Richter; Ernst-Christian
Patent Applications and Registrations
Patent applications and USPTO patent grants for Richter; Ernst-Christian.The latest application filed is for "optical device for use with a lithography method".
- Richter; Ernst-Christian - Erlangen-Bruck DE
- Richter, Ernst-Christian - Dresden DE
- Richter; Ernst-Christian - Erlangen DE
| Patent | Date |
|---|---|
| Process for producing hard masks Grant 7,018,748 - Sebald , et al. March 28, 2 | 2006-03-28 |
| Process for modifying resist structures and resist films from the aqueous phase Grant 6,899,997 - Yip , et al. May 31, 2 | 2005-05-31 |
| Method for structuring a photoresist layer Grant 6,887,653 - Richter , et al. May 3, 2 | 2005-05-03 |
| Photoresist compound and method for structuring a photoresist layer Grant 6,841,332 - Falk , et al. January 11, 2 | 2005-01-11 |
| Method for experimentally verifying imaging errors in photomasks Grant 6,800,407 - Czech , et al. October 5, 2 | 2004-10-05 |
| Optical device for use with a lithography method App 20040169834 - Richter, Ernst-Christian ; et al. | 2004-09-02 |
| Process for structuring a photoresist layer Grant 6,746,828 - Richter , et al. June 8, 2 | 2004-06-08 |
| Method of structuring a photoresist layer Grant 6,746,821 - Richter , et al. June 8, 2 | 2004-06-08 |
| Process for structuring a photoresist layer Grant 6,746,827 - Richter , et al. June 8, 2 | 2004-06-08 |
| Method for structuring a photoresist layer Grant 6,743,572 - Richter , et al. June 1, 2 | 2004-06-01 |
| Method for structuring a photoresist layer Grant 6,740,475 - Richter , et al. May 25, 2 | 2004-05-25 |
| Method for producing resist structures Grant 6,703,190 - Elian , et al. March 9, 2 | 2004-03-09 |
| Method for experimentally verifying imaging errors in optical exposure units Grant 6,696,208 - Czech , et al. February 24, 2 | 2004-02-24 |
| Process for modifying resist structures and resist films from the aqueous phase App 20030211422 - Yip, Siew Siew ; et al. | 2003-11-13 |
| Process for producing hard masks App 20030203314 - Sebald, Michael ; et al. | 2003-10-30 |
| Method for experimentally verifying imaging errors in optical exposure units App 20030054268 - Czech, Gunther ; et al. | 2003-03-20 |
| Photoresist compound and method for structuring a photoresist layer App 20030022111 - Falk, Gertrud ; et al. | 2003-01-30 |
| Method for experimentally verifying imaging errors in photomasks App 20030013022 - Czech, Gunther ; et al. | 2003-01-16 |
| Method for producing resist structures App 20030008240 - Elian, Klaus ; et al. | 2003-01-09 |
| Method for structuring a photoresist layer App 20020187436 - Richter, Ernst Christian ; et al. | 2002-12-12 |
| Process for structuring a photoresist layer App 20020160315 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
| Method for structuring a photoresist layer App 20020160318 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
| Method for structuring a photoresist layer App 20020160317 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
| Process for structuring a photoresist layer App 20020160316 - Richter, Ernst-Christian ; et al. | 2002-10-31 |
| Method of structuring a photoresist layer App 20020058425 - Richter, Ernst-Christian ; et al. | 2002-05-16 |
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