Rathsack; Benjamen Michael

Patent Applications and Registrations

Patent applications and USPTO patent grants for Rathsack; Benjamen Michael.The latest application filed is for "design layout of printable assist features to aid transistor control".

Company Profile

0.6.7

Rathsack; Benjamen Michael - Austin TX
Rathsack; Benjamen Michael - Richardson TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Immersion lithography wafer edge bead removal for wafer and scanner defect prevention Grant 8,318,607 - Rathsack , et al. November 27, 2	2012-11-27
Layout of printable assist features to aid transistor control Grant 8,176,443 - Rathsack , et al. May 8, 2	2012-05-08
System and method for making photomasks Grant 7,930,656 - Aton , et al. April 19, 2	2011-04-19
Use of dual mask processing of different composition such as inorganic/organic to enable a single poly etch using a two-print-two-etch approach Grant 7,910,289 - Rathsack , et al. March 22, 2	2011-03-22
EDA methodology for extending ghost feature beyond notched active to improve adjacent gate CD control using a two-print-two-etch approach Grant 7,807,343 - Rathsack , et al. October 5, 2	2010-10-05
Two-print two-etch method for enhancement of CD control using ghost poly Grant 7,737,016 - Blatchford , et al. June 15, 2	2010-06-15
Design Layout Of Printable Assist Features To Aid Transistor Control App 20090300567 - Rathsack; Benjamen Michael ; et al.	2009-12-03
Immersion Lithography Wafer Edge Bead Removal For Wafer And Scanner Defect Prevention App 20090163026 - Rathsack; Benjamen Michael ; et al.	2009-06-25
System And Method For Making Photomasks App 20090125865 - Aton; Thomas J. ; et al.	2009-05-14
Eda Methodology For Extending Ghost Feature Beyond Notched Active To Improve Adjacent Gate Cd Control Using A Two-print-two-etch Approach App 20080166889 - Rathsack; Benjamen Michael ; et al.	2008-07-10
Two-print-two-etch method for enhancement of CD control using ghost poly App 20080014684 - Blatchford; James Walter ; et al.	2008-01-17
Use of dual mask processing of different composition such as inorganic/organic to enable a single poly etch using a two-print-two-etch approach App 20070161245 - Rathsack; Benjamen Michael ; et al.	2007-07-12
Reduction of mechanical stress on pattern specific geometries during etch using double pattern layout and process approach App 20070099424 - Rathsack; Benjamen Michael ; et al.	2007-05-03

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