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name:-0.0048179626464844
name:-0.0024240016937256
name:-0.0017769336700439
RIEDL; HELMUT Patent Filings

RIEDL; HELMUT

Patent Applications and Registrations

Patent applications and USPTO patent grants for RIEDL; HELMUT.The latest application filed is for "sputter target and method for producing a sputter target".

Company Profile
1.2.3
  • RIEDL; HELMUT - KIRCHBERG AM WALDE AT
  • Riedl; Helmut - Kirchberg/Walde AT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Sputter Target And Method For Producing A Sputter Target
App 20190368029 - POLCIK; PETER ;   et al.
2019-12-05
Mo--Si--B layers and method for the production thereof
Grant 10,240,229 - Rachbauer , et al.
2019-03-26
Arc evaporated Me1.sub.1-aMe2.sub.aZI/Mo.sub.1-b-cSi.sub.cB.sub.bZII multilayer coatings
Grant 9,752,234 - Riedl , et al. September 5, 2
2017-09-05
Arc Evaporated Me11-aMe2aZI/Mo1-b-cSicBbZII Multilayer Coatings
App 20170211189 - Riedl; Helmut ;   et al.
2017-07-27
Mo-si-b Layers And Method For The Production Thereof
App 20170088939 - Rachbauer; Richard ;   et al.
2017-03-30

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