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Patent applications and USPTO patent grants for Ramanujam; K. Y..The latest application filed is for "high lifetime consumable silicon nitride-silicon dioxide plasma processing components".
Patent | Date |
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High lifetime consumable silicon nitride-silicon dioxide plasma processing components Grant 8,622,021 - Taylor , et al. January 7, 2 | 2014-01-07 |
High Lifetime Consumable Silicon Nitride-silicon Dioxide Plasma Processing Components App 20110021031 - Taylor; Travis R. ;   et al. | 2011-01-27 |
Method for reducing or eliminating de-lamination of semiconductor wafer film layers during a chemical mechanical planarization process Grant 7,040,952 - Srivatsan , et al. May 9, 2 | 2006-05-09 |
Multi-step polishing system and process of using same App 20030060145 - Li, Youlin J. ;   et al. | 2003-03-27 |
Interlocking Chemical Mechanical Polishing System App 20020185467 - Boyd, John ;   et al. | 2002-12-12 |
Method of improving adhesion between thin films Grant 5,714,037 - Puntambekar , et al. February 3, 1 | 1998-02-03 |
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