loadpatents
name:-0.022658109664917
name:-0.010946989059448
name:-0.0021941661834717
Rajagopalan; Nagarajan Patent Filings

Rajagopalan; Nagarajan

Patent Applications and Registrations

Patent applications and USPTO patent grants for Rajagopalan; Nagarajan.The latest application filed is for "modified stacks for 3d nand".

Company Profile
4.23.34
  • Rajagopalan; Nagarajan - Santa Clara CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Modified Stacks For 3d Nand
App 20210040607 - Han; Xinhai ;   et al.
2021-02-11
Pecvd Process
App 20200399756 - RAJAGOPALAN; Nagarajan ;   et al.
2020-12-24
PECVD process
Grant 10,793,954 - Rajagopalan , et al. October 6, 2
2020-10-06
Dielectric-metal stack for 3D flash memory application
Grant 10,475,644 - Han , et al. Nov
2019-11-12
Pecvd Process
App 20180258535 - RAJAGOPALAN; Nagarajan ;   et al.
2018-09-13
Dielectric-metal Stack For 3d Flash Memory Application
App 20180247808 - HAN; Xinhai ;   et al.
2018-08-30
PECVD process
Grant 10,060,032 - Rajagopalan , et al. August 28, 2
2018-08-28
PECVD apparatus and process
Grant 10,030,306 - Rajagopalan , et al. July 24, 2
2018-07-24
Dielectric-metal stack for 3D flash memory application
Grant 9,972,487 - Han , et al. May 15, 2
2018-05-15
Pecvd Process
App 20180066364 - RAJAGOPALAN; Nagarajan ;   et al.
2018-03-08
FCVD line bending resolution by deposition modulation
Grant 9,896,326 - Liang , et al. February 20, 2
2018-02-20
PECVD process
Grant 9,816,187 - Rajagopalan , et al. November 14, 2
2017-11-14
Pecvd Process
App 20170016118 - RAJAGOPALAN; Nagarajan ;   et al.
2017-01-19
Gate stack materials for semiconductor applications for lithographic overlay improvement
Grant 9,490,116 - Tsiang , et al. November 8, 2
2016-11-08
PECVD process
Grant 9,458,537 - Rajagopalan , et al. October 4, 2
2016-10-04
Adhesion Improvements For Oxide-silicon Stack
App 20160260602 - SREEKALA; Subbalakshmi ;   et al.
2016-09-08
Gate Stack Materials For Semiconductor Applications For Lithographic Overlay Improvement
App 20160203971 - TSIANG; Michael ;   et al.
2016-07-14
Fcvd Line Bending Resolution By Deposition Modulation
App 20160181089 - LIANG; Jingmei ;   et al.
2016-06-23
Pecvd Process
App 20160017497 - RAJAGOPALAN; NAGARAJAN ;   et al.
2016-01-21
PECVD process
Grant 9,157,730 - Rajagopalan , et al. October 13, 2
2015-10-13
Pecvd Apparatus And Process
App 20150226540 - Rajagopalan; Nagarajan ;   et al.
2015-08-13
Dielectric-metal Stack For 3d Flash Memory Application
App 20150206757 - HAN; XINHAI ;   et al.
2015-07-23
High Throughput Multi-layer Stack Deposition
App 20140287593 - HAN; Xinhai ;   et al.
2014-09-25
Methods For Maintaining Clean Etch Rate And Reducing Particulate Contamination With Pecvd Of Amorphous Silicon Filims
App 20140272184 - SREEKALA; Subbalakshmi ;   et al.
2014-09-18
Pecvd Process
App 20140118751 - RAJAGOPALAN; Nagarajan ;   et al.
2014-05-01
Silicon nitride passivation layer for covering high aspect ratio features
Grant 8,563,095 - Rajagopalan , et al. October 22, 2
2013-10-22
Adhesion Improvement For Low K Dielectrics To Conductive Materials
App 20130230986 - RAJAGOPALAN; NAGARAJAN ;   et al.
2013-09-05
Zero Shrinkage Smooth Interface Oxy-nitride And Oxy-amorphous-silicon Stacks For 3d Memory Vertical Gate Application
App 20130161629 - HAN; XINHAI ;   et al.
2013-06-27
Fabrication of through-silicon vias on silicon wafers
Grant 8,329,575 - Rajagopalan , et al. December 11, 2
2012-12-11
High mobility monolithic p-i-n diodes
Grant 8,298,887 - Han , et al. October 30, 2
2012-10-30
Fabrication of through-silicon vias on silicon wafers
Grant 8,283,237 - Rajagopalan , et al. October 9, 2
2012-10-09
Fabrication Of Through-silicon Vias On Silicon Wafers
App 20120164829 - Rajagopalan; Nagarajan ;   et al.
2012-06-28
Fabrication Of Through-silicon Vias On Silicon Wafers
App 20120164827 - RAJAGOPALAN; Nagarajan ;   et al.
2012-06-28
PECVD oxide-nitride and oxide-silicon stacks for 3D memory application
Grant 8,076,250 - Rajagopalan , et al. December 13, 2
2011-12-13
Silicon Nitride Passivation Layer For Covering High Aspect Ratio Features
App 20110223765 - RAJAGOPALAN; Nagarajan ;   et al.
2011-09-15
High Mobility Monolithic P-i-n Diodes
App 20110136327 - Han; Xinhai ;   et al.
2011-06-09
Method of improving initiation layer for low-k dielectric film by digital liquid flow meter
Grant 7,947,611 - Ho , et al. May 24, 2
2011-05-24
Reduction of hillocks prior to dielectric barrier deposition in Cu damascene
Grant 7,723,228 - Rajagopalan , et al. May 25, 2
2010-05-25
High Temperature Bd Development For Memory Applications
App 20100087062 - Lakshmanan; Annamalai ;   et al.
2010-04-08
Methods and apparatuses promoting adhesion of dielectric barrier film to copper
App 20090011148 - Rajagopalan; Nagarajan ;   et al.
2009-01-08
Method Of Improving Initiation Layer For Low-k Dielectric Film By Digital Liquid Flow Meter
App 20080280457 - Ho; Dustin W. ;   et al.
2008-11-13
Method of improving initiation layer for low-k dielectric film by digital liquid flow meter
Grant 7,410,916 - Ho , et al. August 12, 2
2008-08-12
Method Of Improving Initiation Layer For Low-k Dielectric Film By Digital Liquid Flow Meter
App 20080119058 - HO; DUSTIN W. ;   et al.
2008-05-22
Reduction of hillocks prior to dielectric barrier deposition in Cu damascene
Grant 7,371,427 - Rajagopalan , et al. May 13, 2
2008-05-13
Reduction Of Hillocks Prior To Dielectric Barrier Deposition In Cu Damascene
App 20080075888 - Rajagopalan; Nagarajan ;   et al.
2008-03-27
Method to reduce gas-phase reactions in a PECVD process with silicon and organic precursors to deposit defect-free initial layers
Grant 7,297,376 - Yim , et al. November 20, 2
2007-11-20
Adhesion improvement for low k dielectrics to conductive materials
Grant 7,229,911 - Rajagopalan , et al. June 12, 2
2007-06-12
High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric CVD films
App 20060093756 - Rajagopalan; Nagarajan ;   et al.
2006-05-04
Adhesion improvement for low k dielectrics to conductive materials
App 20060046479 - Rajagopalan; Nagarajan ;   et al.
2006-03-02
Adhesion improvement for low k dielectrics to conductive materials
App 20050233555 - Rajagopalan, Nagarajan ;   et al.
2005-10-20
Methods and apparatuses promoting adhesion of dielectric barrier film to copper
App 20050186339 - Rajagopalan, Nagarajan ;   et al.
2005-08-25
Reduction of hillocks prior to dielectric barrier deposition in Cu damascene
App 20040231795 - Rajagopalan, Nagarajan ;   et al.
2004-11-25
Reduction of hillocks prior to dielectric barrier deposition in Cu damascene
App 20040235292 - Rajagopalan, Nagarajan ;   et al.
2004-11-25
Method for forming silicon containing layers on a substrate
Grant 6,656,840 - Rajagopalan , et al. December 2, 2
2003-12-02
Method For Forming Silicon Containing Layers On A Substrate
App 20030203614 - Rajagopalan, Nagarajan ;   et al.
2003-10-30

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed