Reddy; Sirish K.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Reddy; Sirish K..The latest application filed is for "vacuum-integrated hardmask processes and apparatus".
- Reddy; Sirish K. - Portland OR
- Reddy; Sirish K. - Hillsboro OR
| Patent | Date |
|---|---|
| Vacuum-integrated Hardmask Processes And Apparatus App 20220075260 - Marks; Jeffrey ; et al. | 2022-03-10 |
| Vacuum-integrated hardmask processes and apparatus Grant 11,209,729 - Marks , et al. December 28, 2 | 2021-12-28 |
| Vacuum-integrated hardmask processes and apparatus Grant 10,831,096 - Marks , et al. November 10, 2 | 2020-11-10 |
| Vacuum-integrated Hardmask Processes And Apparatus App 20200089104 - Marks; Jeffrey ; et al. | 2020-03-19 |
| Vacuum-integrated hardmask processes and apparatus Grant 10,514,598 - Marks , et al. Dec | 2019-12-24 |
| Vacuum-integrated Hardmask Processes And Apparatus App 20190094685 - Marks; Jeffrey ; et al. | 2019-03-28 |
| High aspect ratio etch of oxide metal oxide metal stack Grant 10,242,883 - Guha , et al. | 2019-03-26 |
| Image reversal with AHM gap fill for multiple patterning Grant 10,192,759 - Shamma , et al. Ja | 2019-01-29 |
| High Aspect Ratio Etch Of Oxide Metal Oxide Metal Stack App 20180374712 - GUHA; Joydeep ; et al. | 2018-12-27 |
| Vacuum-integrated Hardmask Processes And Apparatus App 20180004083 - Marks; Jeffrey ; et al. | 2018-01-04 |
| Vacuum-integrated hardmask processes and apparatus Grant 9,778,561 - Marks , et al. October 3, 2 | 2017-10-03 |
| High aspect ratio etch with combination mask Grant 9,659,783 - Guha , et al. May 23, 2 | 2017-05-23 |
| High selectivity and low stress carbon hardmask by pulsed low frequency RF power Grant 9,589,799 - Reddy , et al. March 7, 2 | 2017-03-07 |
| Image Reversal With Ahm Gap Fill For Multiple Patterning App 20160254171 - Shamma; Nader ; et al. | 2016-09-01 |
| Sulfur doped carbon hard masks Grant 9,320,387 - Reddy , et al. April 26, 2 | 2016-04-26 |
| Pecvd Deposition Of Smooth Silicon Films App 20150325435 - Hollister; Alice G. ; et al. | 2015-11-12 |
| Vacuum-integrated Hardmask Processes And Apparatus App 20150221519 - Marks; Jeffrey ; et al. | 2015-08-06 |
| High Aspect Ratio Etch With Combination Mask App 20150200106 - GUHA; Joydeep ; et al. | 2015-07-16 |
| High aspect ratio etch with combination mask Grant 9,018,103 - Guha , et al. April 28, 2 | 2015-04-28 |
| Sulfur Doped Carbon Hard Masks App 20150093915 - Reddy; Sirish K. ; et al. | 2015-04-02 |
| High Selectivity And Low Stress Carbon Hardmask By Pulsed Low Frequency Rf Power App 20150093908 - Reddy; Sirish K. ; et al. | 2015-04-02 |
| High Aspect Ratio Etch With Combination Mask App 20150087154 - GUHA; Joydeep ; et al. | 2015-03-26 |
| Cascaded cure approach to fabricate highly tensile silicon nitride films Grant 8,512,818 - Varadarajan , et al. August 20, 2 | 2013-08-20 |
| Cascaded cure approach to fabricate highly tensile silicon nitride films Grant 8,211,510 - Varadarajan , et al. July 3, 2 | 2012-07-03 |
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