Rajaram; Rekha

Patent Applications and Registrations

Patent applications and USPTO patent grants for Rajaram; Rekha.The latest application filed is for "compositions and methods for selectively etching titanium nitride".

Company Profile

2.14.15

Rajaram; Rekha - Scarsdale NY
Rajaram; Rekha - Hopewell Junction NY
Rajaram; Rekha - White Plains NY
Rajaram; Rekha - US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Compositions and methods for selectively etching titanium nitride Grant 10,392,560 - Barnes , et al. A	2019-08-27
Methods for making robust replacement metal gates and multi-threshold devices in a soft mask integration scheme Grant 10,170,373 - Kannan , et al. J	2019-01-01
Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme Grant 9,824,930 - Ando , et al. November 21, 2	2017-11-21
Compositions And Methods For Selectively Etching Titanium Nitride App 20170260449 - BARNES; Jeffrey A. ; et al.	2017-09-14
Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme Grant 9,721,842 - Ando , et al. August 1, 2	2017-08-01
Compositions and methods for selectively etching titanium nitride Grant 9,546,321 - Barnes , et al. January 17, 2	2017-01-17
Method Of Patterning Dopant Films In High-k Dielectrics In A Soft Mask Integration Scheme App 20160351452 - Ando; Takashi ; et al.	2016-12-01
Method of patterning dopant films in high-K dielectrics in a soft mask integration scheme Grant 9,472,419 - Ando , et al. October 18, 2	2016-10-18
Method and structure for transistors using gate stack dopants with minimal nitrogen penetration Grant 9,418,995 - Kannan , et al. August 16, 2	2016-08-16
Method Of Patterning Dopant Films In High-k Dielectrics In A Soft Mask Integration Scheme App 20160190015 - Ando; Takashi ; et al.	2016-06-30
Metal stack for reduced gate resistance Grant 9,343,372 - Bao , et al. May 17, 2	2016-05-17
Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme Grant 9,330,938 - Ando , et al. May 3, 2	2016-05-03
Method And Structure For Transistors Using Gate Stack Dopants With Minimal Nitrogen Penetration App 20160104707 - Kannan; Balaji ; et al.	2016-04-14
Methods For Making Robust Replacement Metal Gates And Multi-threshold Devices In A Soft Mask Integration Scheme App 20160086860 - Kannan; Balaji ; et al.	2016-03-24
Method Of Patterning Dopant Films In High-k Dielectrics In A Soft Mask Integration Scheme App 20160049337 - Ando; Takashi ; et al.	2016-02-18
Method Of Patterning Dopant Films In High-k Dielectrics In A Soft Mask Integration Scheme App 20160027664 - Ando; Takashi ; et al.	2016-01-28
Aqueous Cleaner For The Removal Of Post-etch Residues App 20150307818 - Barnes; Jeffrey A. ; et al.	2015-10-29
Aqueous cleaner for the removal of post-etch residues Grant 9,063,431 - Barnes , et al. June 23, 2	2015-06-23
Formulations For Wet Etching Nipt During Silicide Fabrication App 20150162213 - Chen; Tianniu ; et al.	2015-06-11
Facilities manifold with proximity sensor Grant 9,031,700 - Payne , et al. May 12, 2	2015-05-12
Compositions And Methods For Selectively Etching Titanium Nitride App 20150027978 - Barnes; Jeffrey A. ; et al.	2015-01-29
Aqueous Cleaner For The Removal Of Post-etch Residues App 20130296214 - Barnes; Jeffrey A. ; et al.	2013-11-07
Facilites Manifold with Proximity Sensor App 20130090765 - Payne; Makonnen ; et al.	2013-04-11

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