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Patent applications and USPTO patent grants for Redlarski; Lukasz.The latest application filed is for "metrology system with projected pattern for points-from-focus type processes".
Patent | Date |
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Metrology System With Projected Pattern For Points-from-focus Type Processes App 20220138976 - Campbell; Shannon Roy ;   et al. | 2022-05-05 |
Shape Measuring Method App 20220034650 - REDLARSKI; Lukasz ;   et al. | 2022-02-03 |
Method For Measuring A Height Map Of A Test Surface App 20210180943 - KETELAARS; Hendrik ;   et al. | 2021-06-17 |
Image sequence and evaluation method and system for structured illumination microscopy Grant 9,568,304 - Haitjema , et al. February 14, 2 | 2017-02-14 |
Image Sequence And Evaluation Method And System For Structured Illumination Microscopy App 20150219441 - HAITJEMA; Han ;   et al. | 2015-08-06 |
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