Rennie; David Barry

Patent Applications and Registrations

Patent applications and USPTO patent grants for Rennie; David Barry.The latest application filed is for "semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation".

Company Profile

0.9.7

Rennie; David Barry - Bethlehem PA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation Grant 10,073,351 - Agarwal , et al. September 11, 2	2018-09-11
Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation App 20160179011 - Agarwal; Rajiv Krishan ; et al.	2016-06-23
Method for wafer dicing and composition useful thereof Grant 9,328,318 - Tamboli , et al. May 3, 2	2016-05-03
Method for wafer dicing and composition useful thereof Grant 8,883,701 - Tamboli , et al. November 11, 2	2014-11-11
Method for Wafer Dicing and Composition Useful Thereof App 20140170835 - Tamboli; Dnyanesh Chandrakant ; et al.	2014-06-19
Process for inhibiting corrosion and removing contaminant from a surface during wafer dicing and composition useful therefor Grant 8,580,656 - Collier , et al. November 12, 2	2013-11-12
Method for Wafer Dicing and Composition Useful Thereof App 20120009762 - Tamboli; Dnyanesh Chandrakant ; et al.	2012-01-12
Process for Inhibiting Corrosion and Removing Contaminant from a Surface During Wafer Dicing and Composition Useful Therefor App 20100009517 - Collier; Terence Quintin ; et al.	2010-01-14
Method for defining a feature on a substrate App 20060183055 - O'Neill; Mark Leonard ; et al.	2006-08-17
Compositions for removing etching residue and use thereof Grant 6,821,352 - Rovito , et al. November 23, 2	2004-11-23
Compositions for removing etching residue and use thereof App 20040171503 - Rovito, Roberto John ; et al.	2004-09-02
Compositions for removing etching residue and use thereof Grant 6,677,286 - Rovito , et al. January 13, 2	2004-01-13

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