loadpatents
name:-0.025942802429199
name:-0.18402504920959
name:-0.0010941028594971
Raoux; Sebastien Patent Filings

Raoux; Sebastien

Patent Applications and Registrations

Patent applications and USPTO patent grants for Raoux; Sebastien.The latest application filed is for "abatement of effluent gas".

Company Profile
0.22.18
  • Raoux; Sebastien - Santa Clara CA
  • Raoux; Sebastien - Cupertino CA
  • Raoux; Sebastien - San Francisco CA
  • Raoux; Sebastien - San Franciso CA
  • Raoux; Sebastien - San Frncisco CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Methods and apparatus for improving operation of an electronic device manufacturing system
Grant 7,970,483 - Raoux , et al. June 28, 2
2011-06-28
Apparatus for manufacturing a process abatement reactor
Grant 7,736,600 - Clark , et al. June 15, 2
2010-06-15
Methods and apparatus for sensing characteristics of the contents of a process abatement reactor
Grant 7,700,049 - Clark , et al. April 20, 2
2010-04-20
Abatement Of Effluent Gas
App 20090175771 - Tsai; Kenneth Chien-Quen ;   et al.
2009-07-09
Methods and apparatus for pressure control in electronic device manufacturing systems
Grant 7,532,952 - Curry , et al. May 12, 2
2009-05-12
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber
App 20080014134 - Raoux; Sebastien ;   et al.
2008-01-17
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber
App 20080003150 - Raoux; Sebastien ;   et al.
2008-01-03
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber
App 20080003157 - Raoux; Sebastien ;   et al.
2008-01-03
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber
App 20080003158 - Raoux; Sebastien ;   et al.
2008-01-03
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber
App 20080003151 - Raoux; Sebastien ;   et al.
2008-01-03
Method And Apparatus For Improved Operation Of An Abatement System
App 20070256704 - Porshnev; Peter ;   et al.
2007-11-08
Methods And Apparatus For Improving Operation Of An Electronic Device Manufacturing System
App 20070260343 - Raoux; Sebastien ;   et al.
2007-11-08
Methods And Apparatus For Pressure Control In Electronic Device Manufacturing Systems
App 20070260351 - CURRY; MARK W. ;   et al.
2007-11-08
Methods And Apparatus For Preventing Deposition Of Reaction Products In Process Abatement Reactors
App 20070190469 - Clark; Daniel O. ;   et al.
2007-08-16
Methods And Apparatus For Manufacturing A Process Abatement Reactor
App 20070172398 - Clark; Daniel O. ;   et al.
2007-07-26
Methods And Apparatus For Selectively Coupling Process Tools To Abatement Reactors
App 20070169889 - Clark; Daniel O. ;   et al.
2007-07-26
Methods And Apparatus For Sensing Characteristics Of The Contents Of A Process Abatement Reactor
App 20070172399 - Clark; Daniel O. ;   et al.
2007-07-26
Methods and apparatus for process abatement
App 20070086931 - Raoux; Sebastien ;   et al.
2007-04-19
Treatment of effluent from a substrate processing chamber
Grant 7,160,521 - Porshnev , et al. January 9, 2
2007-01-09
Method and apparatus for monitoring and adjusting chamber impedance
Grant 7,004,107 - Raoux , et al. February 28, 2
2006-02-28
In-situ film thickness measurement using spectral interference at grazing incidence
Grant 6,888,639 - Goebel , et al. May 3, 2
2005-05-03
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
Grant 6,863,019 - Shamouilian , et al. March 8, 2
2005-03-08
Apparatus for cleaning an exhaust line in a semiconductor processing system
Grant 6,680,420 - Pang , et al. January 20, 2
2004-01-20
Treatment of effluent from a substrate processing chamber
App 20040001787 - Porshnev, Peter ;   et al.
2004-01-01
In-situ film thickness measurement using spectral interference at grazing incidence
App 20030090676 - Goebel, Andreas ;   et al.
2003-05-15
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
App 20030036272 - Shamouilian, Shamouil ;   et al.
2003-02-20
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
Grant 6,517,913 - Cheung , et al. February 11, 2
2003-02-11
Implanatation process for improving ceramic resistance to corrosion
Grant 6,432,256 - Raoux August 13, 2
2002-08-13
Method and apparatus for optical detection of effluent composition
Grant 6,366,346 - Nowak , et al. April 2, 2
2002-04-02
Mixed frequency CVD process
Grant 6,358,573 - Raoux , et al. March 19, 2
2002-03-19
Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing
Grant 6,354,241 - Tanaka , et al. March 12, 2
2002-03-12
Method and apparatus for cleaning a vacuum line in a CVD system
App 20010016674 - Pang, Ben ;   et al.
2001-08-23
Method and apparatus for cleaning a vacuum line in a CVD system
Grant 6,194,628 - Pang , et al. February 27, 2
2001-02-27
Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment
Grant 6,193,802 - Pang , et al. February 27, 2
2001-02-27
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
Grant 6,187,072 - Cheung , et al. February 13, 2
2001-02-13
Use of an asymmetric waveform to control ion bombardment during substrate processing
Grant 6,162,709 - Raoux , et al. December 19, 2
2000-12-19
Substrate processing chamber with tunable impedance
Grant 6,136,388 - Raoux , et al. October 24, 2
2000-10-24
Mixed frequency CVD apparatus
Grant 6,098,568 - Raoux , et al. August 8, 2
2000-08-08
Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment
Grant 6,045,618 - Raoux , et al. April 4, 2
2000-04-04
Use of an asymmetric waveform to control ion bombardment during substrate processing
Grant 6,041,734 - Raoux , et al. March 28, 2
2000-03-28

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