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name:-0.013273954391479
name:-0.0082380771636963
name:-0.001471996307373
Reinhold; Markus Patent Filings

Reinhold; Markus

Patent Applications and Registrations

Patent applications and USPTO patent grants for Reinhold; Markus.The latest application filed is for "device for treating metal workpieces with cooling gas".

Company Profile
1.8.11
  • Reinhold; Markus - Kleve DE
  • Reinhold; Markus - Ebendorf DE
  • Reinhold; Markus - Dusseldorf N/A DE
  • Reinhold; Markus - Wohnsitz DE
  • Reinhold; Markus - Hilden DE
  • Reinhold; Markus - Aachen DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Device for treating metal workpieces with cooling gas
Grant 10,934,599 - Hesse , et al. March 2, 2
2021-03-02
Device for Treating Metal Workpieces With Cooling Gas
App 20200208232 - Hesse; Torsten ;   et al.
2020-07-02
Process gas preparation apparatus for an industrial furnace system and an industrial furnace system for gas carburizing and hardening of metal workpieces utilizing same
Grant 9,816,154 - Joritz , et al. November 14, 2
2017-11-14
Gas system for compressing a process gas
Grant 9,568,014 - Alfes , et al. February 14, 2
2017-02-14
Process Gas Preparation Apparatus for an Industrial Furnace System and an Industrial Furnace System for Gas Carburizing and Hardening of Metal Workpieces Utilizing Same
App 20160273065 - Joritz; Dirk ;   et al.
2016-09-22
Gas System For Compressing A Process Gas
App 20140050569 - Alfes; Ludger ;   et al.
2014-02-20
Gas distributor with pre-chambers arranged in planes
Grant 8,349,081 - Reinhold , et al. January 8, 2
2013-01-08
Gas inlet element for a CVD reactor
Grant 8,298,337 - Reinhold , et al. October 30, 2
2012-10-30
Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned
Grant 7,709,398 - Strauch , et al. May 4, 2
2010-05-04
Process And Apparatus For Depositing Semiconductor Layers Using Two Process Gases, One Of Which is Preconditioned
App 20100012034 - Strauch; Gerhard Karl ;   et al.
2010-01-21
Device For Temperature-controlled Accommodation Of A Container
App 20090283040 - Reinhold; Markus ;   et al.
2009-11-19
Device For Vaporizing Condensed Substances
App 20090107401 - Reinhold; Markus ;   et al.
2009-04-30
Gas Inlet Element For A Cvd Reactor
App 20090025639 - Reinhold; Markus ;   et al.
2009-01-29
Gas Distributor With Pre-chambers Disposed In Planes
App 20090013930 - Reinhold; Markus ;   et al.
2009-01-15
Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned
App 20060121193 - Strauch; Gerhard Karl ;   et al.
2006-06-08
Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the method
Grant 6,786,973 - Strauch , et al. September 7, 2
2004-09-07
Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the method
App 20030180460 - Strauch, Gerd ;   et al.
2003-09-25

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