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name:-0.012573957443237
name:-0.012592077255249
name:-0.0012857913970947
Richards; Robin Edward Patent Filings

Richards; Robin Edward

Patent Applications and Registrations

Patent applications and USPTO patent grants for Richards; Robin Edward.The latest application filed is for "dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers".

Company Profile
0.10.9
  • Richards; Robin Edward - Salt Lake City UT
  • Richards; Robin Edward - Tucson AZ
  • Richards; Robin Edward - Phoenix AZ
  • Richards; Robin Edward - Lansdale PA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
Grant 8,114,775 - Siddiqui , et al. February 14, 2
2012-02-14
Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization
Grant 7,691,287 - Siddiqui , et al. April 6, 2
2010-04-06
Dihydroxy Enol Compounds Used In Chemical Mechanical Polishing Compositions Having Metal Ion Oxidizers
App 20090308836 - Siddiqui; Junaid Ahmed ;   et al.
2009-12-17
Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
Grant 7,476,620 - Siddiqui , et al. January 13, 2
2009-01-13
Method for immobilizing ligands and organometallic compounds on silica surface, and their application in chemical mechanical planarization
App 20080182485 - Siddiqui; Junaid Ahmed ;   et al.
2008-07-31
Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization
Grant 7,351,662 - Siddiqui , et al. April 1, 2
2008-04-01
Tunable composition and method for chemical-mechanical planarization with aspartic acid/tolyltriazole
Grant 7,153,335 - Siddiqui , et al. December 26, 2
2006-12-26
Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
App 20060270235 - Siddiqui; Junaid Ahmed ;   et al.
2006-11-30
Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization
App 20060162261 - Siddiqui; Junaid Ahmed ;   et al.
2006-07-27
Low defectivity product slurry for CMP and associated production method
Grant 6,979,252 - Siddiqui , et al. December 27, 2
2005-12-27
Bicine/tricine containing composition and method for chemical-mechanical planarization
App 20050194563 - Siddiqui, Junaid Ahmed ;   et al.
2005-09-08
Bicine/tricine containing composition and method for chemical-mechanical planarization
App 20050076579 - Siddiqui, Junaid Ahmed ;   et al.
2005-04-14
Tunable composition and method for chemical-mechanical planarization with aspartic acid/tolyltriazole
App 20050076578 - Siddiqui, Junaid Ahmed ;   et al.
2005-04-14
Ceria based solid electrolytes
Grant 6,770,392 - Cutler , et al. August 3, 2
2004-08-03
Sulfur control in ion-conducting membrane systems
Grant 6,602,324 - Stein , et al. August 5, 2
2003-08-05
Sulfur control in ion-conducting membrane systems
App 20030089229 - Stein, VanEric Edward ;   et al.
2003-05-15
Ceria based solid elecrolytes
App 20030027027 - Cutler, Raymond Ashton ;   et al.
2003-02-06
Method for separating oxygen from an oxygen-containing gas
Grant 5,868,918 - Adler , et al. February 9, 1
1999-02-09
Planar solid-state membrane module
Grant 5,681,373 - Taylor , et al. October 28, 1
1997-10-28

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