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Integration of dual remote plasmas sources for flowable CVD Grant 10,934,620 - Ma , et al. March 2, 2 | 2021-03-02 |
Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetime Grant 10,428,426 - Raj , et al. October 1, 2 | 2019-10-01 |
Diffuser Design For Flowable Cvd App 20180258531 - MA; Ying ;   et al. | 2018-09-13 |
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Integration Of Dual Remote Plasmas Sources For Flowable Cvd App 20180148840 - MA; Ying ;   et al. | 2018-05-31 |
Method & Apparatus To Prevent Deposition Rate/thickness Drift, Reduce Particle Defects & Increase Remote Plasma System Lifetime App 20170306493 - RAJ; Daemian ;   et al. | 2017-10-26 |
Method and hardware for cleaning UV chambers Grant 9,506,145 - Baluja , et al. November 29, 2 | 2016-11-29 |
Method And Hardware For Cleaning Uv Chambers App 20160296981 - BALUJA; Sanjeev ;   et al. | 2016-10-13 |
Method and hardware for cleaning UV chambers Grant 9,364,871 - Baluja , et al. June 14, 2 | 2016-06-14 |
Wet Cleaning Of A Chamber Component App 20160017263 - DUAN; Ren-Guan ;   et al. | 2016-01-21 |
Bottom Pump And Purge And Bottom Ozone Clean Hardware To Reduce Fall-on Particle Defects App 20150211114 - KANGUDE; Abhijit ;   et al. | 2015-07-30 |
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Method And Hardware For Cleaning Uv Chambers App 20140053866 - BALUJA; Sanjeev ;   et al. | 2014-02-27 |
Microelectronic structure including a low k dielectric and a method of controlling carbon distribution in the structure Grant 8,349,746 - Xie , et al. January 8, 2 | 2013-01-08 |
Microelectronic structure including a low K dielectric and a method of controlling carbon distribution in the structure App 20110204492 - Xie; Bo ;   et al. | 2011-08-25 |
Methods of uniformity control for low flow process and chamber to chamber matching Grant 7,829,145 - Balasubramanian , et al. November 9, 2 | 2010-11-09 |
Uniformity control for low flow process and chamber to chamber matching Grant 7,622,005 - Balasubramanian , et al. November 24, 2 | 2009-11-24 |
Blocker plate bypass to distribute gases in a chemical vapor deposition system Grant 7,572,337 - Rocha-Alvarez , et al. August 11, 2 | 2009-08-11 |
Uniformity Control For Low Flow Process And Chamber To Chamber Matching App 20090047446 - Balasubramanian; Ganesh ;   et al. | 2009-02-19 |
Situ oxide cap layer development Grant 7,273,823 - Lakshmanan , et al. September 25, 2 | 2007-09-25 |
Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile Grant 7,189,658 - Lakshmanan , et al. March 13, 2 | 2007-03-13 |
In situ oxide cap layer development App 20060276054 - Lakshmanan; Annamalai ;   et al. | 2006-12-07 |
Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile App 20060252273 - Lakshmanan; Annamalai ;   et al. | 2006-11-09 |
Method to reduce plasma damage during cleaning of semiconductor wafer processing chamber App 20060054183 - Nowak; Thomas ;   et al. | 2006-03-16 |
Uniformity control for low flow process and chamber to chamber matching App 20050263072 - Balasubramanian, Ganesh ;   et al. | 2005-12-01 |
Blocker plate bypass to distribute gases in a chemical vapor deposition system App 20050263248 - Rocha-Alvarez, Juan Carlos ;   et al. | 2005-12-01 |