Patent | Date |
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Methods and apparatus for improving operation of an electronic device manufacturing system Grant 7,970,483 - Raoux , et al. June 28, 2 | 2011-06-28 |
Apparatus for manufacturing a process abatement reactor Grant 7,736,600 - Clark , et al. June 15, 2 | 2010-06-15 |
Methods and apparatus for sensing characteristics of the contents of a process abatement reactor Grant 7,700,049 - Clark , et al. April 20, 2 | 2010-04-20 |
Abatement Of Effluent Gas App 20090175771 - Tsai; Kenneth Chien-Quen ;   et al. | 2009-07-09 |
Methods and apparatus for pressure control in electronic device manufacturing systems Grant 7,532,952 - Curry , et al. May 12, 2 | 2009-05-12 |
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber App 20080014134 - Raoux; Sebastien ;   et al. | 2008-01-17 |
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber App 20080003150 - Raoux; Sebastien ;   et al. | 2008-01-03 |
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber App 20080003157 - Raoux; Sebastien ;   et al. | 2008-01-03 |
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber App 20080003158 - Raoux; Sebastien ;   et al. | 2008-01-03 |
Methods And Apparatus For Pfc Abatement Using A Cdo Chamber App 20080003151 - Raoux; Sebastien ;   et al. | 2008-01-03 |
Method And Apparatus For Improved Operation Of An Abatement System App 20070256704 - Porshnev; Peter ;   et al. | 2007-11-08 |
Methods And Apparatus For Improving Operation Of An Electronic Device Manufacturing System App 20070260343 - Raoux; Sebastien ;   et al. | 2007-11-08 |
Methods And Apparatus For Pressure Control In Electronic Device Manufacturing Systems App 20070260351 - CURRY; MARK W. ;   et al. | 2007-11-08 |
Methods And Apparatus For Preventing Deposition Of Reaction Products In Process Abatement Reactors App 20070190469 - Clark; Daniel O. ;   et al. | 2007-08-16 |
Methods And Apparatus For Manufacturing A Process Abatement Reactor App 20070172398 - Clark; Daniel O. ;   et al. | 2007-07-26 |
Methods And Apparatus For Selectively Coupling Process Tools To Abatement Reactors App 20070169889 - Clark; Daniel O. ;   et al. | 2007-07-26 |
Methods And Apparatus For Sensing Characteristics Of The Contents Of A Process Abatement Reactor App 20070172399 - Clark; Daniel O. ;   et al. | 2007-07-26 |
Methods and apparatus for process abatement App 20070086931 - Raoux; Sebastien ;   et al. | 2007-04-19 |
Treatment of effluent from a substrate processing chamber Grant 7,160,521 - Porshnev , et al. January 9, 2 | 2007-01-09 |
Method and apparatus for monitoring and adjusting chamber impedance Grant 7,004,107 - Raoux , et al. February 28, 2 | 2006-02-28 |
In-situ film thickness measurement using spectral interference at grazing incidence Grant 6,888,639 - Goebel , et al. May 3, 2 | 2005-05-03 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas Grant 6,863,019 - Shamouilian , et al. March 8, 2 | 2005-03-08 |
Apparatus for cleaning an exhaust line in a semiconductor processing system Grant 6,680,420 - Pang , et al. January 20, 2 | 2004-01-20 |
Treatment of effluent from a substrate processing chamber App 20040001787 - Porshnev, Peter ;   et al. | 2004-01-01 |
In-situ film thickness measurement using spectral interference at grazing incidence App 20030090676 - Goebel, Andreas ;   et al. | 2003-05-15 |
Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas App 20030036272 - Shamouilian, Shamouil ;   et al. | 2003-02-20 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions Grant 6,517,913 - Cheung , et al. February 11, 2 | 2003-02-11 |
Implanatation process for improving ceramic resistance to corrosion Grant 6,432,256 - Raoux August 13, 2 | 2002-08-13 |
Method and apparatus for optical detection of effluent composition Grant 6,366,346 - Nowak , et al. April 2, 2 | 2002-04-02 |
Mixed frequency CVD process Grant 6,358,573 - Raoux , et al. March 19, 2 | 2002-03-19 |
Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing Grant 6,354,241 - Tanaka , et al. March 12, 2 | 2002-03-12 |
Method and apparatus for cleaning a vacuum line in a CVD system App 20010016674 - Pang, Ben ;   et al. | 2001-08-23 |
Method and apparatus for cleaning a vacuum line in a CVD system Grant 6,194,628 - Pang , et al. February 27, 2 | 2001-02-27 |
Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment Grant 6,193,802 - Pang , et al. February 27, 2 | 2001-02-27 |
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions Grant 6,187,072 - Cheung , et al. February 13, 2 | 2001-02-13 |
Use of an asymmetric waveform to control ion bombardment during substrate processing Grant 6,162,709 - Raoux , et al. December 19, 2 | 2000-12-19 |
Substrate processing chamber with tunable impedance Grant 6,136,388 - Raoux , et al. October 24, 2 | 2000-10-24 |
Mixed frequency CVD apparatus Grant 6,098,568 - Raoux , et al. August 8, 2 | 2000-08-08 |
Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment Grant 6,045,618 - Raoux , et al. April 4, 2 | 2000-04-04 |
Use of an asymmetric waveform to control ion bombardment during substrate processing Grant 6,041,734 - Raoux , et al. March 28, 2 | 2000-03-28 |