RIDGEFIELD ACQUISITION

Patent Applications and Registrations

Patent applications and USPTO patent grants for RIDGEFIELD ACQUISITION.The latest application filed is for "black matrix composition, blck matrix, and black matrix production method".

Company Profile

19.10.8

RIDGEFIELD ACQUISITION - Luxembourg N/A LU

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer Grant 11,421,128 - Rahman , et al. August 23, 2	2022-08-23
Enviromentally stable, thick film, chemically amplified resist Grant 11,385,543 - Toukhy , et al. July 12, 2	2022-07-12
Lithography composition, a method for forming resist patterns and a method for making semiconductor devices Grant 11,156,920 - Yamamoto , et al. October 26, 2	2021-10-26
Compositions and processes for self-assembly of block copolymers Grant 11,067,893 - Wu , et al. July 20, 2	2021-07-20
Black matrix composition, black matrix, and black matrix production method Grant 11,028,270 - Nishiki , et al. June 8, 2	2021-06-08
Chemically amplified positive photoresist composition and pattern forming method using same Grant 11,029,599 - Takaichi , et al. June 8, 2	2021-06-08
Siloxazane compound and composition comprising the same, and method for producing silceous film using the same Grant 10,913,852 - Okamura , et al. February 9, 2	2021-02-09
Black Matrix Composition, Blck Matrix, And Black Matrix Production Method App 20200277494 - NISHIKI; Hirohiko ; et al.	2020-09-03
Enviromentally Stable, Thick Film, Chemically Amplified Resist App 20200183278 - Toukhy; Medhat A. ; et al.	2020-06-11
Composition Of Spin-on Materials Containing Metal Oxide Nanoparticles And An Organic Polymer App 20200087534 - RAHMAN; M. Dalil ; et al.	2020-03-19
Novel Compositions And Processes For Self-assembly Of Block Copolymers App 20200019062 - Wu; Hengpeng ; et al.	2020-01-16
A Lithography Composition, A Method For Forming Resist Patterns And A Method For Making Semiconductor Devices App 20190377263 - YAMAMOTO; Kazuma ; et al.	2019-12-12
Inorganic polysilazane resin Grant 10,494,261 - Fujiwara , et al. De	2019-12-03
Template for self assembly and method of making a self assembled pattern Grant 10,457,088 - Kim , et al. Oc	2019-10-29
Composite of silicon oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using composite thereof Grant 10,435,513 - Yoshida , et al. O	2019-10-08
Siloxazane Compound And Composition Comprising The Same, And Method For Producing Silceous Film Using The Same App 20190300713 - OKAMURA; Toshiya ; et al.	2019-10-03
Chemically Amplified Positive Photoresist Composition And Pattern Forming Method Using Same App 20190235382 - TAKAICHI; TETSUMASA ; et al.	2019-08-01
Polymer Compositions For Self-assembly Applications App 20190161570 - WU; Hengpeng ; et al.	2019-05-30

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