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Redlarski; Lukasz Patent Filings

Redlarski; Lukasz

Patent Applications and Registrations

Patent applications and USPTO patent grants for Redlarski; Lukasz.The latest application filed is for "metrology system with projected pattern for points-from-focus type processes".

Company Profile
0.1.4
  • Redlarski; Lukasz - Eindhoven NE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Metrology System With Projected Pattern For Points-from-focus Type Processes
App 20220138976 - Campbell; Shannon Roy ;   et al.
2022-05-05
Shape Measuring Method
App 20220034650 - REDLARSKI; Lukasz ;   et al.
2022-02-03
Method For Measuring A Height Map Of A Test Surface
App 20210180943 - KETELAARS; Hendrik ;   et al.
2021-06-17
Image sequence and evaluation method and system for structured illumination microscopy
Grant 9,568,304 - Haitjema , et al. February 14, 2
2017-02-14
Image Sequence And Evaluation Method And System For Structured Illumination Microscopy
App 20150219441 - HAITJEMA; Han ;   et al.
2015-08-06

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