loadpatents
Patent applications and USPTO patent grants for RIDEAU; Denis.The latest application filed is for "integrated circuit comprising a single photon avalanche diode and corresponding manufacturing method".
Patent | Date |
---|---|
Integrated Circuit Comprising A Single Photon Avalanche Diode And Corresponding Manufacturing Method App 20220190184 - RIDEAU; Denis ;   et al. | 2022-06-16 |
Image sensor Grant 11,049,892 - Crocherie , et al. June 29, 2 | 2021-06-29 |
Image sensor Grant 10,903,259 - Rideau , et al. January 26, 2 | 2021-01-26 |
Single-photon Avalanche Photodiode App 20200203547 - BENHAMMOU; Younes ;   et al. | 2020-06-25 |
Image Sensor App 20200013812 - Crocherie; Axel ;   et al. | 2020-01-09 |
Image Sensor App 20200013820 - Rideau; Denis ;   et al. | 2020-01-09 |
Method of forming stressed semiconductor layer Grant 9,543,214 - Rideau , et al. January 10, 2 | 2017-01-10 |
Process for fabricating SOI transistors for an increased integration density Grant 9,514,996 - Andrieu , et al. December 6, 2 | 2016-12-06 |
Process For Fabricating Soi Transistors For An Increased Integration Density App 20160307809 - ANDRIEU; Francois ;   et al. | 2016-10-20 |
PMOS transistor with improved mobility of the carriers Grant 9,356,090 - Fiori , et al. May 31, 2 | 2016-05-31 |
Method of locally stressing a semiconductor layer Grant 9,331,175 - Morin , et al. May 3, 2 | 2016-05-03 |
Method of stressing a semiconductor layer Grant 9,318,372 - Nier , et al. April 19, 2 | 2016-04-19 |
Method For Relaxing The Transverse Mechanical Stresses Within The Active Region Of A Mos Transistor, And Corresponding Integrated Circuit App 20160099183 - Rideau; Denis ;   et al. | 2016-04-07 |
Method of forming stressed SOI layer Grant 9,305,828 - Rideau , et al. April 5, 2 | 2016-04-05 |
Method of introducing local stress in a semiconductor layer Grant 9,240,466 - Morin , et al. January 19, 2 | 2016-01-19 |
Pmos Transistor With Improved Mobility Of The Carriers App 20150311277 - Fiori; Vincent ;   et al. | 2015-10-29 |
Method Of Stressing A Semiconductor Layer App 20150118823 - Nier; Olivier ;   et al. | 2015-04-30 |
Method Of Forming Stressed Soi Layer App 20150118824 - Rideau; Denis ;   et al. | 2015-04-30 |
Method Of Forming Stressed Semiconductor Layer App 20150118805 - Rideau; Denis ;   et al. | 2015-04-30 |
Method For Relaxing The Transverse Mechanical Stresses Within The Active Region Of A Mos Transistor, And Corresponding Integrated Circuit App 20150097241 - Rideau; Denis ;   et al. | 2015-04-09 |
Method Of Locally Stressing A Semiconductor Layer App 20150044827 - Morin; Pierre ;   et al. | 2015-02-12 |
Method Of Introducing Local Stress In A Semiconductor Layer App 20150044826 - Morin; Pierre ;   et al. | 2015-02-12 |
Metal oxide semiconductor (MOS) device with locally thickened gate oxide Grant 8,928,051 - Dornel , et al. January 6, 2 | 2015-01-06 |
Metal oxide semiconductor (MOS) device with locally thickened gate oxide Grant 8,741,704 - Dornel , et al. June 3, 2 | 2014-06-03 |
Metal Oxide Semiconductor (mos) Device With Locally Thickened Gate Oxide App 20140070331 - Dornel; Erwan ;   et al. | 2014-03-13 |
Metal Oxide Semiconductor (mos) Device With Locally Thickened Gate Oxide App 20130234218 - Dornel; Erwan ;   et al. | 2013-09-12 |
Semiconductor Device and Method Making Same App 20110303990 - Dornel; Erwan ;   et al. | 2011-12-15 |
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