loadpatents
Patent applications and USPTO patent grants for Ramamurthy; Sundar.The latest application filed is for "low thermal budget crystallization of amorphous metal silicides".
Patent | Date |
---|---|
Low thermal budget crystallization of amorphous metal silicides Grant 10,354,882 - Mebarki , et al. July 16, 2 | 2019-07-16 |
Low Thermal Budget Crystallization Of Amorphous Metal Silicides App 20180315609 - Mebarki; Bencherki ;   et al. | 2018-11-01 |
Methods for forming low-resistance contacts through integrated process flow systems Grant 9,947,578 - Lei , et al. April 17, 2 | 2018-04-17 |
Methods for forming low resistivity interconnects Grant 9,812,328 - Singh , et al. November 7, 2 | 2017-11-07 |
Methods For Forming Low-resistance Contacts Through Integrated Process Flow Systems App 20170148670 - LEI; YU ;   et al. | 2017-05-25 |
Managing thermal budget in annealing of substrates Grant 9,595,459 - Moffatt , et al. March 14, 2 | 2017-03-14 |
Methods For Forming Low Resistivity Interconnects App 20160372371 - SINGH; Kaushal K. ;   et al. | 2016-12-22 |
Backside rapid thermal processing of patterned wafers Grant 9,431,278 - Aderhold , et al. August 30, 2 | 2016-08-30 |
Method and apparatus for forming gate stack on Si, SiGe or Ge channels Grant 9,373,516 - Ahmed , et al. June 21, 2 | 2016-06-21 |
Managing Thermal Budget In Annealing Of Substrates App 20150357215 - MOFFATT; STEPHEN ;   et al. | 2015-12-10 |
Managing thermal budget in annealing of substrates Grant 9,114,479 - Moffatt , et al. August 25, 2 | 2015-08-25 |
Thermal reactor with improved gas flow distribution Grant 8,888,916 - Tseng , et al. November 18, 2 | 2014-11-18 |
Managing Thermal Budget In Annealing Of Substrates App 20140209583 - MOFFATT; Stephen ;   et al. | 2014-07-31 |
Thermal Reactor With Improved Gas Flow Distribution App 20140079376 - TSENG; Ming-Kuei (Michael) ;   et al. | 2014-03-20 |
METHOD AND APPARATUS FOR FORMING GATE STACK ON Si, SiGe or Ge CHANNELS App 20140065798 - Ahmed; Khaled Z. ;   et al. | 2014-03-06 |
Backside rapid thermal processing of patterned wafers Grant 8,658,945 - Aderhold , et al. February 25, 2 | 2014-02-25 |
Processing Multilayer Semiconductors With Multiple Heat Sources App 20140003800 - RAMAMURTHY; Sundar ;   et al. | 2014-01-02 |
Thermal reactor with improved gas flow distribution Grant 8,608,853 - Tseng , et al. December 17, 2 | 2013-12-17 |
Processing multilayer semiconductors with multiple heat sources Grant 8,536,492 - Ramamurthy , et al. September 17, 2 | 2013-09-17 |
Method of thermally treating silicon with oxygen Grant 8,497,193 - Yokota , et al. July 30, 2 | 2013-07-30 |
Water cooled gas injector Grant 8,409,353 - Yokota , et al. April 2, 2 | 2013-04-02 |
Managing thermal budget in annealing of substrates Grant 8,314,369 - Moffatt , et al. November 20, 2 | 2012-11-20 |
Dual Plasma Source, Lamp Heated Plasma Chamber App 20120222618 - Olsen; Christopher ;   et al. | 2012-09-06 |
Integrated Platform For In-situ Doping And Activation Of Substrates App 20120088356 - SANTHANAM; KARTIK ;   et al. | 2012-04-12 |
Thermal Reactor With Improved Gas Flow Distribution App 20120058648 - Tseng; Ming-Kuei (Michael) ;   et al. | 2012-03-08 |
Water cooled gas injector App 20120031332 - Yokota; Yoshitaka ;   et al. | 2012-02-09 |
Thermal reactor with improved gas flow distribution Grant 8,056,500 - Tseng , et al. November 15, 2 | 2011-11-15 |
Method of thermally treating silicon with oxygen App 20110250764 - Yokota; Yoshitaka ;   et al. | 2011-10-13 |
Processing multilayer semiconductors with multiple heat sources Grant 7,986,871 - Ramamurthy , et al. July 26, 2 | 2011-07-26 |
Thermal oxidation of silicon using ozone Grant 7,972,441 - Yokota , et al. July 5, 2 | 2011-07-05 |
Pulsed laser anneal system architecture Grant 7,923,660 - Lerner , et al. April 12, 2 | 2011-04-12 |
High Throughput Selective Oxidation Of Silicon And Polysilicon Using Plasma At Room Temperature App 20100297854 - Ramamurthy; Sundar ;   et al. | 2010-11-25 |
Method of controlling metal silicide formation Grant 7,811,877 - Ramamurthy , et al. October 12, 2 | 2010-10-12 |
Edge temperature compensation in thermal processing particularly useful for SOI wafers Grant 7,700,376 - Chacin , et al. April 20, 2 | 2010-04-20 |
Managing Thermal Budget In Annealing Of Substrates App 20100068898 - MOFFATT; STEPHEN ;   et al. | 2010-03-18 |
Managing Thermal Budget In Annealing Of Substrates App 20100065547 - MOFFATT; STEPHEN ;   et al. | 2010-03-18 |
Thermal Reactor With Improved Gas Flow Distribution App 20090163042 - Tseng; Ming-Kuei (Michael) ;   et al. | 2009-06-25 |
Lamp array for thermal processing exhibiting improved radial uniformity Grant 7,509,035 - Ranish , et al. March 24, 2 | 2009-03-24 |
Pulsed Laser Anneal System Architecture App 20090045182 - LERNER; ALEXANDER N. ;   et al. | 2009-02-19 |
Backside Rapid Thermal Processing of Patterned Wafers App 20090041443 - Aderhold; Wolfgang ;   et al. | 2009-02-12 |
Method Of Controlling Metal Silicide Formation App 20090023257 - RAMAMURTHY; SUNDAR ;   et al. | 2009-01-22 |
Processing Multilayer Semiconductors With Multiple Heat Sources App 20090010626 - RAMAMURTHY; SUNDAR ;   et al. | 2009-01-08 |
Backside rapid thermal processing of patterned wafers Grant 7,414,224 - Aderhold , et al. August 19, 2 | 2008-08-19 |
Controlled Annealing Method App 20080090309 - RANISH; JOSEPH MICHAEL ;   et al. | 2008-04-17 |
Cylinder for thermal processing chamber Grant 7,241,345 - Ramamurthy , et al. July 10, 2 | 2007-07-10 |
Backside rapid thermal processing of patterned wafers App 20070104470 - Aderhold; Wolfgang ;   et al. | 2007-05-10 |
Method of Thermally Oxidizing Silicon Using Ozone App 20070026693 - YOKOTA; Yoshitaka ;   et al. | 2007-02-01 |
Substrate processing platform allowing processing in different ambients App 20060240680 - Yokota; Yoshitaka ;   et al. | 2006-10-26 |
Tailored temperature uniformity Grant 7,127,367 - Ramachandran , et al. October 24, 2 | 2006-10-24 |
Edge temperature compensation in thermal processing particularly useful for SOI wafers App 20060228818 - Chacin; Juan ;   et al. | 2006-10-12 |
Thermal oxidation of silicon using ozone App 20060223315 - Yokota; Yoshitaka ;   et al. | 2006-10-05 |
Stepped reflector plate Grant 7,041,931 - Jennings , et al. May 9, 2 | 2006-05-09 |
Lamp array for thermal processing exhibiting improved radial uniformity App 20060066193 - Ranish; Joseph M. ;   et al. | 2006-03-30 |
Processing multilayer semiconductors with multiple heat sources App 20060018639 - Ramamurthy; Sundar ;   et al. | 2006-01-26 |
Backside rapid thermal processing of patterned wafers App 20050191044 - Aderhold, Wolfgang ;   et al. | 2005-09-01 |
Advances in spike anneal processes for ultra shallow junctions Grant 6,897,131 - Ramachandran , et al. May 24, 2 | 2005-05-24 |
Tailored temperature uniformity App 20050102108 - Ramachandran, Balasubramanian ;   et al. | 2005-05-12 |
Thermally matched support ring for substrate processing chamber Grant 6,888,104 - Ranish , et al. May 3, 2 | 2005-05-03 |
Cylinder for thermal processing chamber App 20040250772 - Ramamurthy, Sundar ;   et al. | 2004-12-16 |
Thermally processing a substrate Grant 6,803,546 - Boas , et al. October 12, 2 | 2004-10-12 |
Advances in spike anneal processes for ultra shallow junctions App 20040126999 - Ramachandran, Balasubramanian ;   et al. | 2004-07-01 |
Stepped reflector plate App 20040079746 - Jennings, Dean ;   et al. | 2004-04-29 |
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