Reichelt; Jens
Patent Applications and Registrations
Patent applications and USPTO patent grants for Reichelt; Jens.The latest application filed is for "method of patterning a substrate, photosensitive layer stack and system for lithography".
- Reichelt; Jens - Dresden DE
| Patent | Date |
|---|---|
| Method of Patterning a Substrate, Photosensitive Layer Stack and System for Lithography App 20090170024 - Hennig; Mario ; et al. | 2009-07-02 |
| Method and System for Adjusting an Optical Model App 20080304029 - Pforr; Rainer ; et al. | 2008-12-11 |
| Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element App 20070287075 - Pforr; Rainer ; et al. | 2007-12-13 |
| Method and system for photolithography App 20070009816 - Pforr; Rainer ; et al. | 2007-01-11 |
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