REHMAN; Samee Ur

Patent Applications and Registrations

Patent applications and USPTO patent grants for REHMAN; Samee Ur.The latest application filed is for "method for metrology optimization".

Company Profile

8.5.7

REHMAN; Samee Ur - Eindhoven NL
REHMAN; Samee Ur - Milpitas CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method For Metrology Optimization App 20220082944 - REHMAN; Samee Ur ; et al.	2022-03-17
Method Of Determining Information About A Patterning Process, Method Of Reducing Error In Measurement Data, Method Of Calibrating A Metrology Process, Method Of Selecting Metrology Targets App 20210255552 - VENSELAAR; Joannes Jitse ; et al.	2021-08-19
Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets Grant 11,022,897 - Venselaar , et al. June 1, 2	2021-06-01
Providing a Trained Network and Determining a Characteristic of a Physical System App 20200104676 - REHMAN; Samee Ur	2020-04-02
Method of determining a value of a parameter of interest of a target formed by a patterning process Grant 10,585,048 - Rehman , et al.	2020-03-10
Method of optimizing a metrology process Grant 10,585,354 - Tsiatmas , et al.	2020-03-10
Metrology method, apparatus and computer program Grant 10,551,172 - Rehman Fe	2020-02-04
Method Of Determining A Value Of A Parameter Of Interest Of A Target Formed By A Patterning Process App 20190323972 - REHMAN; Samee Ur ; et al.	2019-10-24
Method Of Measuring, Device Manufacturing Method, Metrology Apparatus, And Lithographic System App 20190285993 - PANDEY; Nitesh ; et al.	2019-09-19
Method Of Optimizing A Metrology Process App 20190243253 - TSIATMAS; Anagnostis ; et al.	2019-08-08
Method Of Determining Information About A Patterning Process, Method Of Reducing Error In Measurement Data, Method Of Calibratin App 20190171115 - VENSELAAR; Joannes Jitse ; et al.	2019-06-06
Method of measuring, device manufacturing method, metrology apparatus, and lithographic system Grant 10,310,389 - Pandey , et al.	2019-06-04

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