijpma , et al. July 24, 2 | 2012-07-24 |
Lithographic Apparatus And Device Manufacturing Method App 20090207392 - RIJPMA; Albert Pieter ;   et al. | 2009-08-20 |
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