loadpatents
name:-0.019121170043945
name:-0.018916845321655
name:-0.0013859272003174
Rangarajan; Vishwanathan Patent Filings

Rangarajan; Vishwanathan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Rangarajan; Vishwanathan.The latest application filed is for "plasma activated conformal dielectric film deposition".

Company Profile
0.15.13
  • Rangarajan; Vishwanathan - Fremont CA
  • Rangarajan; Vishwanathan - Beaverton OR
  • Rangarajan; Vishwanathan - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma activated conformal dielectric film deposition
Grant 10,043,655 - Swaminathan , et al. August 7, 2
2018-08-07
Plasma Activated Conformal Dielectric Film Deposition
App 20170148628 - Swaminathan; Shankar ;   et al.
2017-05-25
Plasma activated conformal dielectric film deposition
Grant 9,570,274 - Swaminathan , et al. February 14, 2
2017-02-14
Plasma Activated Conformal Dielectric Film Deposition
App 20150206719 - Swaminathan; Shankar ;   et al.
2015-07-23
Plasma activated conformal dielectric film deposition
Grant 8,999,859 - Swaminathan , et al. April 7, 2
2015-04-07
Hardmask materials
Grant 8,846,525 - Rangarajan , et al. September 30, 2
2014-09-30
Plasma Activated Conformal Dielectric Film Deposition
App 20140216337 - Swaminathan; Shankar ;   et al.
2014-08-07
Plasma activated conformal dielectric film deposition
Grant 8,637,411 - Swaminathan , et al. January 28, 2
2014-01-28
Hardmask Materials
App 20130330932 - Rangarajan; Vishwanathan ;   et al.
2013-12-12
Hardmask materials
Grant 8,536,073 - Rangarajan , et al. September 17, 2
2013-09-17
Apparatus including a plasma chamber and controller including instructions for forming a boron nitride layer
Grant 8,479,683 - Antonelli , et al. July 9, 2
2013-07-09
Depositing Conformal Boron Nitride Films
App 20130008378 - Antonelli; George Andrew ;   et al.
2013-01-10
Hardmask Materials
App 20120276752 - RANGARAJAN; Vishwanathan ;   et al.
2012-11-01
Depositing conformal boron nitride film by CVD without plasma
Grant 8,288,292 - Antonelli , et al. October 16, 2
2012-10-16
Hardmask materials
Grant 8,247,332 - Rangarajan , et al. August 21, 2
2012-08-21
Remote plasma processing of interface surfaces
Grant 8,217,513 - Antonelli , et al. July 10, 2
2012-07-10
Hardmask materials
Grant 8,178,443 - Rangarajan , et al. May 15, 2
2012-05-15
Plasma Activated Conformal Dielectric Film Deposition
App 20120028454 - Swaminathan; Shankar ;   et al.
2012-02-02
Remote plasma processing of interface surfaces
Grant 8,084,339 - Antonelli , et al. December 27, 2
2011-12-27
Depositing Conformal Boron Nitride Films
App 20110244694 - Antonelli; George Andrew ;   et al.
2011-10-06
Hardmask Materials
App 20110133313 - Rangarajan; Vishwanathan ;   et al.
2011-06-09
Hardmask Materials
App 20110135557 - Rangarajan; Vishwanathan ;   et al.
2011-06-09
Remote Plasma Processing Of Interface Surfaces
App 20110120377 - Antonelli; George Andrew ;   et al.
2011-05-26
Remote Plasma Processing Of Interface Surfaces
App 20100317178 - Antonelli; George Andrew ;   et al.
2010-12-16
Remote Plasma Processing Of Interface Surfaces
App 20100317198 - Antonelli; George Andrew ;   et al.
2010-12-16

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